BE694654A - - Google Patents

Info

Publication number
BE694654A
BE694654A BE694654DA BE694654A BE 694654 A BE694654 A BE 694654A BE 694654D A BE694654D A BE 694654DA BE 694654 A BE694654 A BE 694654A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE694654A publication Critical patent/BE694654A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/34—Introducing sulfur atoms or sulfur-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
    • C08G59/4014—Nitrogen containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
BE694654D 1966-02-28 1967-02-27 BE694654A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8728/66A GB1136544A (en) 1966-02-28 1966-02-28 Photochemical cross-linking of polymers

Publications (1)

Publication Number Publication Date
BE694654A true BE694654A (zh) 1967-08-28

Family

ID=9858117

Family Applications (1)

Application Number Title Priority Date Filing Date
BE694654D BE694654A (zh) 1966-02-28 1967-02-27

Country Status (6)

Country Link
US (1) US3502470A (zh)
BE (1) BE694654A (zh)
DE (1) DE1522426A1 (zh)
FR (1) FR1511337A (zh)
GB (1) GB1136544A (zh)
NL (1) NL6702042A (zh)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3837860A (en) * 1969-06-16 1974-09-24 L Roos PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
NL7109179A (zh) * 1970-07-13 1972-01-17
US3890153A (en) * 1971-03-13 1975-06-17 Philips Corp Positive-acting napthoquinone diazide photosensitive composition
US3948667A (en) * 1971-06-21 1976-04-06 Japan Synthetic Rubber Company Limited Photosensitive compositions
BE789196A (fr) * 1971-09-25 1973-03-22 Kalle Ag Matiere a copier photosensible
GB1375461A (zh) * 1972-05-05 1974-11-27
DE2236941C3 (de) * 1972-07-27 1982-03-25 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
JPS5024641B2 (zh) * 1972-10-17 1975-08-18
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
JPS5645127B2 (zh) * 1974-02-25 1981-10-24
JPS549619A (en) * 1977-06-23 1979-01-24 Oji Paper Co Photosensitive composition
US4125650A (en) * 1977-08-08 1978-11-14 International Business Machines Corporation Resist image hardening process
US4268602A (en) * 1978-12-05 1981-05-19 Toray Industries, Ltd. Photosensitive O-quinone diazide containing composition
US4517276A (en) * 1982-11-29 1985-05-14 Varian Associates, Inc. Metal-containing organic photoresists
US4600684A (en) * 1983-02-10 1986-07-15 Oki Electric Industry Co., Ltd. Process for forming a negative resist using high energy beam
US4609615A (en) * 1983-03-31 1986-09-02 Oki Electric Industry Co., Ltd. Process for forming pattern with negative resist using quinone diazide compound
DE3685766T2 (de) * 1985-04-18 1993-02-11 Fuji Chem Ind Co Ltd Photolackbildherstellungsverfahren.
WO1997043696A1 (en) * 1996-05-16 1997-11-20 Napp Systems, Inc. Methods to increase the exposure sensitivity of photopolymerizable matrices and apparatus useful therefor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE639500A (zh) * 1962-12-14
US3278305A (en) * 1963-07-12 1966-10-11 Gevaert Photo Prod Nv Photochemical cross-linking of polymers

Also Published As

Publication number Publication date
US3502470A (en) 1970-03-24
GB1136544A (en) 1968-12-11
FR1511337A (fr) 1968-01-26
NL6702042A (zh) 1967-04-25
DE1522426A1 (de) 1969-07-31

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