BE731353A - - Google Patents
Info
- Publication number
- BE731353A BE731353A BE731353DA BE731353A BE 731353 A BE731353 A BE 731353A BE 731353D A BE731353D A BE 731353DA BE 731353 A BE731353 A BE 731353A
- Authority
- BE
- Belgium
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02024—Mirror polishing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19681752163 DE1752163A1 (de) | 1968-04-11 | 1968-04-11 | Verfahren zum Polieren von Halbleiteroberflaechen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE731353A true BE731353A (cs) | 1969-10-10 |
Family
ID=5692658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE731353D BE731353A (cs) | 1968-04-11 | 1969-04-10 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3877183A (cs) |
| BE (1) | BE731353A (cs) |
| CH (1) | CH505466A (cs) |
| DE (1) | DE1752163A1 (cs) |
| FR (1) | FR2006054A1 (cs) |
| GB (1) | GB1234894A (cs) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2531431C3 (de) * | 1975-07-14 | 1979-03-01 | Wacker-Chemitronic Gesellschaft Fuer Elektronik-Grundstoffe Mbh, 8263 Burghausen | Poliermittel zur Herstellung schleierfreier Halbleiteroberflächen |
| DE2538855A1 (de) * | 1975-09-01 | 1977-03-10 | Wacker Chemitronic | Verfahren zur herstellung von schleierfreien halbleiteroberflaechen, insbesondere schleierfreien oberflaechen von (111)-orientiertem galliumarsenid |
| FR2327036A1 (fr) * | 1975-10-08 | 1977-05-06 | Du Pont | Procede de polissage de materiaux semi-conducteurs de germanium et de silicium |
| JPS55113700A (en) * | 1979-02-19 | 1980-09-02 | Fujimi Kenmazai Kogyo Kk | Polishing method for gadolinium gallium garnet single crystal |
| JPS5935429A (ja) * | 1982-08-12 | 1984-02-27 | インタ−ナシヨナル ビジネス マシ−ンズ コ−ポレ−シヨン | 半導体ウエハの製造方法 |
| DE3237235C2 (de) * | 1982-10-07 | 1986-07-10 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zum Polieren von III-V-Halbleiteroberflächen |
| US4588421A (en) * | 1984-10-15 | 1986-05-13 | Nalco Chemical Company | Aqueous silica compositions for polishing silicon wafers |
| US5993685A (en) * | 1997-04-02 | 1999-11-30 | Advanced Technology Materials | Planarization composition for removing metal films |
| US6319095B1 (en) * | 2000-03-09 | 2001-11-20 | Agere Systems Guardian Corp. | Colloidal suspension of abrasive particles containing magnesium as CMP slurry |
| US8778210B2 (en) | 2006-12-21 | 2014-07-15 | Advanced Technology Materials, Inc. | Compositions and methods for the selective removal of silicon nitride |
| JP6044551B2 (ja) * | 2011-12-27 | 2016-12-14 | コニカミノルタ株式会社 | 研磨材分離方法 |
| CN111253910B (zh) * | 2020-03-18 | 2021-07-16 | 昆山捷纳电子材料有限公司 | 一种无机聚电解质-氧化硅复合抛光磨粒的制备方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2275049A (en) * | 1942-03-03 | Polish | ||
| US2375823A (en) * | 1941-10-16 | 1945-05-15 | Interchem Corp | Polishing composition |
| US2375825A (en) * | 1941-10-16 | 1945-05-15 | Interchem Corp | Polishing compositions |
| US2399237A (en) * | 1942-12-15 | 1946-04-30 | William T Maloney | Polishing material and process of preparing same |
| US2955030A (en) * | 1959-02-25 | 1960-10-04 | Nat Lead Co | Polishing compositions |
| US3170273A (en) * | 1963-01-10 | 1965-02-23 | Monsanto Co | Process for polishing semiconductor materials |
| US3527028A (en) * | 1967-09-26 | 1970-09-08 | Bell Telephone Labor Inc | Preparation of semiconductor surfaces |
| US3647381A (en) * | 1968-04-08 | 1972-03-07 | Gabriel Reiter | Dental-prophylaxis composition |
| US3541017A (en) * | 1969-02-04 | 1970-11-17 | Indiana University Foundation | Denture cleanser preparations comprising zirconium silicate and zirconium dioxide |
| US3754941A (en) * | 1971-01-04 | 1973-08-28 | Colgate Palmolive Co | Removal of metallic stains from porcelain surfaces |
-
1968
- 1968-04-11 DE DE19681752163 patent/DE1752163A1/de active Granted
-
1969
- 1969-04-10 BE BE731353D patent/BE731353A/xx unknown
- 1969-04-10 GB GB08372/69A patent/GB1234894A/en not_active Expired
- 1969-04-10 FR FR6911069A patent/FR2006054A1/fr not_active Withdrawn
- 1969-04-11 CH CH556969A patent/CH505466A/de not_active IP Right Cessation
-
1972
- 1972-08-28 US US284167A patent/US3877183A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| GB1234894A (en) | 1971-06-09 |
| US3877183A (en) | 1975-04-15 |
| CH505466A (de) | 1971-03-31 |
| FR2006054A1 (cs) | 1969-12-19 |
| DE1752163C3 (cs) | 1975-03-20 |
| DE1752163B2 (cs) | 1974-07-25 |
| DE1752163A1 (de) | 1971-05-13 |