BE694654A - - Google Patents
Info
- Publication number
- BE694654A BE694654A BE694654DA BE694654A BE 694654 A BE694654 A BE 694654A BE 694654D A BE694654D A BE 694654DA BE 694654 A BE694654 A BE 694654A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/34—Introducing sulfur atoms or sulfur-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
- C08G59/4014—Nitrogen containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8728/66A GB1136544A (en) | 1966-02-28 | 1966-02-28 | Photochemical cross-linking of polymers |
Publications (1)
Publication Number | Publication Date |
---|---|
BE694654A true BE694654A (cs) | 1967-08-28 |
Family
ID=9858117
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE694654D BE694654A (cs) | 1966-02-28 | 1967-02-27 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3502470A (cs) |
BE (1) | BE694654A (cs) |
DE (1) | DE1522426A1 (cs) |
FR (1) | FR1511337A (cs) |
GB (1) | GB1136544A (cs) |
NL (1) | NL6702042A (cs) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3637384A (en) * | 1969-02-17 | 1972-01-25 | Gaf Corp | Positive-working diazo-oxide terpolymer photoresists |
US3837860A (en) * | 1969-06-16 | 1974-09-24 | L Roos | PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS |
US3647443A (en) * | 1969-09-12 | 1972-03-07 | Eastman Kodak Co | Light-sensitive quinone diazide polymers and polymer compositions |
NL7109179A (cs) * | 1970-07-13 | 1972-01-17 | ||
US3890153A (en) * | 1971-03-13 | 1975-06-17 | Philips Corp | Positive-acting napthoquinone diazide photosensitive composition |
US3948667A (en) * | 1971-06-21 | 1976-04-06 | Japan Synthetic Rubber Company Limited | Photosensitive compositions |
BE789196A (fr) * | 1971-09-25 | 1973-03-22 | Kalle Ag | Matiere a copier photosensible |
GB1375461A (cs) * | 1972-05-05 | 1974-11-27 | ||
DE2236941C3 (de) * | 1972-07-27 | 1982-03-25 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Aufzeichnungsmaterial |
JPS5024641B2 (cs) * | 1972-10-17 | 1975-08-18 | ||
US3859099A (en) * | 1972-12-22 | 1975-01-07 | Eastman Kodak Co | Positive plate incorporating diazoquinone |
US4139384A (en) * | 1974-02-21 | 1979-02-13 | Fuji Photo Film Co., Ltd. | Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate |
JPS5645127B2 (cs) * | 1974-02-25 | 1981-10-24 | ||
JPS549619A (en) * | 1977-06-23 | 1979-01-24 | Oji Paper Co | Photosensitive composition |
US4125650A (en) * | 1977-08-08 | 1978-11-14 | International Business Machines Corporation | Resist image hardening process |
US4268602A (en) * | 1978-12-05 | 1981-05-19 | Toray Industries, Ltd. | Photosensitive O-quinone diazide containing composition |
US4517276A (en) * | 1982-11-29 | 1985-05-14 | Varian Associates, Inc. | Metal-containing organic photoresists |
US4600684A (en) * | 1983-02-10 | 1986-07-15 | Oki Electric Industry Co., Ltd. | Process for forming a negative resist using high energy beam |
US4609615A (en) * | 1983-03-31 | 1986-09-02 | Oki Electric Industry Co., Ltd. | Process for forming pattern with negative resist using quinone diazide compound |
DE3685766T2 (de) * | 1985-04-18 | 1993-02-11 | Fuji Chem Ind Co Ltd | Photolackbildherstellungsverfahren. |
WO1997043696A1 (en) * | 1996-05-16 | 1997-11-20 | Napp Systems, Inc. | Methods to increase the exposure sensitivity of photopolymerizable matrices and apparatus useful therefor |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE639500A (cs) * | 1962-12-14 | |||
US3278305A (en) * | 1963-07-12 | 1966-10-11 | Gevaert Photo Prod Nv | Photochemical cross-linking of polymers |
-
1966
- 1966-02-28 GB GB8728/66A patent/GB1136544A/en not_active Expired
-
1967
- 1967-02-08 US US614542A patent/US3502470A/en not_active Expired - Lifetime
- 1967-02-09 FR FR94747A patent/FR1511337A/fr not_active Expired
- 1967-02-10 NL NL6702042A patent/NL6702042A/xx unknown
- 1967-02-25 DE DE19671522426 patent/DE1522426A1/de active Pending
- 1967-02-27 BE BE694654D patent/BE694654A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
GB1136544A (en) | 1968-12-11 |
US3502470A (en) | 1970-03-24 |
NL6702042A (cs) | 1967-04-25 |
FR1511337A (fr) | 1968-01-26 |
DE1522426A1 (de) | 1969-07-31 |