BE814714A - Procede de formation d'une couche d'oxyde de fer suivant un dessin - Google Patents

Procede de formation d'une couche d'oxyde de fer suivant un dessin

Info

Publication number
BE814714A
BE814714A BE144056A BE144056A BE814714A BE 814714 A BE814714 A BE 814714A BE 144056 A BE144056 A BE 144056A BE 144056 A BE144056 A BE 144056A BE 814714 A BE814714 A BE 814714A
Authority
BE
Belgium
Prior art keywords
forming
oxide layer
iron oxide
layer following
following
Prior art date
Application number
BE144056A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE814714A publication Critical patent/BE814714A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
BE144056A 1973-05-09 1974-05-08 Procede de formation d'une couche d'oxyde de fer suivant un dessin BE814714A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00358727A US3837855A (en) 1973-05-09 1973-05-09 Pattern delineation method and product so produced

Publications (1)

Publication Number Publication Date
BE814714A true BE814714A (fr) 1974-09-02

Family

ID=23410782

Family Applications (1)

Application Number Title Priority Date Filing Date
BE144056A BE814714A (fr) 1973-05-09 1974-05-08 Procede de formation d'une couche d'oxyde de fer suivant un dessin

Country Status (2)

Country Link
US (1) US3837855A (fr)
BE (1) BE814714A (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4027052A (en) * 1973-05-09 1977-05-31 Bell Telephone Laboratories, Incorporated Fabrication of iron oxide pattern
US4150990A (en) * 1978-01-10 1979-04-24 Gte Sylvania Incorporated Small phosphor area black matrix fabricating process
US4242152A (en) * 1979-05-14 1980-12-30 National Semiconductor Corporation Method for adjusting the focus and power of a trimming laser
KR102352740B1 (ko) * 2015-04-30 2022-01-18 삼성디스플레이 주식회사 마스크의 제조 방법 및 표시 장치의 제조 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3445356A (en) * 1966-08-25 1969-05-20 Int Nickel Co Synthesis of iron enneacarbonyl
US3637379A (en) * 1967-06-20 1972-01-25 Teeg Research Inc Method for making a relief pattern by means of electromagnetic radiation and heat-sensitive elements
US3695908A (en) * 1970-06-29 1972-10-03 Raymond E Szupillo Thin films of alpha fe2o3 and method of forming
US3681227A (en) * 1970-06-29 1972-08-01 Corning Glass Works Microcircuit mask and method

Also Published As

Publication number Publication date
US3837855A (en) 1974-09-24

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