BE422106A - - Google Patents

Info

Publication number
BE422106A
BE422106A BE422106DA BE422106A BE 422106 A BE422106 A BE 422106A BE 422106D A BE422106D A BE 422106DA BE 422106 A BE422106 A BE 422106A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE422106A publication Critical patent/BE422106A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
BE422106D 1936-06-17 1937-06-15 BE422106A (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE481842X 1936-06-17

Publications (1)

Publication Number Publication Date
BE422106A true BE422106A (en:Method) 1937-07-31

Family

ID=6542728

Family Applications (1)

Application Number Title Priority Date Filing Date
BE422106D BE422106A (en:Method) 1936-06-17 1937-06-15

Country Status (4)

Country Link
US (1) US2157478A (en:Method)
BE (1) BE422106A (en:Method)
FR (1) FR823175A (en:Method)
GB (1) GB481842A (en:Method)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT380674A (en:Method) * 1939-02-22
US2463180A (en) * 1943-04-29 1949-03-01 Bell Telephone Labor Inc Method and apparatus for making mosaic targets for electron beams
US2724057A (en) * 1944-01-21 1955-11-15 Westinghouse Electric Corp Ionic centrifuge
US2428868A (en) * 1944-05-01 1947-10-14 Rca Corp Apparatus for producing hardened optical coatings by electron bombardment
US2420724A (en) * 1944-09-21 1947-05-20 Bausch & Lomb Method of depositing films of material
US2434930A (en) * 1944-12-01 1948-01-27 Bell Telephone Labor Inc Method and apparatus for ionic discharge coating
US2434931A (en) * 1944-12-01 1948-01-27 Bell Telephone Labor Inc Method and apparatus for ionic discharge coating
US2423051A (en) * 1945-09-05 1947-06-24 Ruben Samuel Selenium depositing machine
US2527747A (en) * 1946-01-03 1950-10-31 Margaret N Lewis Apparatus for coating articles by thermal evaporation
US2562358A (en) * 1946-02-21 1951-07-31 William C Huebner Apparatus for making sheet or web material
US2615822A (en) * 1946-02-21 1952-10-28 William C Huebner Method of making sheet or web material
US2702523A (en) * 1947-06-09 1955-02-22 Rene J Prestwood Apparatus for vapor coating base material in powder form
US2577894A (en) * 1948-01-16 1951-12-11 Carlyle W Jacob Electronic signal recording system and apparatus
US2600129A (en) * 1948-07-17 1952-06-10 Charles H Richards Apparatus for producing a stream of electrically charged multimolecular particles
US2584660A (en) * 1949-09-24 1952-02-05 Eastman Kodak Co Vacuum coating process and apparatus therefor
CH311812A (de) * 1951-11-05 1955-12-15 Zeiss Carl Fa Aufdampfeinrichtung.
US2753800A (en) * 1952-03-24 1956-07-10 Ohio Commw Eng Co Production of printing plates
US2932588A (en) * 1955-07-06 1960-04-12 English Electric Valve Co Ltd Methods of manufacturing thin films of refractory dielectric materials
US2996418A (en) * 1957-06-05 1961-08-15 Gen Motors Corp Method and apparatus for vapor depositing thin films
US3071533A (en) * 1958-09-11 1963-01-01 Varo Mfg Co Inc Deposition control means
US3277865A (en) * 1963-04-01 1966-10-11 United States Steel Corp Metal-vapor source with heated reflecting shield
US3305473A (en) * 1964-08-20 1967-02-21 Cons Vacuum Corp Triode sputtering apparatus for depositing uniform coatings
US3419487A (en) * 1966-01-24 1968-12-31 Dow Corning Method of growing thin film semiconductors using an electron beam
US3492215A (en) * 1967-02-27 1970-01-27 Bendix Corp Sputtering of material simultaneously evaporated onto the target
US3491015A (en) * 1967-04-04 1970-01-20 Automatic Fire Control Inc Method of depositing elemental material from a low pressure electrical discharge
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3684268A (en) * 1970-04-17 1972-08-15 Optical Coating Laboratory Inc Source for evaporating materials
US3913520A (en) * 1972-08-14 1975-10-21 Precision Thin Film Corp High vacuum deposition apparatus
US4176311A (en) * 1976-12-23 1979-11-27 General Electric Company Positive ion smoke detector using a tungsten wire preheated in hydrogen to increase sensitivity
US4351855A (en) * 1981-02-24 1982-09-28 Eduard Pinkhasov Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
DE3842919C2 (de) * 1988-12-21 1995-04-27 Calor Emag Elektrizitaets Ag Schaltstück für einen Vakuumschalter
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
KR100754404B1 (ko) * 2006-05-25 2007-08-31 삼성전자주식회사 확산튜브와, 확산공정용 도펀트 소스 및 상기 확산튜브와도펀트 소스를 이용한 확산방법
US20120090544A1 (en) * 2010-10-18 2012-04-19 Kim Mu-Gyeom Thin film deposition apparatus for continuous deposition, and mask unit and crucible unit included in thin film deposition apparatus
KR101207719B1 (ko) * 2010-12-27 2012-12-03 주식회사 포스코 건식 코팅 장치

Also Published As

Publication number Publication date
FR823175A (fr) 1938-01-15
GB481842A (en) 1938-03-18
US2157478A (en) 1939-05-09

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