BE703400A - - Google Patents

Info

Publication number
BE703400A
BE703400A BE703400DA BE703400A BE 703400 A BE703400 A BE 703400A BE 703400D A BE703400D A BE 703400DA BE 703400 A BE703400 A BE 703400A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE703400A publication Critical patent/BE703400A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE703400D 1966-09-06 1967-09-01 BE703400A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US57717866A 1966-09-06 1966-09-06

Publications (1)

Publication Number Publication Date
BE703400A true BE703400A (fr) 1968-02-01

Family

ID=24307588

Family Applications (1)

Application Number Title Priority Date Filing Date
BE703400D BE703400A (fr) 1966-09-06 1967-09-01

Country Status (6)

Country Link
US (1) US3475176A (fr)
BE (1) BE703400A (fr)
CH (1) CH480664A (fr)
DE (1) DE1597761A1 (fr)
FR (1) FR1551034A (fr)
GB (1) GB1180068A (fr)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1230772A (fr) * 1967-03-31 1971-05-05
US3767409A (en) * 1971-08-02 1973-10-23 Eastman Kodak Co Photographic triorganophosphine-azide dye forming composition and article
US3856531A (en) * 1971-08-02 1974-12-24 Eastman Kodak Co Photographic compositions and processes
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
US3887379A (en) * 1972-03-30 1975-06-03 Ibm Photoresist azide sensitizer composition
JPS515935B2 (fr) * 1972-04-17 1976-02-24
US3943094A (en) * 1972-06-28 1976-03-09 Bayer Aktiengesellschaft Polymers and copolymers based on alkenoyl-oxybenzylidene-malonic esters as UV-absorbers and polymers stabilized therewith
US3875123A (en) * 1972-06-28 1975-04-01 Bayer Ag Polymers and copolymers based on alkenoyl-oxybenzylidene-malonic esters as uv-absorbers and plastics stabilized therewith
US3888671A (en) * 1972-06-29 1975-06-10 Richardson Co Photoreactive compositions and products made therewith
US3969119A (en) * 1972-06-29 1976-07-13 The Richardson Company Photoreactive compositions comprising polymers containing alkoxyaromaticglyoxy groups
NL177718C (nl) * 1973-02-22 1985-11-01 Siemens Ag Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren.
US4086090A (en) * 1973-07-25 1978-04-25 Hitachi, Ltd. Formation of pattern using acrylamide-diacetoneacrylamide copolymer
US4039905A (en) * 1974-07-01 1977-08-02 P. R. Mallory & Co., Inc. Electrical device of the electrolytic type having means for confining mobile electrolyte and method of making same
AT341792B (de) * 1974-08-02 1978-02-27 Siemens Ag Verfahren zur herstellung von schichtstrukturen
DE2437348B2 (de) * 1974-08-02 1976-10-07 Ausscheidung in: 24 62 105 Verfahren zur herstellung von reliefstrukturen
AT352406B (de) * 1974-08-02 1979-09-25 Siemens Ag Verfahren zur herstellung von reliefstrukturen
USRE30186E (en) * 1974-08-02 1980-01-08 Siemens Aktiengesellschaft Method for the preparation of relief structures
US4065314A (en) * 1975-06-09 1977-12-27 The Richardson Company Photoreactive compositions comprising polymers containing alkoxyaromaticglyoxy groups
US4046577A (en) * 1975-06-09 1977-09-06 The Richardson Company Photoreactive compositions comprising polymers containing alkoxyaromatic glyoxy groups
JPS5820420B2 (ja) * 1978-12-15 1983-04-22 富士通株式会社 パタ−ン形成方法
DE2919840A1 (de) * 1979-05-16 1980-11-20 Siemens Ag Verfahren zur phototechnischen herstellung von reliefstrukturen
DE2919841A1 (de) * 1979-05-16 1980-11-20 Siemens Ag Verfahren zur phototechnischen herstellung von reliefstrukturen
JPS57168942A (en) * 1981-04-13 1982-10-18 Hitachi Ltd Photosensitive polymer composition
JPS61166542A (ja) * 1985-01-18 1986-07-28 Hitachi Chem Co Ltd 感光性組成物
US4824758A (en) * 1988-01-25 1989-04-25 Hoechst Celanese Corp Photoresist compositions based on acetoxystyrene copolymers

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3265792A (en) * 1963-10-04 1966-08-09 Hercules Powder Co Ltd Process for preparing a grained lithographic plate
US3376139A (en) * 1966-02-01 1968-04-02 Gilano Michael Nicholas Photosensitive prepolymer composition and method

Also Published As

Publication number Publication date
GB1180068A (en) 1970-02-04
CH480664A (fr) 1969-10-31
DE1597761A1 (de) 1970-08-13
FR1551034A (fr) 1968-12-27
US3475176A (en) 1969-10-28

Similar Documents

Publication Publication Date Title
FR1551034A (fr)
AU428063B2 (fr)
AU1141566A (fr)
AU433222B2 (fr)
AU5895065A (fr)
AU6703465A (fr)
AU612166A (fr)
BE674792A (fr)
BE662818A (fr)
BE694265A (fr)
BE694058A (fr)
BE693935A (fr)
BE693744A (fr)
BE692231A (fr)
AU433620A (fr)
BE690247A (fr)
BE687870A (fr)
BE679009A (fr)
BE676405A (fr)
BE675139A (fr)
BE675084A (fr)
BE674987A (fr)
BE674882A (fr)
BE694445A (fr)
BE674777A (fr)