BE569763A - - Google Patents

Info

Publication number
BE569763A
BE569763A BE569763DA BE569763A BE 569763 A BE569763 A BE 569763A BE 569763D A BE569763D A BE 569763DA BE 569763 A BE569763 A BE 569763A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE569763A publication Critical patent/BE569763A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
BE569763D 1957-08-01 BE569763A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK32598A DE1053930B (de) 1957-08-01 1957-08-01 Lichtempfindliches Material fuer die Herstellung von Druckplatten auf photomechanischem Wege

Publications (1)

Publication Number Publication Date
BE569763A true BE569763A (enrdf_load_stackoverflow)

Family

ID=7219491

Family Applications (1)

Application Number Title Priority Date Filing Date
BE569763D BE569763A (enrdf_load_stackoverflow) 1957-08-01

Country Status (8)

Country Link
US (1) US3050387A (enrdf_load_stackoverflow)
BE (1) BE569763A (enrdf_load_stackoverflow)
CH (1) CH370967A (enrdf_load_stackoverflow)
DE (1) DE1053930B (enrdf_load_stackoverflow)
FR (1) FR1210042A (enrdf_load_stackoverflow)
GB (1) GB836341A (enrdf_load_stackoverflow)
NL (2) NL103895C (enrdf_load_stackoverflow)
SE (1) SE310842B (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0388484A1 (de) * 1989-03-20 1990-09-26 Siemens Aktiengesellschaft Hochauflösender Photoresist
EP0388483A1 (de) * 1989-03-20 1990-09-26 Siemens Aktiengesellschaft Verfahren zum Erzeugen einer Photoresiststruktur

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL130712C (enrdf_load_stackoverflow) * 1959-07-29
NL255517A (enrdf_load_stackoverflow) * 1959-09-04
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
NL273552A (enrdf_load_stackoverflow) * 1961-01-25
BE620660A (enrdf_load_stackoverflow) * 1961-07-28
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
US4564575A (en) * 1984-01-30 1986-01-14 International Business Machines Corporation Tailoring of novolak and diazoquinone positive resists by acylation of novolak
US5212042A (en) * 1989-08-22 1993-05-18 Fuji Photo Film Co., Ltd. Positive type light-sensitive composition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1981102A (en) * 1932-08-10 1934-11-20 Agfa Ansco Corp Photographic material and process of making the same
CH307356A (de) * 1951-08-08 1955-05-31 Kalle & Co Ag Lichtempfindliches Material für die photomechanische Reproduktion.
US2754209A (en) * 1952-06-10 1956-07-10 Azoplate Corp Light-sensitive para quinone diazides for making printing plates
NL94867C (enrdf_load_stackoverflow) * 1955-02-25
DE1003576B (de) * 1955-02-25 1957-02-28 Kalle & Co Ag Aus Schichttraeger und lichtempfindlicher, wasserloeslicher oder wasserquellbarer Kolloidschicht bestehendes Material fuer die Herstellung von Gerbbildern

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0388484A1 (de) * 1989-03-20 1990-09-26 Siemens Aktiengesellschaft Hochauflösender Photoresist
EP0388483A1 (de) * 1989-03-20 1990-09-26 Siemens Aktiengesellschaft Verfahren zum Erzeugen einer Photoresiststruktur

Also Published As

Publication number Publication date
GB836341A (en) 1960-06-01
NL230099A (enrdf_load_stackoverflow)
NL103895C (enrdf_load_stackoverflow)
US3050387A (en) 1962-08-21
DE1053930B (de) 1959-03-26
CH370967A (de) 1963-07-31
FR1210042A (fr) 1960-03-04
SE310842B (enrdf_load_stackoverflow) 1969-05-12

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