BE1030374A1 - METHOD FOR PRODUCING CARBON NANOMATERIAL PATTERNS ON SUBSTRATE WITH SURFACE MICROSTRUCTURE AND FLEXIBLE CONDUCTIVE MATERIAL - Google Patents

Abstract

The present invention relates to the technical field of flexible electrodes and discloses a method for producing carbon nanomaterial patterns on a surface microstructured substrate and a flexible conductive material. The method includes: applying a low-dimensional carbon nanomaterial dispersed ink to the surface of a surface microstructured substrate and forming a conductive film after drying; Coating the conductive film with a light-curing resin, covering it with a transparent substrate, and then curing the light-curing resin using a laser beam, wherein the light-curing resin located in the area irradiated by the laser beam forms a close bond with a part of the low-dimensional carbon nanomaterial forms on the conductive film; Removing the transparent substrate so that the tight junction in the area irradiated by the laser beam peels away from the surface microstructure substrate, with the remaining part of the low-dimensional carbon nanomaterial on the conductive film forming a pattern on the surface microstructure substrate. The method enables the formation of low-dimensional carbon nanomaterial patterns on a substrate with surface microstructure in a simple manner without the need for large equipment and complex steps, and the method has the characteristics of low energy consumption and quick and easy operation.

Description

METHOD FOR PRODUCING

CARBON NANOMATERIAL PATTERNS ON SUBSTRATE WITH

SURFACE MICROSTRUCTURE AND FLEXIBLE CONDUCTIVENESS

MATERIAL

TECHNICAL FIELD

The present invention relates to the technical field of flexible electrodes, in particular a method for producing = low-dimensional electrodes

Carbon nanomaterial patterns on a surface microstructured substrate and a flexible conductive material.

STATE OF THE ART

The Internet of Things era is a world where everything is connected.

Portable electronic devices that are flexible, thin, lightweight and foldable and adapt to

Adapting bodies will be the bridge to connect people and things. Rough conductive films with surface microstructures are ideal for flexible, wearable devices such as stretchable conductors, pressure sensors, displays,

Supercapacitors, electrical nanoregenerators through friction, sensors and

Strain sensors. In view of easy access and low cost, the electrodes of these devices use plant leaf surfaces, sandpaper, salt particles and other materials as templates. These electrodes were used in the laboratory as

Prototypes manufactured, but for further industrial applications is a specific

Pattern required to form the electrical layout of each functional layer.

Low-dimensional carbon nanomaterials such as carbon nanotubes and graphene have much to offer due to their excellent electrical and physical properties

attracted attention. The production of low-dimensional

Carbon nanomaterial patterning on substrates with surface microstructure makes it possible to bring the advantages of low-dimensional carbon nanomaterials to flexible devices

Apply surface microstructures. Industry and science have one

Variety of methods developed to low dimensional

to produce carbon nanomaterial patterns, including photolithography, printing,

Vacuum filtration, transfer printing, modulation of interfacial adhesion and wetting

Dehumidification assembly techniques. Current research in the field of manufacturing

Patterning has focused on developing a simple, etching-free, low-cost, environmentally friendly or even one-step pattern making process to obtain fine patterns. These methods are based on the selective

Exposure step of industrial photolithography, which involves the formation of fine patterns

The help of light screens facilitates and at the same time multi-stage production and

Etching processes avoided.

The production of patterns as opposed to smooth surfaces can involve the application of many

Restrict techniques, such as printing techniques in which the microstructure of the rough

Surface can distort the predetermined path of the ink when applied. Also the

Interfacial fracture, which relies on the control of the elastic die release rate, can only achieve material transfer between flat surfaces. During mask-assisted vacuum film deposition or spraying, the pattern can be distorted due to the incomplete fit between the rough surface and the mask. The limited flow of pressure sensitive adhesives on UV tapes cannot ensure that the low dimensional carbon nanomaterials in the

Depressions are completely taken along. With liquid photoresist rough

Surfaces are filled and fine patterns are defined by photo masks, but the

Photolithography process involves toxic substances and is relatively complex

procedures connected.

Currently, the process for producing low-dimensional

However, carbon nanomaterial patterns are usually carried out on flat and smooth surfaces, and no studies have been carried out on a method for producing low-dimensional carbon nanomaterial patterns on substrates

Surface microstructure using the known method for producing

Patterns reported.

CONTENT OF THE PRESENT INVENTION

A first purpose of the present invention is to provide a method for producing low-dimensional carbon nanomaterial patterns on a substrate

To provide surface microstructure. The method enables the formation of low-dimensional carbon nanomaterial patterns on a substrate

Surface microstructure in a simple way, without the need for large

Equipment and complex steps, the procedure has the characteristics of low

Energy consumption and the quick and easy process and avoids the

Flammability and explosion and the dangers of toxic substances caused by the chemical etching step in traditional photolithography processes to achieve the goals of economic efficiency, environmental protection and low carbon emissions.

