BE829258A - Procede de fabrication d'hologrammes modules en largeur de trait - Google Patents

Procede de fabrication d'hologrammes modules en largeur de trait

Info

Publication number
BE829258A
BE829258A BE156506A BE156506A BE829258A BE 829258 A BE829258 A BE 829258A BE 156506 A BE156506 A BE 156506A BE 156506 A BE156506 A BE 156506A BE 829258 A BE829258 A BE 829258A
Authority
BE
Belgium
Prior art keywords
linewidth
modules
holograms
manufacturing
manufacturing holograms
Prior art date
Application number
BE156506A
Other languages
English (en)
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE829258A publication Critical patent/BE829258A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0402—Recording geometries or arrangements
    • G03H1/0406—Image plane or focused image holograms, i.e. an image of the object or holobject is formed on, in or across the recording plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276—Replicating a master hologram without interference recording
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/024—Hologram nature or properties
    • G03H1/0244—Surface relief holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276—Replicating a master hologram without interference recording
    • G03H2001/0292—Replicating a master hologram without interference recording by masking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276—Replicating a master hologram without interference recording
    • G03H2001/0296—Formation of the master hologram
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/20—Details of physical variations exhibited in the hologram
    • G03H2240/40—Dynamic of the variations
    • G03H2240/41—Binary
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/14—Photoresist
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/50—Reactivity or recording processes
    • G03H2260/63—Indirect etching, e.g. lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2270/00—Substrate bearing the hologram
    • G03H2270/10—Composition
    • G03H2270/11—Crystal or glass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holo Graphy (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • ing And Chemical Polishing (AREA)
BE156506A 1974-05-22 1975-05-20 Procede de fabrication d'hologrammes modules en largeur de trait BE829258A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/472,436 US3945825A (en) 1974-05-22 1974-05-22 Method for producing width-modulated surface relief patterns

Publications (1)

Publication Number Publication Date
BE829258A true BE829258A (fr) 1975-09-15

Family

ID=23875502

Family Applications (1)

Application Number Title Priority Date Filing Date
BE156506A BE829258A (fr) 1974-05-22 1975-05-20 Procede de fabrication d'hologrammes modules en largeur de trait

Country Status (12)

Country Link
US (1) US3945825A (sv)
JP (1) JPS556914B2 (sv)
AU (1) AU496732B2 (sv)
BE (1) BE829258A (sv)
CA (1) CA1034411A (sv)
CH (1) CH600383A5 (sv)
DE (1) DE2522547A1 (sv)
FR (1) FR2272405A1 (sv)
GB (1) GB1508178A (sv)
IT (1) IT1037346B (sv)
NL (1) NL7505957A (sv)
SE (1) SE7505783L (sv)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1545048A (en) * 1976-05-27 1979-05-02 Rca Corp Simplified diffractive colour filtering technique
GB1537703A (en) * 1976-01-27 1979-01-04 Rca Corp Fabrication of rectangular relief profiles in photoresist
JPS5315152A (en) * 1976-07-27 1978-02-10 Canon Inc Hologram
US4372649A (en) * 1978-05-22 1983-02-08 Minnesota Mining And Manufacturing Company Extended area diffractive subtractive color filters
US4255514A (en) * 1979-04-27 1981-03-10 Rca Corporation Method for fabricating a diffractive subtractive filter embossing master
JPS6141079Y2 (sv) * 1979-06-15 1986-11-22
US4315665A (en) * 1979-09-07 1982-02-16 Eidetic Images, Inc. Composite optical element having controllable light transmission and reflection characteristics
US4514479A (en) * 1980-07-01 1985-04-30 The United States Of America As Represented By The Secretary Of The Navy Method of making near infrared polarizers
US4440839A (en) * 1981-03-18 1984-04-03 United Technologies Corporation Method of forming laser diffraction grating for beam sampling device
DE3123162C2 (de) * 1981-06-11 1987-01-08 Viktor Voskanovič Afian Lichtkonzentrator und Verfahren zu seiner Herstellung
JPS6025783B2 (ja) * 1981-10-26 1985-06-20 株式会社リコー 電子写真用転写紙
US4496425A (en) * 1984-01-30 1985-01-29 At&T Technologies, Inc. Technique for determining the end point of an etching process
JPS6151869A (ja) * 1984-08-20 1986-03-14 Mitsubishi Electric Corp 半導体記憶装置およびその製造方法
FR2587504B1 (fr) * 1985-09-19 1989-11-03 Mutzel Francis Montre-hologramme
US4933205A (en) * 1987-10-09 1990-06-12 Duley Walter W Laser etching of foam substrate
US4769257A (en) * 1987-10-09 1988-09-06 Duley Walter W Laser etching of foam substrate
US4972061A (en) * 1987-12-17 1990-11-20 Duley Walter W Laser surface treatment
US4828356A (en) * 1987-12-22 1989-05-09 Hughes Aircraft Company Method for fabrication of low efficiency diffraction gratings and product obtained thereby
US5059499A (en) * 1988-06-03 1991-10-22 Michael Teitel Master hologram and micropattern replication method
DE4024748C1 (en) * 1990-08-03 1992-03-12 Carlo Dr. 8031 Eichenau De Schmelzer Hologram die prodn. for interference pattern - by exposing holographic recording material to laser beam, developing enzyme treating forming plastic impression and electroplating
US6709790B1 (en) * 1992-08-26 2004-03-23 Goodrich Corporation Method and apparatus for generating periodic structures in substrates by synthetic wavelength holograph exposure
DE10025694C2 (de) * 2000-05-24 2003-06-05 Zeiss Carl Verwendung eines Beugungsgitters
US7867695B2 (en) * 2003-09-11 2011-01-11 Bright View Technologies Corporation Methods for mastering microstructures through a substrate using negative photoresist
US7190387B2 (en) * 2003-09-11 2007-03-13 Bright View Technologies, Inc. Systems for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam
US7192692B2 (en) 2003-09-11 2007-03-20 Bright View Technologies, Inc. Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers
CN111769370A (zh) * 2019-04-02 2020-10-13 富泰华工业（深圳）有限公司 全息天线及其制作方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1080364A (en) * 1963-03-28 1967-08-23 Nat Res Dev Preparation of diffraction gratings
US3580657A (en) * 1968-05-14 1971-05-25 Xerox Corp Blazed surface hologram
US3623798A (en) * 1970-01-21 1971-11-30 Xerox Corp Blazed hologram fabrication
US3669673A (en) * 1970-10-23 1972-06-13 Rca Corp Recording of a continuous tone focused image on a diffraction grating
US3743507A (en) * 1970-10-23 1973-07-03 Rca Corp Recording of a continuous tone focused image on a diffraction grating
US3733258A (en) * 1971-02-03 1973-05-15 Rca Corp Sputter-etching technique for recording holograms or other fine-detail relief patterns in hard durable materials

