AU782315B2 - Laser assisted thermal poling of silica based waveguides - Google Patents

Laser assisted thermal poling of silica based waveguides Download PDF

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Publication number
AU782315B2
AU782315B2 AU74989/00A AU7498900A AU782315B2 AU 782315 B2 AU782315 B2 AU 782315B2 AU 74989/00 A AU74989/00 A AU 74989/00A AU 7498900 A AU7498900 A AU 7498900A AU 782315 B2 AU782315 B2 AU 782315B2
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Australia
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region
waveguide
laser beam
electric field
poling
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AU7498900A (en
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Paul Blazkiewicz
John Canning
Graham Town
Danny Wong
Wei Xu
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SYDNEY THE, University of
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University of Sydney
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Description

WO 01/20389 PCT/AU0/01115 LASER ASSISTED THERMAL POLING OF SILICA BASED WAVEGUIDES Field of the invention The present invention relates broadly to a method and apparatus for thermal poling of materials and to devices incorporating poled materials.
Background of the invention The induced variation of the electro-optic (EO) coefficient of materials (hereinafter referred to as poling) has been attempted e.g. for optical fibres and bulk glass to produce a residual EO coefficient chi(2) in the glass material.
Two main methods are presently applied for poling optical fibres or bulk glass: thermal poling and (II) ultraviolet (UV) poling. The latter is believed to effect poling through non-thermal effects caused by UV absorption in the glass.
In both methods, a high poling voltage is applied across the material during either the heating process or the UV absorption to produce the EO coefficient changes.
The largest values of the EO coefficient in glass have been produced by UV poling. However, the resulting EO variations have been difficult to reproduce and the underlying principles are not fully understood, which makes this method unsuitable for mass-production of poled materials.
Thermal poling involves the heating of the entire bulk glass or optical fibre in an oven. However, this method has been typically limited to uniform poling. For non-uniform poling, periodic electrodes have to be deposited onto e.g.
the bulk glass.
This has required the heating to be performed in a vacuum to prevent smearing between adjacent poling domains by reducing electrical conductivity in air between the electrodes. This results in a complex poling system and furthermore, the periodic poling design of e.g. poled gratings was limited by the photolithographic mask used for PCT/AUOO/O 1115 Received 23 August 2001 -2the deposition of the electrodes. Furthermore, as the sign of the EO coefficient can only be changed by applying a poling voltage of different polarity, this is practically impossible with such a poling system, since at the high voltages required, shortening between adjacent electrodes would occur.
Summary of the invention A first aspect of the present invention provides a method of thermally poling a silica-based waveguide, comprising the steps of: exposing a region of the waveguide to an electric field; directing a laser beam into the region which is exposed to the electric field; irradiating the region at a power density selected to effect localised heating of the waveguide within the region through direct absorption of the laser radiation; and -scanning the laser beam over the region.
The method may further comprise scanning the laser beam across the region to effect poling of the region.
The method may comprise varying the power density of the laser beam while scanning. Accordingly, a method of non-uniform thermal poling can be provided.
A direction of the electric field may be changed as the laser beam is scanned over the region. Accordingly, it can be possible to alternate the sign of the EO coefficient in non-uniform thermal poling.
Where the material comprises glass, the laser beam is preferably an infrared (IR) laser, for example a CO 2 laser.
Where the material is an optical fibre, wires may be inserted into tubular holes extending substantially parallel to a core of the optical fibre located between the tubular holes, and a differential voltage may be applied to AMENDED bH-1i
IPEA/AU
PCT/AUOO/ 1115 Received 23 August 2001 -3the wires to create the electric field. The core of the optical fibre may comprise a germanosilicate material codoped with phosphorous.
A second aspect of the present invention provides an apparatus for thermally poling a silica-based waveguide, comprising: a means for exposing a region of the waveguide to an electric field; a means for directing a laser beam into the region which is exposed to the electric field; a means for irradiating the region at a power density selected to effect localised heating of the waveguide within the region through direct absorption of the laser radiation; and a means for scanning the laser beam over the region.
A third aspect of the present invention provides an optical device incorporating a silica-based waveguide when thermally poled by the above-described method.
Preferred forms of the invention will now be described, by way of example only, with reference to the accompanying drawings.
Brief Description of the Drawings Figure 1 shows a schematic drawing of an experimental set-up embodying the present invention.
Figure 2 shows a plot illustrating positive poling as a function of time embodying the present invention.
Figure 3 shows a plot illustrating negative poling as a function of time embodying the present invention.
Detailed Description of the Preferred Embodiments In Figure 1, a Mach-Zehnder interferometer 10 was used for in situ measurement of the evolution of the EO coefficient in an optical fibre 12. The optical fibre 12 is a twin hole fibre with a germano silicate core codoped AMENDED SHEE
IPEAJAU
WO 01/20389 PCTIAU0/ 01115 4 with phosphorous. The hole diameter is 108 micrometer and the hole-to-hole spacing was 16 micrometer.
A translation stage 14 is used to scan a C02 laser beam from a CO 2 laser 18, using a mirror 20 to direct the laser beam 16 onto the fibre 12.
Aluminium wires 22, 24 were inserted via side entries (not shown) into each of the holes of the twin hole fibre 12 to provide electrodes for applying a poling voltage across the core of the optical fibre 12.
The wires 22, 24 were connected to a DC high voltage power supply 26. During the experiments, a poling voltage of 3.5 kW was applied.