A second purpose of the present invention is to provide a flexible conductive material having low-dimensional nanomaterial patterns, the flexible conductive material being produced by using the above method

Substrates with surface microstructure can be treated with low-dimensional nanomaterial patterns using a transfer printing process, which is conducive to wearable

To realize applications of electronic skin as well as the production of various sensors, and has broad application prospects.

The present invention is realized by the following technical solution:

In a first aspect, the present invention provides a method for producing low-dimensional carbon nanomaterial patterns on a substrate

Surface microstructure available, characterized in that it comprises:

Applying a low-dimensional carbon nanomaterial dispersed ink to the surface of a surface microstructured substrate and forming a conductive

film after drying;

Coating the conductive film with a light-curing resin, covering it with a transparent substrate, and then curing the light-curing resin using a laser beam, wherein the light-curing resin located in the area irradiated by the laser beam forms a close bond with a part of the low-dimensional Carbon nanomaterial forms on the conductive film, and the laser beam has a wavelength of 390-420 nm and a power of 39-45 Mw / cm? having;

Removing the transparent substrate so that the tight connection is in the of the

Laser beam irradiated area detaches from the substrate with surface microstructure, the remaining part of the low-dimensional carbon nanomaterial on the conductive film forming a pattern on the substrate with surface microstructure.

In a preferred embodiment of the present invention, the above transparent substrate is further a plastic substrate having a hydrophilic or hydrophobic nature

Surface.

In a preferred embodiment of the present invention, when the transparent substrate is a plastic substrate having a hydrophilic surface, after curing the light-curing resin using a laser beam, the transparent substrate is integrally adhered to the narrow connecting body, the narrow

Connecting body when removing the transparent substrate to detach from the

Substrate with surface microstructure is brought.

In a preferred embodiment of the present invention, when the transparent substrate is a plastic substrate having a hydrophobic surface, the method includes:

Surface microstructure after removing the transparent substrate: Soak the substrate with surface microstructure in an ethanol solution for 5-10 min.

In a preferred embodiment of the present invention, the above low-dimensional carbon nanomaterial includes graphene, carbon nanotubes,

Carbon nanofibers, nanometallic particles encapsulated in carbon, fullerenes and carbon quantum dots.

In a preferred embodiment of the present invention, im

Manufacturing process of the conductive film the coating process the

Drop coating, the slot coating, the Mayer rod coating, the

Spin coating, inkjet coating or the

Vacuum filtration coating.

In a preferred embodiment of the present invention, the

Drying temperature in the manufacturing process of the conductive film 50-150°C.

In a preferred embodiment of the present invention, the above light-curing resin further comprises a modified resin of an acrylate system and a modified

Resin of an epoxy resin system.

In a preferred embodiment of the present invention, in the process of curing the light-curing resin, the laser beam 5 is patterned using a laser beam in a direct notation manner, the spot size of the

Laser beam determines the line width of the pattern.

In a second aspect, the present invention further provides a flexible conductive

Material with low-dimensional nanomaterial patterns available through

Applying an elastic material to the surface of the substrate

Surface microstructure with low-dimensional nanomaterial patterns and

Performing a transfer printing process is obtained, using the substrate

Surface microstructure with low-dimensional nanomaterial patterns

Using the above method for making pattern is made.

Compared to the prior art, the present invention has at least the following technical effects:

The method for producing low-dimensional carbon nanomaterial patterns on a surface microstructured substrate provided by the present application uses a surface microstructured substrate such as:

Sandpaper, sheets, etc. on which a conductive film is formed, because the light-curing resin does not adhere well to the light-curing resin when irradiated by the laser beam for a short time

Substrate with surface microstructure can achieve, it is easy to use the substrate

Surface microstructure using some methods such as soaking in ethanol,

Tear off the hydrophilic plastic substrate etc., completely detaching and removing the low-dimensional carbon nanomaterials on the substrate

Surface microstructure form a close connection with the light-curing resin, while removing the remaining part of the low-dimensional

Carbon nanomaterials on the conductive film continue to adhere to the substrate

Surface microstructure adheres to form a low-dimensional nanomaterial pattern. The low-dimensional carbon nanopattern formed can be with a

Transfer printing process can be transferred to other materials to create a flexible conductive

Material with low-dimensional carbon nanopatterns for further applications in

in the field of stretchable conductors, sensors and wearable electronic devices.

