AU8819198A - Method of production of a negative photomechanical film, substrate and ink composition for carrying out such a method - Google Patents

Method of production of a negative photomechanical film, substrate and ink composition for carrying out such a method

Info

Publication number
AU8819198A
AU8819198A AU88191/98A AU8819198A AU8819198A AU 8819198 A AU8819198 A AU 8819198A AU 88191/98 A AU88191/98 A AU 88191/98A AU 8819198 A AU8819198 A AU 8819198A AU 8819198 A AU8819198 A AU 8819198A
Authority
AU
Australia
Prior art keywords
negative
substrate
carrying
production
ink composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU88191/98A
Other languages
English (en)
Inventor
Giuseppe Paccagnella
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU8819198A publication Critical patent/AU8819198A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
AU88191/98A 1998-09-07 1998-09-07 Method of production of a negative photomechanical film, substrate and ink composition for carrying out such a method Abandoned AU8819198A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/IB1998/001386 WO2000014601A1 (fr) 1998-09-07 1998-09-07 Procede de production d'un film photomecanique negatif, substrat et composition d'encre pour la realisation de ce procede

Publications (1)

Publication Number Publication Date
AU8819198A true AU8819198A (en) 2000-03-27

Family

ID=11004748

Family Applications (1)

Application Number Title Priority Date Filing Date
AU88191/98A Abandoned AU8819198A (en) 1998-09-07 1998-09-07 Method of production of a negative photomechanical film, substrate and ink composition for carrying out such a method

Country Status (2)

Country Link
AU (1) AU8819198A (fr)
WO (1) WO2000014601A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101813882A (zh) * 2010-04-30 2010-08-25 北京化工大学 一种柔性紫外-可见光掩模的制备方法
KR101844530B1 (ko) 2015-11-13 2018-05-21 강원대학교산학협력단 은현인쇄물과 그 제조방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2253944C2 (de) * 1972-11-03 1983-02-24 Agfa-Gevaert Ag, 5090 Leverkusen Verfahren zur Herstellung eines Reliefbildes
US5270078A (en) * 1992-08-14 1993-12-14 E. I. Du Pont De Nemours And Company Method for preparing high resolution wash-off images

Also Published As

Publication number Publication date
WO2000014601A1 (fr) 2000-03-16

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase