US3002537A
(en)
*
|
1954-05-27 |
1961-10-03 |
Nat Standard Co |
Machine for continuously treating heavy wire and similar strip material
|
US2893933A
(en)
*
|
1956-10-01 |
1959-07-07 |
Incar Inc |
Nickel plating compositions and method
|
US3082508A
(en)
*
|
1957-01-07 |
1963-03-26 |
Tno |
Heat flowmeter and device for the construction thereof
|
DE1086960B
(de)
*
|
1957-02-27 |
1960-08-11 |
Herbert Kenmore |
Verfahren und Vorrichtung zum kontinuierlichen Herstellen von galvanisierten drahtaehnlichen Erzeugnissen
|
BE573063A
(nl)
*
|
1957-11-18 |
|
|
|
US2957643A
(en)
*
|
1958-11-24 |
1960-10-25 |
Chicago Bridge & Iron Co |
Reel for wire coils
|
US3241218A
(en)
*
|
1962-01-05 |
1966-03-22 |
New Twist Connector Corp |
Method of fabricating pin connectors
|
US3286499A
(en)
*
|
1963-11-12 |
1966-11-22 |
United States Steel Corp |
Apparatus for coiling wire
|
FR1406510A
(fr)
*
|
1964-04-29 |
1965-07-23 |
Meusienne Const Mec |
Perfectionnements aux dispositifs de traitement en continu de fils ou bandes métalliques
|
US3348394A
(en)
*
|
1964-05-05 |
1967-10-24 |
Meusienne Const Mec |
Apparatus for continuously displacing a filamentary material in a treatment installation
|
US3439851A
(en)
*
|
1967-04-25 |
1969-04-22 |
Deutsche Edelstahlwerke Ag |
Method of and apparatus for introducing wire into a surface treating chamber
|
US4374719A
(en)
*
|
1982-03-19 |
1983-02-22 |
United States Steel Corporation |
System for electrolytic cleaning of metal wire in loop form
|
EP1052062A1
(en)
*
|
1999-05-03 |
2000-11-15 |
Applied Materials, Inc. |
Pré-conditioning fixed abrasive articles
|
US7059948B2
(en)
|
2000-12-22 |
2006-06-13 |
Applied Materials |
Articles for polishing semiconductor substrates
|
US20040020789A1
(en)
*
|
2000-02-17 |
2004-02-05 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US7066800B2
(en)
|
2000-02-17 |
2006-06-27 |
Applied Materials Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US7374644B2
(en)
|
2000-02-17 |
2008-05-20 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US7670468B2
(en)
*
|
2000-02-17 |
2010-03-02 |
Applied Materials, Inc. |
Contact assembly and method for electrochemical mechanical processing
|
US6991528B2
(en)
*
|
2000-02-17 |
2006-01-31 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US7077721B2
(en)
*
|
2000-02-17 |
2006-07-18 |
Applied Materials, Inc. |
Pad assembly for electrochemical mechanical processing
|
US6962524B2
(en)
*
|
2000-02-17 |
2005-11-08 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US7303462B2
(en)
*
|
2000-02-17 |
2007-12-04 |
Applied Materials, Inc. |
Edge bead removal by an electro polishing process
|
US7029365B2
(en)
*
|
2000-02-17 |
2006-04-18 |
Applied Materials Inc. |
Pad assembly for electrochemical mechanical processing
|
US6979248B2
(en)
*
|
2002-05-07 |
2005-12-27 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US20050092621A1
(en)
*
|
2000-02-17 |
2005-05-05 |
Yongqi Hu |
Composite pad assembly for electrochemical mechanical processing (ECMP)
|
US7125477B2
(en)
*
|
2000-02-17 |
2006-10-24 |
Applied Materials, Inc. |
Contacts for electrochemical processing
|
US7678245B2
(en)
*
|
2000-02-17 |
2010-03-16 |
Applied Materials, Inc. |
Method and apparatus for electrochemical mechanical processing
|
US7303662B2
(en)
*
|
2000-02-17 |
2007-12-04 |
Applied Materials, Inc. |
Contacts for electrochemical processing
|
US7137879B2
(en)
|
2001-04-24 |
2006-11-21 |
Applied Materials, Inc. |
Conductive polishing article for electrochemical mechanical polishing
|
US7344432B2
(en)
|
2001-04-24 |
2008-03-18 |
Applied Materials, Inc. |
Conductive pad with ion exchange membrane for electrochemical mechanical polishing
|
US20050194681A1
(en)
*
|
2002-05-07 |
2005-09-08 |
Yongqi Hu |
Conductive pad with high abrasion
|
CA2438289A1
(en)
*
|
2002-08-26 |
2004-02-26 |
Robert Joseph Foster |
Straightening system for tubing
|
US20050178666A1
(en)
*
|
2004-01-13 |
2005-08-18 |
Applied Materials, Inc. |
Methods for fabrication of a polishing article
|
US20060030156A1
(en)
*
|
2004-08-05 |
2006-02-09 |
Applied Materials, Inc. |
Abrasive conductive polishing article for electrochemical mechanical polishing
|
US7084064B2
(en)
|
2004-09-14 |
2006-08-01 |
Applied Materials, Inc. |
Full sequence metal and barrier layer electrochemical mechanical processing
|
WO2006039436A2
(en)
*
|
2004-10-01 |
2006-04-13 |
Applied Materials, Inc. |
Pad design for electrochemical mechanical polishing
|
US7520968B2
(en)
*
|
2004-10-05 |
2009-04-21 |
Applied Materials, Inc. |
Conductive pad design modification for better wafer-pad contact
|
US7427340B2
(en)
*
|
2005-04-08 |
2008-09-23 |
Applied Materials, Inc. |
Conductive pad
|
TW200720494A
(en)
*
|
2005-11-01 |
2007-06-01 |
Applied Materials Inc |
Ball contact cover for copper loss reduction and spike reduction
|
CA2633795C
(en)
*
|
2008-06-05 |
2012-11-27 |
Glen Corbeil |
Tubing straightener
|