The present application enables the production of low-dimensional ones for the first time

Carbon nanomaterial patterns on substrates with surface microstructure, facilitating further commercialization of low-dimensional electronic devices

Carbon nanopatterns with surface microstructure will facilitate. Such flexible ones

Electrodes or electronic connections with low dimensional

Carbon nanopatterns facilitate their stress dispersion in states with large

Deformation. The patterned silver nanowires can be transferred to other wearable substrates using elastic resins under conventional conditions

Process often no patterned conductive thin film can be formed.

The method for producing patterns provided in the present application has the technical advantages of simplicity, low energy consumption,

Time efficiency, no etching and few steps. The advantages of the simple

Technology and the few steps help reduce the frequency of errors in multi-stage

reduce processes, improve product yield and reduce costs; the

Advantages of low energy consumption and the absence of etching avoid the

Flammability and explosion and the dangers of toxic substances caused by the chemical etching step in traditional photolithography processes, and achieve the goals of economic efficiency, environmental protection and low

Carbon emissions

BRIEF DESCRIPTION OF THE DRAWINGS

Figure 1 shows a schematic diagram of the process flow of the first

Embodiment of the present invention.

Figure 2 shows a carbon nanotube pattern on the sandpaper that appears in the first

Embodiment of the present invention is produced.

Figure 3 shows a flexible conductive material with carbon nanotube patterns provided in a seventh embodiment of the present invention.

DETAILED DESCRIPTION

The embodiments of the present invention are described below

Connection with the exemplary embodiments will be explained in more detail, although the person skilled in the art in this field can understand that the following exemplary embodiments are only for

Illustrative of the present invention and not as a limitation

The scope of the present invention should be considered in the

Specific conditions not specified in the embodiments are carried out according to conventional or manufacturer-recommended conditions and the reagents or devices used, for which the manufacturer is not specified, are conventional products that are commercially available.

The present invention uses the following technical solution: a method for producing low-dimensional carbon nanomaterial patterns on a surface microstructured substrate, comprising the following steps:

Step S1: Applying a low-dimensional carbon nanomaterial dispersed ink to the surface of a substrate having a surface microstructure and

forming a conductive film after drying;

In the present embodiment, the surface microstructured substrate may be an artificially manufactured product having a surface microstructured surface, such as sandpaper, etc.; it can also be an object with a surface

Surface microstructure in nature, such as plant leaves, salt particles, etc. The

Microstructure of human epidermis is similar to that of sandpaper. As the largest organ in the human body, the skin plays an important role in protecting the

body tissue and in receiving information about external stimuli, and wearable electronics is evolving towards an electronic skin that has a similar

Functions like human skin. Therefore, this method contributes to the formation of low-dimensional carbon nanopatterns on a substrate

Surface microstructure contributes to the development of wearable electronic skins.

A low-dimensional carbon nanomaterial dispersed ink is an organic solution that contains a low-dimensional carbon nanomaterial in a

Concentration of 2-8% by weight, preferably 3-7% by weight, more preferably 4-6% by weight. Low-dimensional carbon nanomaterials include one- or two-dimensional carbon nanomaterials, such as graphene, carbon nanotubes,

Carbon nanofibers, nanometallic particles encapsulated in carbon, fullerenes and carbon quantum dots. These materials have advantageous conductive properties

Characteristics.

In the manufacturing process of the conductive film, the drying temperature is 50-150°C and the drying time is 20-40 min. The drying temperature is preferably 70-130°C, more preferably 90-10°C. The inventors discovered that one...

Drying temperature of 50-150°C the low-dimensional carbon nanomaterials are better bonded together and adhere to the substrate to prevent the low-dimensional carbon nanomaterials from being irradiated by the laser

Remove the area from the substrate in the subsequent process; if the drying temperature is below this temperature range, the are low dimensional

Carbon nanomaterials not ideally patterned; and above this temperature range, the low-dimensional carbon nanomaterials tend to melt and

Oxidize.

Further, in the manufacturing process of the conductive film, the coating process includes

Drop coating, the slot coating, the Mayer rod coating, the

Spin coating, inkjet coating or the

Vacuum filtration coating. Drop coating or that is preferred

Vacuum filtration coating. Here, vacuum filtration coating refers to applying the ink containing the low-dimensional carbon nanomaterials to a filter membrane with a microstructured surface by vacuum filtration and then filtering it with deionized water to remove the non-low-dimensional carbon nanomaterials from the ink.

