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Publication of BE681026ApublicationCriticalpatent/BE681026A/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/04—Chromates
C—CHEMISTRY; METALLURGY
C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
C08K5/00—Use of organic ingredients
C08K5/04—Oxygen-containing compounds
C08K5/05—Alcohols; Metal alcoholates
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Chemical & Material Sciences
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Physics & Mathematics
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General Physics & Mathematics
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Health & Medical Sciences
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Chemical Kinetics & Catalysis
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Medicinal Chemistry
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Polymers & Plastics
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Organic Chemistry
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Organic Low-Molecular-Weight Compounds And Preparation Thereof
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