BE699516A - - Google Patents
Info
- Publication number
- BE699516A BE699516A BE699516DA BE699516A BE 699516 A BE699516 A BE 699516A BE 699516D A BE699516D A BE 699516DA BE 699516 A BE699516 A BE 699516A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US55632866A | 1966-06-09 | 1966-06-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE699516A true BE699516A (xx) | 1967-11-16 |
Family
ID=24220880
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE699516D BE699516A (xx) | 1966-06-09 | 1967-06-05 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3488194A (xx) |
| BE (1) | BE699516A (xx) |
| CH (1) | CH474088A (xx) |
| DE (1) | DE1547805B2 (xx) |
| GB (1) | GB1182616A (xx) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4841941A (xx) * | 1971-10-04 | 1973-06-19 | ||
| US3925079A (en) * | 1972-06-16 | 1975-12-09 | Richard W F Hager | Decorative article and method of making same |
| BG17215A1 (xx) * | 1972-07-17 | 1973-07-25 | ||
| JPS5632614B2 (xx) * | 1973-02-13 | 1981-07-29 | ||
| JPS5821257B2 (ja) * | 1974-04-25 | 1983-04-28 | 富士写真フイルム株式会社 | キンゾクガゾウケイセイザイリヨウ |
| JPS5850342B2 (ja) * | 1975-05-12 | 1983-11-10 | 富士写真フイルム株式会社 | キンゾクガゾウケイセイザイリヨウ |
| US4584261A (en) * | 1984-07-27 | 1986-04-22 | E. I. Du Pont De Nemours And Company | Process for etching nonphotosensitive layer under washoff photopolymer layer |
| US4567129A (en) * | 1984-07-27 | 1986-01-28 | E. I. Du Pont De Nemours And Company | Process for image formation utilizing chemically soluble pigments |
| US7678508B2 (en) * | 2003-03-31 | 2010-03-16 | Hoya Corporation | Method of manufacturing mask blank and method of manufacturing mask |
| CN106406030A (zh) * | 2016-10-14 | 2017-02-15 | 王宝根 | 金属菲林及制作方法 |
| CN107561862B (zh) * | 2017-09-20 | 2020-08-07 | 苏州瑞红电子化学品有限公司 | 适用于gpp二极管制造的负性光刻胶 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2257143A (en) * | 1938-05-23 | 1941-09-30 | Otis F Wood | Reproduction process |
| US2245218A (en) * | 1938-07-27 | 1941-06-10 | Eastman Kodak Co | Water-soluble photographic coating |
| US2489662A (en) * | 1946-09-10 | 1949-11-29 | Light-sensitive photographic | |
| GB763288A (en) * | 1954-06-16 | 1956-12-12 | Kodak Ltd | Improvements in photo mechanical processes and materials therefor |
| US2852379A (en) * | 1955-05-04 | 1958-09-16 | Eastman Kodak Co | Azide resin photolithographic composition |
| US2940853A (en) * | 1958-08-21 | 1960-06-14 | Eastman Kodak Co | Azide sensitized resin photographic resist |
| US3081210A (en) * | 1960-04-04 | 1963-03-12 | Gen Electric | Method for fabricating small elements of thin magnetic film |
| BE614575A (xx) * | 1961-03-02 | |||
| US3123492A (en) * | 1962-02-28 | 1964-03-03 | Maffet |
-
1966
- 1966-06-09 US US556328A patent/US3488194A/en not_active Expired - Lifetime
-
1967
- 1967-06-05 BE BE699516D patent/BE699516A/xx unknown
- 1967-06-07 CH CH807467A patent/CH474088A/fr not_active IP Right Cessation
- 1967-06-08 DE DE19671547805 patent/DE1547805B2/de active Pending
- 1967-06-08 GB GB26403/67A patent/GB1182616A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3488194A (en) | 1970-01-06 |
| DE1547805A1 (de) | 1970-01-29 |
| CH474088A (fr) | 1969-06-15 |
| DE1547805B2 (de) | 1971-02-25 |
| GB1182616A (en) | 1970-02-25 |