Step S2: Coating the conductive film with a light-curing resin, covering it with a transparent substrate, and then curing the light-curing resin using a laser beam, wherein the light-curing resin located in the area irradiated by the laser beam forms a close bond with one Part of the low-dimensional carbon nanomaterial forms on the conductive film, and the laser beam has a wavelength of 390-420nm and a power of 39-45 Mw/cm? having;

The light-curing resin in the present application, which is also referred to as a light-sensitive resin, is an oligomer that undergoes rapid physical and chemical changes in a relatively short time when exposed to light and can thereby crosslink and harden. A light-curing resin is a light-sensitive resin with a low molecular weight and has reactive groups that can be light-cured, such as unsaturated double bonds or epoxy groups. Preferably, the light-curing resin includes a modified resin of an acrylate system and a modified resin of an epoxy resin system. The modified resin has the

Acrylate system offers the combined benefits of a variety of resins.

After coating the conductive film with the light-curing resin and covering it with a transparent substrate, the transparent substrate is compressed so that the excess liquid resin is squeezed out and the transparent substrate fits closely to the surface microstructured substrate.

In the above process of curing the light curing resin using a

Laser beam, the laser beam has a wavelength of 390-420 nm (preferably 400-410 nm, particularly preferably 403-407 nm) and a power of 39-45 Mw/cm? (preferably 40-44

Mw/cm?, particularly preferably 42-43 Mw/cm?), with the irradiation time being 0.5-1 s.

The inventors found that the light-curing resin at a short

Irradiation time with the laser does not provide good adhesion to the substrate

Surface microstructure can achieve, which is conducive to subsequent detachment by soaking in ethanol or direct separation when rubbing the hydrophilic

plastic substrate to leave patterned low-dimensional nanomaterials on the substrate with surface microstructure. When the irradiation time is more than 0.5 s, the light-curing resin adheres well to the substrate with surface microstructure and is less easy to peel off, while when the irradiation time is less than 1 s, the resin is hard to cure. The control of the laser wavelength in the range of 390-420 nm and the

Power in the range of 39-45 Mw/cm° helps the resin cure quickly without damaging the material and substrate.

Furthermore, the laser beam is provided with a pattern in a direct notation, the

Spot size of the laser beam determines the line width of the pattern. The laser beam hardens the light-curing resin located on the conductive film in a patterned manner by direct writing.

Further, the above transparent substrate is a plastic substrate having a hydrophilic or hydrophobic surface. This plastic substrate is coated with a hydrophilic or hydrophobic material to provide a hydrophilic surface or a hydrophobic one

to form surface. Furthermore, the transparent substrate is a plastic substrate with a hydrophobic surface.

Step S3: Removing the transparent substrate so that the tight junction in the area irradiated by the laser beam peels away from the surface microstructure substrate, with the remaining part of the low-dimensional carbon nanomaterial on the conductive film forming a pattern on the surface microstructure substrate.

Further includes detaching the tight connection in the area irradiated by the laser beam

Area of the substrate with surface microstructure the following two

Implementations:

Implementation 1: when the transparent substrate is a plastic substrate with a hydrophilic surface, after curing the light-curing resin using a laser beam, the transparent substrate is integrally adhered to the narrow one

Connecting body, the tight connecting body when removing the transparent

Substrate is caused to be detached from the substrate having surface microstructure, i.e. in the process of removing the transparent substrate, the transparent substrate drives the light-curing resin located in the area irradiated with the laser beam to form together with a part of the low-dimensional

Carbon nanomaterials on the conductive film of the substrate

Peel off surface microstructure, while the remaining part of the low-dimensional nanomaterials on the conductive film continues to adhere to the surface microstructure substrate and form a low-dimensional nanomaterial pattern.

Implementation 2: if the clear substrate is a plastic substrate with a hydrophobic surface, the clear substrate does not adhere to the light-curing one

Resin when briefly irradiated with a laser beam. The method for releasing the tight bond from the surface microstructured substrate after removing the transparent substrate includes: soaking the surface microstructured substrate in an ethanol solution for 5-10 minutes (preferably 7-9 minutes). Since the light-curing resin does not have good adhesion to the substrate with a short irradiation time with the laser

can achieve surface microstructure, it will swell and peel off from the surface microstructure substrate during the dipping process in ethanol, taking with it the low-dimensional nanomaterials on the surface microstructure substrate, which form a close connection with the light-curing resin, while the remaining part of the low-dimensional nanomaterials continues to adhere the substrate

Surface microstructure adheres. Thus, by designing the pattern,

Irradiating the laser beam onto a low-dimensional nanomaterial pattern with a corresponding pattern formed on the substrate with surface microstructure.

In the substrate with surface microstructure with low dimensional

Carbon nanomaterial patterns obtained by the above method of the present invention

Application was obtained, the formed low-dimensional carbon nanopattern can be transferred to other materials using a transfer printing process to obtain a flexible conductive material with low-dimensional carbon nanopatterns.

In particular, the surface of the patterned substrate with surface microstructure is then coated with another elastic material, and after curing and

Removing the elastic material sticks the patterned low dimensional ones

Carbon nanomaterials on the bottom surface of the elastic material to obtain a flexible conductive material with low-dimensional carbon nanopatterns.

