BE592259A - - Google Patents

Info

Publication number
BE592259A
BE592259A BE592259DA BE592259A BE 592259 A BE592259 A BE 592259A BE 592259D A BE592259D A BE 592259DA BE 592259 A BE592259 A BE 592259A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE592259A publication Critical patent/BE592259A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Thiazole And Isothizaole Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BE592259D 1959-06-26 BE592259A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US823005A US3099558A (en) 1959-06-26 1959-06-26 Photopolymerization of vinyl monomers by means of a radiation absorbing component in the presence of a diazonium compound

Publications (1)

Publication Number Publication Date
BE592259A true BE592259A (ja)

Family

ID=25237541

Family Applications (1)

Application Number Title Priority Date Filing Date
BE592259D BE592259A (ja) 1959-06-26

Country Status (4)

Country Link
US (1) US3099558A (ja)
BE (1) BE592259A (ja)
DE (1) DE1235742B (ja)
GB (1) GB893063A (ja)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE593834A (ja) * 1959-08-05
US3244518A (en) * 1960-05-19 1966-04-05 Gen Aniline & Film Corp Process for obtaining multicolor images and a multilayer sheet for use therein
US3286025A (en) * 1962-10-25 1966-11-15 Du Pont Recording process using an electron beam to polymerize a record
US3260599A (en) * 1962-11-19 1966-07-12 Minnesota Mining & Mfg Vesicular diazo copy-sheet containing photoreducible dye
NL141658B (nl) * 1963-05-06 1974-03-15 Bell & Howell Co Werkwijze voor het vervaardigen van fotografisch materiaal, aldus vervaardigd fotografisch materiaal, fotografische registreerwerkwijze en belicht fotografisch materiaal.
US3307943A (en) * 1963-05-14 1967-03-07 Du Pont Image reproduction elements and processes
US3469983A (en) * 1965-07-06 1969-09-30 Gaf Corp Preparation of photopolymer lithographic offset paper plates
US3495987A (en) * 1965-09-03 1970-02-17 Du Pont Photopolymerizable products
US3436215A (en) * 1966-02-16 1969-04-01 Gaf Corp Photopolymerization initiated by electrolysis of a catalyst progenitor exposed through a photoconductive layer
US3506779A (en) * 1967-04-03 1970-04-14 Bell Telephone Labor Inc Laser beam typesetter
CA820828A (en) * 1967-04-03 1969-08-19 General Aniline And Film Corporation Radiation sensitive photopolymerizable composition and its use in preparing a cathode ray tube viewing panel
US3617287A (en) * 1967-08-30 1971-11-02 Du Pont Photopolymerizable elements containing a yellow dye
DE1669723A1 (de) * 1967-09-22 1971-06-09 Basf Ag Indigoide Farbstoffe enthaltende Platten,Folien oder Filme aus photopolymerisierbaren Massen
GB1248569A (en) * 1967-12-04 1971-10-06 Agfa Gevaert Photopolymerisation of ethylenically unsaturated organic compounds
DE1772375A1 (de) * 1968-05-06 1971-03-18 Agfa Gevaert Ag Photographische Silberbromidemulsion mit erhoehter Empfindlichkeit
DE1772867A1 (de) * 1968-07-15 1971-06-16 Agfa Gevaert Ag Sensibilisierung von Schichten aus lichtvernetzbaren Polymeren
GB1277029A (en) * 1968-11-26 1972-06-07 Agfa Gevaert Photopolymerisation of ethylenically unsaturated organic compounds
JPS4918809B1 (ja) * 1970-04-08 1974-05-13
US3637375A (en) * 1970-05-25 1972-01-25 Steven Levinos Photopolymerization utilizing diazosulfonates and photoreducible dyes
US3887379A (en) * 1972-03-30 1975-06-03 Ibm Photoresist azide sensitizer composition
BE788560A (fr) * 1972-06-09 1973-03-08 Du Pont Protection contre le halo dans la formation d'images dans des photopolymeres en couches multiples
JPS523267B2 (ja) * 1972-11-22 1977-01-27
FR2211673B1 (ja) * 1972-12-22 1976-04-23 Robillard Jean
DE2637768C2 (de) * 1976-08-21 1984-11-22 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Aufzeichnungsmaterial und Verfahren zur Herstellung von farbigen Reliefbildern
US4383878A (en) * 1980-05-20 1983-05-17 Minnesota Mining And Manufacturing Company Transfer process
US4985473A (en) * 1980-05-20 1991-01-15 Minnesota Mining And Manufacturing Company Compositions for providing abherent coatings
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
US4937159A (en) * 1985-11-20 1990-06-26 The Mead Corporation Photosensitive materials and compositions containing ionic dye compounds as initiators and thiols as autooxidizers
US5045408A (en) * 1986-09-19 1991-09-03 University Of California Thermodynamically stabilized conductor/compound semiconductor interfaces
US4874450A (en) * 1987-01-29 1989-10-17 The Mead Corporation Laminating transparent or translucent materials using ionic dye-counter ion complexes
US4917977A (en) * 1988-12-23 1990-04-17 E. I. Du Pont De Nemours And Company Visible sensitizers for photopolymerizable compositions
US5079126A (en) * 1989-01-09 1992-01-07 The Mead Corporation Photohardenable composition containing five member aromatic group with imine moiety
JP2571115B2 (ja) * 1989-01-17 1997-01-16 富士写真フイルム株式会社 感光性組成物の増感方法及び増感された感光性組成物
US5593812A (en) * 1995-02-17 1997-01-14 International Business Machines Corporation Photoresist having increased sensitivity and use thereof
US5900346A (en) * 1995-04-06 1999-05-04 Shipley Company, L.L.C. Compositions comprising photoactivator, acid, generator and chain extender
EP2000200B1 (de) * 2007-05-30 2010-08-04 iie Gesellschaft für innovative Industrieelektronik mbH Vorrichtung zur Polymerisation
JP2009191094A (ja) * 2008-02-12 2009-08-27 Fujifilm Corp 光記録用化合物、光記録用組成物およびホログラフィック記録媒体

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2397866A (en) * 1944-03-31 1946-04-02 Du Pont Photographic elements
US2666701A (en) * 1952-10-15 1954-01-19 Eastman Kodak Co Optical sensitization of photomechanical resists
US2875047A (en) * 1955-01-19 1959-02-24 Oster Gerald Photopolymerization with the formation of coherent plastic masses
GB860067A (en) * 1956-06-05 1961-02-01 Dunlop Rubber Co Polymerisation of unsaturated organic compounds
US2996381A (en) * 1957-07-02 1961-08-15 Kalvar Corp Photographic materials and procedures for using same
US3038800A (en) * 1957-12-19 1962-06-12 Eastman Kodak Co Photopolymerization of olefinicallyunsaturated monomers by silver halides

Also Published As

Publication number Publication date
GB893063A (en) 1962-04-04
DE1235742B (de) 1967-03-02
US3099558A (en) 1963-07-30

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