BE754817A - Compositions resineuses photopolymerisables - Google Patents
Compositions resineuses photopolymerisablesInfo
- Publication number
- BE754817A BE754817A BE754817DA BE754817A BE 754817 A BE754817 A BE 754817A BE 754817D A BE754817D A BE 754817DA BE 754817 A BE754817 A BE 754817A
- Authority
- BE
- Belgium
- Prior art keywords
- photopolymerisable
- resinous compositions
- resinous
- compositions
- photopolymerisable resinous
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/52—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
- C08G63/54—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation the acids or hydroxy compounds containing carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/66—Polyesters containing oxygen in the form of ether groups
- C08G63/668—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/676—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polyesters Or Polycarbonates (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6405969 | 1969-08-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE754817A true BE754817A (fr) | 1971-01-18 |
Family
ID=13247125
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE754817D BE754817A (fr) | 1969-08-13 | 1970-08-13 | Compositions resineuses photopolymerisables |
Country Status (6)
Country | Link |
---|---|
US (1) | US3695877A (fr) |
BE (1) | BE754817A (fr) |
CH (1) | CH569306A5 (fr) |
FR (1) | FR2058253B1 (fr) |
GB (1) | GB1313564A (fr) |
NL (1) | NL146847B (fr) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3858510A (en) * | 1971-03-11 | 1975-01-07 | Asahi Chemical Ind | Relief structures prepared from photosensitive compositions |
JPS5239432B2 (fr) * | 1972-09-29 | 1977-10-05 | ||
DE2429636C3 (de) * | 1973-06-28 | 1986-05-07 | Teijin Ltd., Osaka | Lichtempfindliche Harzmasse |
US4191571A (en) * | 1974-04-26 | 1980-03-04 | Hitachi, Ltd. | Method of pattern forming in a photosensitive composition having a reciprocity law failing property |
US4143189A (en) * | 1974-05-08 | 1979-03-06 | Woods Jack L | Method for applying a photo polymer to surfaces |
US3953214A (en) * | 1974-05-24 | 1976-04-27 | Dynachem Corporation | Photopolymerizable screen printing inks and use thereof |
US4181807A (en) * | 1974-11-30 | 1980-01-01 | Ciba-Geigy Corporation | Polymerizable esters derived from a glycidyl ether of a phenolic unsaturated ketone |
US4179577A (en) * | 1974-11-30 | 1979-12-18 | Ciba-Geigy Corporation | Polymerisable esters derived from a phenolic unsaturated ketone |
US4167415A (en) * | 1975-07-11 | 1979-09-11 | Kansai Paint Co., Ltd. | Photocurable composition comprising copolymer of maleic acid monoester and α-olefin compound |
US4092172A (en) * | 1975-08-22 | 1978-05-30 | Kansai Paint Co., Ltd. | Photocurable composition comprising a copolymer of a maleic acid monoester with an α-olefine |
DE2909992A1 (de) * | 1979-03-14 | 1980-10-02 | Basf Ag | Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen |
US4270985A (en) * | 1978-07-21 | 1981-06-02 | Dynachem Corporation | Screen printing of photopolymerizable inks |
FR2441870A1 (fr) * | 1978-11-15 | 1980-06-13 | Hercules Inc | Composition photosensible liquide |
US4610951A (en) * | 1983-06-06 | 1986-09-09 | Dynachem Corporation | Process of using a flexible, fast processing photopolymerizable composition |
US4539286A (en) * | 1983-06-06 | 1985-09-03 | Dynachem Corporation | Flexible, fast processing, photopolymerizable composition |
DE3633436A1 (de) * | 1986-10-01 | 1988-04-14 | Basf Ag | Photopolymerisierbare aufzeichnungsmasse, insbesondere zur herstellung von druckplatten und reliefformen |
US11078125B1 (en) * | 2015-03-04 | 2021-08-03 | Hrl Laboratories, Llc | Cellular ceramic materials |
US10221284B2 (en) | 2016-01-15 | 2019-03-05 | Hrl Laboratories, Llc | Resin formulations for polymer-derived ceramic materials |
US11891341B2 (en) | 2016-11-30 | 2024-02-06 | Hrl Laboratories, Llc | Preceramic 3D-printing monomer and polymer formulations |
US10737984B2 (en) | 2016-11-30 | 2020-08-11 | Hrl Laboratories, Llc | Formulations and methods for 3D printing of ceramic matrix composites |
US10703025B1 (en) | 2016-12-23 | 2020-07-07 | Hrl Laboratories, Llc | Methods and formulations for joining preceramic polymers in the fabrication of ceramic assemblies |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1233594B (de) * | 1964-12-31 | 1967-02-02 | Bayer Ag | Ausloeser der photochemischen Haertung in Polyester-Formmassen |
-
1970
- 1970-08-10 US US62643A patent/US3695877A/en not_active Expired - Lifetime
- 1970-08-12 CH CH1210070A patent/CH569306A5/xx not_active IP Right Cessation
- 1970-08-13 FR FR707029874A patent/FR2058253B1/fr not_active Expired
- 1970-08-13 NL NL707011961A patent/NL146847B/xx not_active IP Right Cessation
- 1970-08-13 GB GB3913970A patent/GB1313564A/en not_active Expired
- 1970-08-13 BE BE754817D patent/BE754817A/fr unknown
Also Published As
Publication number | Publication date |
---|---|
DE2040390A1 (de) | 1971-04-08 |
NL146847B (nl) | 1975-08-15 |
DE2040390B2 (de) | 1977-05-18 |
CH569306A5 (fr) | 1975-11-14 |
FR2058253B1 (fr) | 1973-07-13 |
GB1313564A (en) | 1973-04-11 |
NL7011961A (fr) | 1971-02-16 |
US3695877A (en) | 1972-10-03 |
FR2058253A1 (fr) | 1971-05-28 |
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