The elastic material may be a light-curing resin, a polydimethylsiloxane, polyurethane or epoxy resin.

This flexible conductive material with low-dimensional carbon nanopatterns will continue to be used in the field of flexible wearable devices such as stretchable conductor, pressure sensors,

Supercapacitors, electrical nanoregenerators through friction, sensors and

Strain sensors etc. are further used and has excellent performance.

The detailed embodiments of the present invention are explained in more detail below. It goes without saying that the detailed information described here

Embodiments are intended to illustrate the present invention only, rather than limit the present invention.

Example 1

The present embodiment provides a method for producing low-dimensional carbon nanotube patterns on a substrate

Surface microstructure is available, the flowchart of which is as shown in Figure 1, and which comprises: (1) applying a low-dimensional carbon nanotube (with a

Concentration of carbon nanotubes of 4% by weight of dispersed ink through the

Drop coating on the surface of a substrate with a surface microstructure,

Heating and drying at 90°C for 30 min to form a conductive film; (2) coating the conductive film with a light-curing resin (acrylate system),

Covering with a clear plastic substrate with a hydrophobic surface,

Squeezing out the excess liquid resin, then curing the light-curing resin using the laser beam after the transparent

Substrate was tightly attached to the sandpaper, with the wavelength of the laser beam being 405 nm

Power 42 Mw/cm? and the irradiation time is 1 s; after irradiation, the light-curing resin in the area irradiated by the laser beam forms a tight bond with a part of the low-dimensional carbon nanotubes on the conductive film, while the light-curing resin in the non-irradiated area remains in a liquid state on the sandpaper surface. (3) Remove the clear substrate and place the sandpaper as a whole

Ethanol to clean the uncured light-curing resin, the surface of the conductive film on the sandpaper that does not have a close connection with the light-curing

Resin has formed, remains clean. (4) Soak the sandpaper as a whole for 8 min in an ethanol solution, keeping the close

Connection in the area irradiated by the laser beam from the substrate

Surface microstructure detaches, i.e. after soaking in ethanol for 8 min, the cured resin absorbs the ethanol and swells and detaches from the substrate, while taking with it the low-dimensional carbon nanotubes on the sandpaper to which it is firmly attached. After soaking and cleaning with water, the remaining part of the carbon nanotubes is placed on the conductive film on the

Sandpaper patterned as shown in Figure 2.

Example 2

The present exemplary embodiment represents a method for producing

Graphene patterns on a substrate having a surface microstructure, comprising: (1) applying an ink dispersed with graphene (having a concentration of graphene of 2% by weight) to the surface of a substrate through the slot coating

Surface microstructure, heating and drying at 150°C for 20 min to produce a conductive

to form film; (2) coating the conductive film with a light-curing resin (epoxy resin system),

Covering with a clear plastic substrate with a hydrophobic surface,

Squeezing out the excess liquid resin, then curing the light-curing resin using the laser beam after the transparent

Substrate was tightly attached to the sandpaper, with the wavelength of the laser beam being 390 nm

Power 45 Mw/cm? and the irradiation time is 0.5 s; after irradiation, the light-curing resin in the area irradiated by the laser beam forms a tight bond with a part of graphene on the conductive film, while the light-curing resin in the non-irradiated area remains in a liquid state on the sandpaper surface. (3) Remove the clear substrate and place the sandpaper as a whole

Ethanol to clean the uncured light-curing resin, the surface of the conductive film on the sandpaper that does not have a close connection with the light-curing

Resin has formed, remains clean. (4) Soak the sandpaper as a whole for 5 min in an ethanol solution, keeping the close

Connection in the area irradiated by the laser beam from the substrate

Surface microstructure detaches, i.e. after soaking in ethanol for 5 min, the cured resin absorbs the ethanol and swells and detaches from the substrate, while taking with it the graphene on the sandpaper to which it is firmly bonded.

After soaking and cleaning with water, the remaining part of graphene on the conductive film is patterned on the sandpaper.

