BE710908A - - Google Patents
Info
- Publication number
- BE710908A BE710908A BE710908DA BE710908A BE 710908 A BE710908 A BE 710908A BE 710908D A BE710908D A BE 710908DA BE 710908 A BE710908 A BE 710908A
- Authority
- BE
- Belgium
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
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- H10P14/69433—
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
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- H10P14/662—
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- H10P14/6682—
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- H10P14/69215—
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- H10W74/40—
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- H10P14/6334—
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- H10P14/6927—
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US61669567A | 1967-02-16 | 1967-02-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE710908A true BE710908A (en:Method) | 1968-07-01 |
Family
ID=24470590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE710908D BE710908A (en:Method) | 1967-02-16 | 1968-02-16 |
Country Status (4)
| Country | Link |
|---|---|
| BE (1) | BE710908A (en:Method) |
| DE (1) | DE1717205A1 (en:Method) |
| FR (1) | FR1555099A (en:Method) |
| GB (1) | GB1227851A (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1951787A1 (de) * | 1968-10-14 | 1970-04-30 | Sperry Rand Corp | Speicherelement |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA942641A (en) * | 1970-05-25 | 1974-02-26 | Rca Corporation | Semiconductor body of preselected surface potential |
| EP0024305B1 (de) * | 1979-08-16 | 1985-05-02 | International Business Machines Corporation | Verfahren zum Aufbringen von SiO2-Filmen mittels chemischen Niederschlagens aus der Dampfphase |
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1968
- 1968-02-06 GB GB1227851D patent/GB1227851A/en not_active Expired
- 1968-02-15 DE DE19681717205 patent/DE1717205A1/de active Pending
- 1968-02-16 BE BE710908D patent/BE710908A/xx unknown
- 1968-02-16 FR FR1555099D patent/FR1555099A/fr not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1951787A1 (de) * | 1968-10-14 | 1970-04-30 | Sperry Rand Corp | Speicherelement |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1717205A1 (de) | 1971-07-29 |
| GB1227851A (en:Method) | 1971-04-07 |
| FR1555099A (en:Method) | 1969-01-24 |