BE551487A - - Google Patents
Info
- Publication number
- BE551487A BE551487A BE551487DA BE551487A BE 551487 A BE551487 A BE 551487A BE 551487D A BE551487D A BE 551487DA BE 551487 A BE551487 A BE 551487A
- Authority
- BE
- Belgium
Links
Classifications
- 
        - G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
 
- 
        - C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/02—Alkylation
 
- 
        - C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
 
- 
        - C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/44—Preparation of metal salts or ammonium salts
 
- 
        - C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2810/00—Chemical modification of a polymer
- C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
 
- 
        - Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S526/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S526/923—Ethylenic monomers containing at least one salt group
 
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title | 
|---|---|---|---|
| US39770653A | 1953-12-11 | 1953-12-11 | |
| US538910A US2908667A (en) | 1953-12-11 | 1955-10-06 | Photographic process using light-sensitive polymeric quaternary salts | 
Publications (1)
| Publication Number | Publication Date | 
|---|---|
| BE551487A true BE551487A (OSRAM) | 
Family
ID=27015967
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date | 
|---|---|---|---|
| BE551487D BE551487A (OSRAM) | 1953-12-11 | 
Country Status (4)
| Country | Link | 
|---|---|
| US (1) | US2908667A (OSRAM) | 
| BE (1) | BE551487A (OSRAM) | 
| FR (1) | FR1161178A (OSRAM) | 
| GB (1) | GB844767A (OSRAM) | 
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| BE588780A (OSRAM) * | 1959-03-17 | |||
| NL128039C (OSRAM) * | 1959-07-01 | 1969-08-15 | ||
| GB1098892A (en) * | 1965-04-08 | 1968-01-10 | Agfa Gevaert Ag | Photosensitive materials prepared from homopolymers and copolymers of salts of n-vinylbenzyl-4-vinylpyridine | 
| US3907753A (en) * | 1971-12-20 | 1975-09-23 | Phillips Petroleum Co | Sewage and water treatment with aldehyde modified quaternary salts of vinylpyridine copolymers | 
| US3892570A (en) * | 1972-04-18 | 1975-07-01 | Xerox Corp | Light activating imaging process | 
| US3890147A (en) * | 1972-04-18 | 1975-06-17 | Xerox Corp | Light activating imaging process | 
| US3892180A (en) * | 1972-04-18 | 1975-07-01 | Xerox Corp | Light activating imaging process | 
| DE2754403A1 (de) | 1977-12-07 | 1979-06-13 | Basf Ag | Methinfarbstoffe | 
| US4259421A (en) * | 1979-06-04 | 1981-03-31 | Rca Corporation | Improving etch-resistance of casein-based photoresist pattern | 
| US4355095A (en) * | 1980-11-26 | 1982-10-19 | Cousins William Walter | Method for producing a photomechanical color image using a strippable photostencil and water-permeable, water-insoluble color media | 
| JPS59174831A (ja) * | 1983-03-24 | 1984-10-03 | Fuji Photo Film Co Ltd | 光重合性組成物 | 
| US5334485A (en) * | 1991-11-05 | 1994-08-02 | The Chromaline Corporation | Acid soluble photo-resist comprising a photosensitive polymer | 
| US5326669A (en) * | 1992-05-04 | 1994-07-05 | Ulano Corporation | Photosensitive compositions | 
| US5360864A (en) * | 1992-05-04 | 1994-11-01 | Ulano Corporation | Process for preparation of photosensitive composition | 
| US6020436A (en) * | 1993-03-09 | 2000-02-01 | The Chromaline Corporation | Photosensitive resin composition | 
| US5415971A (en) * | 1993-04-02 | 1995-05-16 | The Chromaline Corporation | Photoresist laminate including photoimageable adhesive layer | 
| US9389512B2 (en) | 2014-09-30 | 2016-07-12 | Eastman Kodak Company | Forming conductive metal patterns using water-soluble polymers | 
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title | 
|---|---|---|---|---|
| GB573798A (en) * | 1943-12-09 | 1945-12-06 | Kodak Ltd | Improvements in the production of photographic stencils | 
| US2500052A (en) * | 1948-06-02 | 1950-03-07 | Eastman Kodak Co | Photographic reversal copying process | 
| US2571761A (en) * | 1949-04-14 | 1951-10-16 | Eastman Kodak Co | Method of reacting tertiary amines with polyvinyl esters and products obtained thereby | 
| US2531468A (en) * | 1949-04-14 | 1950-11-28 | Eastman Kodak Co | Polyvinyl sulfonates and process for their preparation | 
| US2725368A (en) * | 1952-12-09 | 1955-11-29 | Eastman Kodak Co | Preparation of polyvinylbenzene sulfonyl chlorides and derivatives thereof | 
| US2811443A (en) * | 1955-09-15 | 1957-10-29 | Eastman Kodak Co | Photographic reproduction process using light sensitive polymeric stilbazoles and quaternary salts thereof | 
- 
        0
        - BE BE551487D patent/BE551487A/xx unknown
 
- 
        1955
        - 1955-10-06 US US538910A patent/US2908667A/en not_active Expired - Lifetime
 
- 
        1956
        - 1956-10-06 FR FR1161178D patent/FR1161178A/fr not_active Expired
- 1956-10-08 GB GB30680/56A patent/GB844767A/en not_active Expired
 
Also Published As
| Publication number | Publication date | 
|---|---|
| US2908667A (en) | 1959-10-13 | 
| GB844767A (en) | 1960-08-17 | 
| FR1161178A (fr) | 1958-08-22 |