Example 3

The present embodiment provides a method for producing low-dimensional carbon nanotube patterns on a substrate

Surface microstructure available, comprising:

(1) Applying a low-dimensional carbon nanotube (with a

Concentration of carbon nanotubes of 6% by weight of dispersed ink through the

Slot coating on the surface of a substrate with a surface microstructure,

heating and drying at 50°C for 40 min to form a conductive film; (2) coating the conductive film with a light-curing resin (epoxy resin system),

Covering with a clear plastic substrate with a hydrophobic surface,

Squeezing out the excess liquid resin, then curing the light-curing resin using the laser beam after the transparent

Substrate was close to the sandpaper, with the wavelength of the laser beam being 420 nm

Output 39 Mw/cm? and the irradiation time is 0.7 s; after irradiation, the light-curing resin in the area irradiated by the laser beam forms a tight bond with a part of the low-dimensional carbon nanotubes on the conductive film, while the light-curing resin in the non-irradiated area remains in a liquid state on the sandpaper surface. (3) Remove the clear substrate and place the sandpaper as a whole

Ethanol to clean the uncured light-curing resin, the surface of the conductive film on the sandpaper that does not have a close connection with the light-curing

Resin has formed, remains clean. (4) Soak the sandpaper as a whole in an ethanol solution for 10 min, with the tight bond in the area irradiated by the laser beam coming away from the substrate

Surface microstructure detaches, i.e. after soaking in ethanol for 10 min, the cured resin absorbs the ethanol and swells and detaches from the substrate, while taking with it the low-dimensional carbon nanotubes on the sandpaper to which it is firmly attached. After soaking and cleaning with water, the remaining part of low-dimensional carbon nanotubes becomes conductive

Film patterned on the sandpaper.

Example 4

The present embodiment provides a method for producing low-dimensional carbon nanotube patterns on a substrate

Surface microstructure available, comprising:

(1) Applying a low-dimensional carbon nanotube (with a

Concentration of carbon nanotubes of 6% by weight of dispersed ink through the

Inkjet coating on the surface of a substrate with a surface microstructure,

Heating and drying at 90°C for 35 min to form a conductive film; (2) coating the conductive film with a light-curing resin (acrylate system),

Covering with a clear plastic substrate with a hydrophilic surface,

Squeezing out the excess liquid resin, then curing the light-curing resin using the laser beam after the transparent

Substrate was tightly attached to the sandpaper, with the wavelength of the laser beam being 400 nm

Power is 44 Mw/cm® and the irradiation time is 0.6 s; After irradiation, the light-curing resin in the area irradiated by the laser beam forms a close connection with a part of the low-dimensional carbon nanotubes on the conductive film and the transparent plastic substrate, while the light-curing resin in the non-irradiated area forms a close connection

Area remains in a liquid state on the sandpaper surface. (3) Removing the transparent substrate, the cured part of the resin is removed from the sandpaper along with the carbon nanotubes, and the remaining part of the

Carbon nanotubes on the conductive film is patterned on the sandpaper.

Example 5

The present embodiment provides a method for producing low-dimensional carbon nanotube patterns on a substrate

Surface microstructure available, comprising: (1) applying a low-dimensional carbon nanotube (with a

Concentration of carbon nanotubes of 8% by weight of dispersed ink through the

Inkjet coating on the surface of a substrate with a surface microstructure,

Heating and drying at 120°C for 20 min to form a conductive film; (2) coating the conductive film with a light-curing resin (acrylate system),

Covering with a clear plastic substrate with a hydrophilic surface,

Squeezing out the excess liquid resin, then curing the light-curing resin using the laser beam after the transparent

Substrate was tightly attached to the sandpaper, with the wavelength of the laser beam being 415 nm

Power 40 Mw/cm? and the irradiation time is 1 s; After irradiation, the light-curing resin in the area irradiated by the laser beam forms a close connection with a part of the low-dimensional carbon nanotubes on the conductive film and the transparent plastic substrate, while the light-curing resin in the non-irradiated area forms a close connection

Area remains in a liquid state on the sandpaper surface. (3) Removing the transparent substrate, the cured part of the resin is removed from the sandpaper along with the carbon nanotubes, and the remaining part of the

Carbon nanotubes on the conductive film is patterned on the sandpaper.

Example 6

The present exemplary embodiment represents a method for producing

Lamellar graphene patterns on a substrate having a surface microstructure, comprising: (1) applying an ink dispersed with lamellar graphene (with a concentration of graphene of 3% by weight) to the surface of a substrate by vacuum filtration

Surface microstructure, heating and drying at 80°C for 25 min to produce a conductive

to form film; (2) coating the conductive film with a light-curing resin (acrylate system),

Covering with a clear plastic substrate with a hydrophilic surface,

Squeezing out the excess liquid resin, then curing the light-curing resin using the laser beam after the transparent

Substrate was tightly attached to the sandpaper, with the wavelength of the laser beam being 395 nm

Power 43 Mw/cm? and the irradiation time is 0.6 s; after irradiation, the light-curing resin forms a close bond with a part of the lamellar graphene on the conductive film and the transparent one in the area irradiated by the laser beam

plastic substrate, while the light-curing resin remains in a liquid state on the sandpaper surface in the non-irradiated area. (3) Removing the transparent substrate, the cured part of the resin is removed from the sandpaper along with the graphene, and the remaining part of the graphene on the conductive film is patterned on the sandpaper.

