BE809031A - Nouvelle composition sensible aux radiations et plaques lithographiques comprenant une couche de cette composition - Google Patents

Nouvelle composition sensible aux radiations et plaques lithographiques comprenant une couche de cette composition

Info

Publication number
BE809031A
BE809031A BE139217A BE139217A BE809031A BE 809031 A BE809031 A BE 809031A BE 139217 A BE139217 A BE 139217A BE 139217 A BE139217 A BE 139217A BE 809031 A BE809031 A BE 809031A
Authority
BE
Belgium
Prior art keywords
composition
radiations
layer
plates including
lithographic plates
Prior art date
Application number
BE139217A
Other languages
English (en)
French (fr)
Inventor
C C Petropoulos
J A Arcesi
R W Ryan
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of BE809031A publication Critical patent/BE809031A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE139217A 1972-12-22 1973-12-21 Nouvelle composition sensible aux radiations et plaques lithographiques comprenant une couche de cette composition BE809031A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31758572A 1972-12-22 1972-12-22

Publications (1)

Publication Number Publication Date
BE809031A true BE809031A (fr) 1974-06-21

Family

ID=23234356

Family Applications (1)

Application Number Title Priority Date Filing Date
BE139217A BE809031A (fr) 1972-12-22 1973-12-21 Nouvelle composition sensible aux radiations et plaques lithographiques comprenant une couche de cette composition

Country Status (6)

Country Link
JP (1) JPS5630849B2 (it)
BE (1) BE809031A (it)
CA (1) CA1005673A (it)
FR (1) FR2211677B1 (it)
GB (1) GB1442797A (it)
IT (1) IT1000552B (it)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPS61206293A (ja) * 1985-03-08 1986-09-12 日本ペイント株式会社 回路板の製造方法
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
DE3852559T2 (de) * 1987-03-12 1995-05-24 Konishiroku Photo Ind Lichtempfindliche positive Flachdruckplatte.
DE3731439A1 (de) * 1987-09-18 1989-03-30 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes kopiermaterial
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物

Also Published As

Publication number Publication date
CA1005673A (en) 1977-02-22
GB1442797A (en) 1976-07-14
JPS49126403A (it) 1974-12-04
FR2211677B1 (it) 1977-08-12
DE2364178B2 (de) 1976-01-15
IT1000552B (it) 1976-04-10
FR2211677A1 (it) 1974-07-19
DE2364178A1 (de) 1974-07-11
JPS5630849B2 (it) 1981-07-17

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: EASTMAN KODAK CY

Effective date: 19921231