BE645051A - - Google Patents

Info

Publication number
BE645051A
BE645051A BE645051DA BE645051A BE 645051 A BE645051 A BE 645051A BE 645051D A BE645051D A BE 645051DA BE 645051 A BE645051 A BE 645051A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE645051A publication Critical patent/BE645051A/xx

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P36/00Gettering within semiconductor bodies
    • H10P36/03Gettering within semiconductor bodies within silicon bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/46Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a liquid
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/40Treatments of semiconductor bodies to modify their internal properties, e.g. to produce internal imperfections
    • H10P95/402Treatments of semiconductor bodies to modify their internal properties, e.g. to produce internal imperfections of silicon bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/40Treatments of semiconductor bodies to modify their internal properties, e.g. to produce internal imperfections
    • H10P95/408Treatments of semiconductor bodies to modify their internal properties, e.g. to produce internal imperfections of Group III-V semiconductors, e.g. to render them semi-insulating
BE645051D 1963-03-18 1964-03-11 BE645051A (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US265612A US3224904A (en) 1963-03-18 1963-03-18 Semiconductor surface cleaning

Publications (1)

Publication Number Publication Date
BE645051A true BE645051A (https=) 1964-07-01

Family

ID=23011172

Family Applications (1)

Application Number Title Priority Date Filing Date
BE645051D BE645051A (https=) 1963-03-18 1964-03-11

Country Status (6)

Country Link
US (1) US3224904A (https=)
BE (1) BE645051A (https=)
DE (1) DE1290789B (https=)
GB (1) GB1059039A (https=)
NL (1) NL6402568A (https=)
SE (1) SE300746B (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3377263A (en) * 1964-09-14 1968-04-09 Philco Ford Corp Electrical system for etching a tunnel diode
US3436259A (en) * 1966-05-12 1969-04-01 Ibm Method for plating and polishing a silicon planar surface
US4261791A (en) * 1979-09-25 1981-04-14 Rca Corporation Two step method of cleaning silicon wafers
US5911889A (en) * 1995-05-11 1999-06-15 Wacker Siltronic Gesellschaft Fur Halbleitermaterialien Aktiengesellschaft Method of removing damaged crystal regions from silicon wafers
DE102005024914A1 (de) * 2005-05-31 2006-12-07 Advanced Micro Devices, Inc., Sunnyvale Verfahren zum Ausbilden elektrisch leitfähiger Leitungen in einem integrierten Schaltkreis

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2323599A (en) * 1940-08-17 1943-07-06 Rca Corp Art of finishing cut-crystal elements
US2771382A (en) * 1951-12-12 1956-11-20 Bell Telephone Labor Inc Method of fabricating semiconductors for signal translating devices

Also Published As

Publication number Publication date
GB1059039A (en) 1967-02-15
SE300746B (https=) 1968-05-06
NL6402568A (https=) 1964-09-21
DE1290789B (de) 1969-03-13
US3224904A (en) 1965-12-21

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