Example 7

The present embodiment includes a flexible conductive material

Carbon nanotube patterns are available, including in particular the following

Steps: (1) Applying a low-dimensional carbon nanotube (with a

Concentration of carbon nanotubes of 5% by weight of dispersed ink through the

Drop coating on the surface of a substrate with a surface microstructure,

Heating and drying at 90°C for 30 min to form a conductive film; (2) coating the conductive film with a light-curing resin (acrylate system),

Covering with a clear plastic substrate with a hydrophobic surface,

Squeezing out the excess liquid resin, then curing the light-curing resin using the laser beam after the transparent

Substrate was tightly attached to the sandpaper, with the wavelength of the laser beam being 405 nm

Power 42 Mw/cm? and the irradiation time is 1 s; after irradiation, the light-curing resin in the area irradiated by the laser beam forms a tight bond with a part of the low-dimensional carbon nanotubes on the conductive film, while the light-curing resin in the non-irradiated area remains in a liquid state on the sandpaper surface. (3) Remove the clear substrate and place the sandpaper as a whole

Ethanol to clean the uncured light-curing resin, the surface of the conductive film on the sandpaper that does not have a close connection with the light-curing

Resin has formed, remains clean. (4) Soak the sandpaper as a whole for 8 min in an ethanol solution, keeping the close

Connection in the area irradiated by the laser beam from the substrate

Surface microstructure detaches, i.e. after soaking in ethanol for 8 min, the cured resin absorbs the ethanol and swells and detaches from the substrate, while taking with it the low-dimensional carbon nanotubes on the sandpaper to which it is firmly attached. After soaking and cleaning with water, the remaining part of carbon nanotubes is placed on the conductive film on the

Patterned sandpaper. (5) Coating the carbon nanotube pattern on the sandpaper with

Polydimethylsiloxane and peeled off into a film after curing so that the

Carbon nanotube pattern is transferred from the sandpaper to the polydimethylsiloxane film to obtain a flexible conductive carbon nanotube material as in

Figure 3 shown.

Embodiment 8

The present embodiment includes a flexible conductive material

Graphene patterns are available, comprising in particular the following steps: (1) applying an ink dispersed with lamellar graphene (with a concentration of graphene of 7% by weight) to the surface of a substrate by vacuum filtration

Surface microstructure, heating and drying at 80°C for 30 min to produce a conductive

to form film; (2) coating the conductive film with a light-curing resin (acrylate system),

Covering with a clear plastic substrate with a hydrophilic surface,

Squeezing out the excess liquid resin, then curing the light-curing resin using the laser beam after the transparent

Substrate was tightly attached to the sandpaper, with the wavelength of the laser beam being 395 nm

Power 43 Mw/cm? and the irradiation time is 0.6 s; after irradiation, the light-curing resin forms a close bond with a part of the lamellar graphene on the conductive film and the transparent one in the area irradiated by the laser beam

plastic substrate, while the light-curing resin remains in a liquid state on the sandpaper surface in the non-irradiated area. (3) Removing the transparent substrate, the cured part of the resin is removed from the sandpaper along with the graphene, and the remaining part of the graphene on the conductive film is patterned on the sandpaper. (4) re-applying the light-curing resin to the graphene pattern on the

Sandpaper and hardening by irradiation with the laser beam for 4 s, whereby the

Laser beam wavelength 390 nm and power 42 Mw/cm? amounts. Pulling off the

Layer of light-curing resin after curing into a film so that the

Graphene pattern is transferred from the sandpaper to the light-curing resin substrate as in

Figure 4 to obtain a flexible conductive material with graphene patterns.

The performance parameters in embodiments 1 to 8 of the present

Low-dimensional carbon nanopatterns produced on the sandpaper are as follows:

The line width is determined by the optical calibration; electrical conductivity is determined by a multimeter or a source meter; the bending radius is determined by placing the sample on a bending surface with a certain radius of curvature and simultaneously measuring the resistance value; The elongation properties are determined by attaching two ends of the sample to a stretchable holder, adjusting the position of the two ends of the holder to stretch the sample, and simultaneously measuring the resistance of the stretched sample.