A high voltage AC signal generator 28 is provided in series with the DC power supply 26. The high voltage AC signal generator 28 was utilised as a means to measure the EO coefficient of the core of the optical fibre 12 as follows.
Whilst the DC component of the high voltage acts as the poling voltage, the AC signal (8.5 kHz) can be used to effect refractive index changes in the core of the optical fibre due to the electro-optic effect. As the EO coefficient of the core of the optical fibre 12 changes, so does an AC component of the output of the Mach-Zehnder interferometer 10. The output of the Mach-Zehnder interferometer 10 is measured through a differential amplifier set-up 30 and analysed by a computer 32.
In the arm 34 of the Mach-Zehnder interferometer which does not include the optical fibre 12 a linear ramp phase modulator 36 is used to get around thermal drift instabilities of the Mach-Zehnder interferometer during the experiment in a known manner.
The scan time for scanning the laser beam 16 along the approximately 7 cm of the optical fibre 12 was set at seconds.
Turning now to Figure 2, a typical EO evolution achieved during exposure of the fibre 12 (Figure 1) with a WO 01/20389 PCT/AU00/01 115 positive applied high voltage. During a first period when the DC high voltage and the laser beam are turned off, no EO effect is observable, which is characteristic for glass, which does not exhibit a measurable EO coefficient.
When the poling voltage is applied in the next segment 42, the EO coefficient jumps to a positive value In the next segment 46 the laser-beam is unblocked and the scan begins (whilst the poling voltage remains applied), and the quantity (EO coefficient*length of scanned fibre) grows rapidly during of the plot. In other words, the cumulative electrooptic phase shift caused by the fibre increases as the length of poled fibre increases during the scan.
When the scan ends and the laser beam is blocked again, the EO coefficient stops growing and remains substantially constant during the next segment 48, whilst the DC poling voltage remains applied.
Finally, upon turning the poling voltage off, a residual EO coefficient 50 remains, in the case illustrated in Figure 2 the residual EO value 50 is approximately 2.03 pm/V.cm. At the end of the scan, the EO coefficient is the same at any point along the scanned region, i.e. 2.03 pm/V.cm divided by 7 cm (the scanned length) 0.29 pm/V.
(We note that during the entire measurement of the plot illustrated in Figure 2, the AC signal remains being applied to measure the EO coefficient).
Turning now to Figure 3, negative poling will now be described.
Again, initially when the poling voltage and the laser beam are turned off, only a noise level is measured in the first segment 60 of the plot shown in Figure 3, as expected for glass.
In the next segment 62, when the DC poling voltage is turned on, the EO coefficient jumps to a substantially constant value 64, we note that the sign of the EO coefficient is opposite to the EO coefficients in Figure 2 WO 01/20389 PCT/AU00/01115 6 due to a poling voltage of different polarity being applied during the negative poling experiment.
In the next segment 66 of the plot shown in Figure 3, the laser beam is unblocked and the scan begins, the quantity (EO coefficient*length of scanned fibre) decays but remains non-zero.
When the scan ends and the beam is blocked, the EO coefficient stops decaying and maintains substantially constant whilst the poling voltage is still applied during segment 68 of the plot shown in Figure 3.
Finally, when the poling voltage is turned off, a residual (negative) EO coefficient 70 remains, in this case -0.91 pm/V.cm.
Applications Non-uniformly poled waveguides such as optical fibres can be used for the fabrication of quasi-phase-matched (QPM) optical devices. The phase matching condition can be satisfied by choosing the correct period for a periodic poled grating.
QPM can be realised in glass and optical fibres using the present invention by for example varying the polarity of the applied poling voltage between different regions that are being poled.
Quasi-Phase-Matched gratings can be used for optical frequency mixing and optical switches.
The efficiency of frequency conversion is dependent on the amplitude of the EO coefficient variations in the gratings over the poled length of a waveguide. This has limited the application of poled gratings for frequency conversion, since the EO coefficient variations are typically small, especially in thermal poling.
However, with the present invention, the efficiency of the frequency conversion can be increased because it is now possible to produce poled gratings that are for example metres long, thereby in its cumulative effect overcoming the deficiency problem.
03/06 2005 14:54 FAX 61 3 92438333 GRIFFITH HACK IPAUSTRALIA I005 7 With the method of the present invention, relatively high EO coefficients have been poled in relatively short times compared to thermal poling, which typically requires a time of 10 minutes at 2800C with a 3.5 kV poling voltage to achieve EO coefficients of 0.15 to 0.2 pm/V, i.e.
smaller than the EO coefficients achieved with the present invention within 55 seconds.
This can enable rapid poling of optical fibres for commercial manufacture, where for example the CO 2 laser is used to rapidly heat up silicate glass while a poling voltage is applied across the glass as described above.
Furthermore, if a twin-hole optic fibre with electrode wires already in the holes is drawn this enables poling of optical fibres either before or during the drawing of the 15 fibre whilst applying a voltage across the two embedded electrode wires. This could allow very long lengths of poled optical fibre to be produced.
It will be appreciated by a person skilled in the art that numerous variations and/or modifications may be made 20 to the present invention as shown in the specific embodiments without departing from the spirit or scope of the invention as broadly described. The present embodiments are, therefore, to be considered in all respects to be illustrative and not restrictive.
25 In the claims that follow and in the preceding description of the invention, except where the context requires otherwise owing to express language or necessary implication, the word "comprise" or variations such as "comprises" or "comprising" is used in an inclusive sense, 30 i.e. to specify the presence of the stated features but not to preclude the presence or addition of further features in various embodiments of the invention.
Further, any reference herein to prior art is not intended to imply that such prior art forms or formed a part of the common general knowledge.
COMS ID No: SBMI-01281716 Received by IP Australia: Time 15:01 Date 2005-06-03