Also Published As

Publication number Publication date
CH600383A5 (sv) 1978-06-15
IT1037346B (it) 1979-11-10
SE7505783L (sv) 1975-11-24
CA1034411A (en) 1978-07-11
DE2522547B2 (sv) 1980-01-17
JPS5116060A (sv) 1976-02-09
DE2522547A1 (de) 1975-12-04
AU8124775A (en) 1976-11-18
AU496732B2 (en) 1978-10-26
NL7505957A (nl) 1975-11-25
FR2272405A1 (sv) 1975-12-19
US3945825A (en) 1976-03-23
GB1508178A (en) 1978-04-19
JPS556914B2 (sv) 1980-02-20

Similar Documents

Publication Publication Date Title
BE829258A (fr) Procede de fabrication d'hologrammes modules en largeur de trait
BE843077A (fr) Procede de fabrication de l'aldhyde betamethylthiopropionique
FR2337893A1 (fr) Procede de fabrication de micro-motifs et micro-substrats appropries
FR2276661A1 (fr) Procede test de memoires a semi-conducteur
BE862266A (fr) Procede de fabrication de sulfate de calcium en morceaux
BE857663A (fr) Procede de fabrication de circuits integres programmables
FR2321768A2 (fr) Procede de fabrication d'une memoire a semi-conducteur
FR2301092A1 (fr) Procede de fabrication d'un semi-conducteur et semi-conducteur obtenu
BE838332R (fr) Procede de fabrication d'un succedane d'amuse-geule
FR2302603A1 (fr) Procede de fabrication d'un reflect
FR2300105A1 (fr) Procede de fabrication de panneaux en f
BE829842A (fr) Procede de fabrication de dimethylsulfoxyde
FR2297574A1 (fr) Procede de fabrication de sucreries
FR2315138A1 (fr) Procede de fabrication de videodisques
BE827490A (fr) Procede de polycondensation de glucides
BE824681A (fr) Procede de fabrication de 7-amino-cephemes
BE836866A (fr) Procede de fabrication de circuits imprimes et circuits imprimes fabriques suivant ce procede
FR2338961A1 (fr) Procede de fabrication de polyoxyphenylenes
BE835413A (fr) Procede de fabrication de nitronaphtalenes
BE836023A (fr) Procede de fabrication d'aminucomposes
FR2280620A1 (fr) Procede de fabrication de 1,4-naphtoquinone
FR2291968A1 (fr) Procede de fabrication de la tetramethyl-ethylene diamine
BE821360A (fr) Procede de fabrication d'articles faconnes en gypse
FR2303873A1 (fr) Procede de fabrication de filaments en polyamide-6 dans la modification g
BE831682R (fr) Procede de fabrication de structures en relief