The results are as follows:

Table 1: Performance parameters of those produced in exemplary embodiments 1 to 8

Silver nanopattern

Execution | Line width (around) | Electrical bending radius elongation properties ee 40 À s example conductivity (Q) | (cm) properties (%)

Execution | 20um-50um 100Q-120 kQ 2-10 190 sexample 1

Execution | 30um—500um 200Q-1kQ 1-10 105 sexample 2

Execution | 50um-5004um 200Q-80 kQ 1-15 55 example 3

Execution | 20um-800um 300Q-90 kQ 1-25 70 sexample 4

Execution | 30um-800um 200Q-100 kQ 1-20 145 sexample 5

Execution | 30um-800um 200Q-100 kQ 0.5-30 110 sexample 6

Execution | 30um-500um 100Q-220 kQ 1-20 100 sexample 7

Execution | 30um-500um 100Q-220 kQ 1-20 100 sexample 8

From Table 1, it can be seen that in the method of producing low-dimensional carbon nanomaterial patterns on a substrate with

Surface microstructure the minimum line width of the pattern is 20um and the resistance of the patterned conductive thin film is 100-200 kilohms, the exact

Value of resistance depends on the selected material, the thickness of the deposited material and the design of the structure. The conductive thin film, which is low dimensional

Contains nanomaterials, when stretched with twice the initial length (i.e. 50% stretch property), has a 400% change in resistance compared to the original resistance value and can be used in strain sensors etc.

It should be noted that the above content is only preferred

represents embodiments of the present invention and is not intended to serve the purpose

Limit the scope of the present invention. All under thoughts and

Changes, equivalent substitutions and improvements made in accordance with the principles of the present invention are to be considered within the scope of the present invention.

Claims (10)

Expectations 1. A method for producing low-dimensional carbon nanomaterial patterns on a substrate having a surface microstructure, characterized in that it comprises: applying a low-dimensional carbon nanomaterial-dispersed ink to the surface of a substrate having a surface microstructure and forming a conductive film after drying; Coating the conductive film with a light-curing resin, covering it with a transparent substrate, and then curing the light-curing resin using a laser beam, wherein the light-curing resin located in the area irradiated by the laser beam forms a close bond with a part of the low-dimensional Carbon nanomaterial forms on the conductive film, and the laser beam has a wavelength of 390-420 nm and a power of 39-45 Mw/cm? having; Removing the transparent substrate so that the tight junction in the area irradiated by the laser beam peels away from the surface microstructure substrate, with the remaining part of the low-dimensional carbon nanomaterial on the conductive film forming a pattern on the surface microstructure substrate. 2. A method for producing low-dimensional carbon nanomaterial patterns on a substrate with a surface microstructure according to claim 1, characterized in that the transparent substrate is a plastic substrate with a hydrophilic or hydrophobic surface. 3. A method for producing low-dimensional carbon nanomaterial patterns on a substrate having a surface microstructure according to claim 2, characterized in that when the transparent substrate is a plastic substrate with a hydrophilic surface, the transparent substrate is integrally attached to the after curing of the light-curing resin using a laser beam adheres to a tight connecting body, wherein the tight connecting body is caused to detach from the substrate with surface microstructure when the transparent substrate is removed. 4. A method for producing low-dimensional carbon nanomaterial patterns on a surface microstructured substrate according to claim 2, characterized in that when the transparent substrate is a plastic substrate with a hydrophobic surface, the method of detaching the tight connecting body from the surface microstructured substrate after removing the transparent substrate includes: soaking the substrate with surface microstructure in an ethanol solution for 5-10 min. 5. A method for producing low-dimensional carbon nanomaterial patterns on a substrate with a surface microstructure according to claim 1, characterized in that the low-dimensional carbon nanomaterial comprises graphene, carbon nanotubes, carbon nanofibers, nanometallic particles encapsulated in carbon, fullerenes and carbon quantum dots. 6. A method for producing low-dimensional carbon nanomaterial patterns on a substrate having a surface microstructure according to claim 1, characterized in that in the manufacturing process of the conductive film, the coating method includes drop coating, slot coating, Mayer rod coating, spin coating, inkjet coating or vacuum filtration coating . 7. A method for producing low-dimensional carbon nanomaterial patterns on a substrate with a surface microstructure according to claim 1, characterized in that in the production process of the conductive film, the drying temperature is 50-150 ° C. 8. A method for producing low-dimensional carbon nanomaterial patterns on a substrate having a surface microstructure according to claim 1, characterized in that the light-curing resin comprises a modified resin of an acrylate system and a modified resin of an epoxy resin system. 9. A method for producing low-dimensional carbon nanomaterial patterns on a substrate having a surface microstructure according to claim 1, characterized in that in the process of curing the light-curing resin using a laser beam, the laser beam is patterned in a direct notation, wherein the spot size of the laser beam is the line width of the pattern. 10. Flexible conductive material with low-dimensional nanomaterial patterns, characterized in that by applying an elastic material to the surface of the substrate with surface microstructure with low-dimensional nanomaterial patterns and performing a transfer printing process, the substrate with Surface microstructure with low-dimensional nanomaterial patterns is produced using the method for producing = low-dimensional carbon nanomaterial patterns according to one of claims 1 to 9.