Claims (5)

  1. 8- The claims defining the invention are: 1. A method of thermally poling a silica-based waveguide, comprising the steps of: exposing a region of the waveguide to an electric field; directing a laser beam into the region which is exposed to the electric field; irradiating the region at a power density selected to effect localised heating of the waveguide within the region through direct absorption of the laser radiation; and scanning the laser beam over the region. 2. A method as claimed in claim 1 wherein the laser is controlled to such that the power density of the laser beam 15 is varied while scanning. 3. A method as claimed in any one of the preceding claims wherein a direction of the electric field is changed as the laser beam is scanned over the region. 4. A method as claimed in claim 3, wherein the direction of the electric field is reversed as the laser beam is scanned over the region. 5. A method as claimed in any one of the preceding claims wherein the electric field and/or laser are controlled to effect a non-uniformly poled structure in the 25 region. 6. A method as claimed in claim 5 wherein the electric field and/or laser are controlled to effect a periodic poled structure. 7. A method as claimed in any one of the preceding claims wherein the laser beam is an IR laser beam. 8. A method as claimed in any one of the preceding claims when applied to a waveguide in the form of an optical fibre.
  2. 9. A method as claimed in claim 8, wherein wires are inserted into tubular holes extending substantially parallel to a core of the optical fibre located between the COMS ID No: SBMI-01281716 Received by IP Australia: Time 15:01 Date 2005-06-03 03/06 2005 14:55 FAX 61 3 92438333 GRIFFITH BACK IPAUSTRALIA Z007 9 tubular holes, and a differential voltage is applied to the wires to create the electric field. A method as claimed in either claim 8 or claim 9, when applied to an optical fibre in which the core comprises germanosilicate co-doped with phosphorous.
  3. 11. An apparatus for thermally poling a silica-based waveguide, comprising: a means for exposing a region of the waveguide to an electric field; a means for directing a laser beam into the region which is exposed to the electric field; a means for irradiating the region at a power density selected to effect localised heating of the waveguide within the region through direct absorption of 15 the laser radiation; and a means for scanning the laser beam over the region.
  4. 12. An optical device incorporating a silica-based waveguide when thermally poled by the method as claimed in Sany one of claims 1 to 11. S" 20 13. A method of thermally poling a silica-based .waveguide substantially as herein described with reference to any one of the figures of the accompanying drawing.
  5. 14. An apparatus for thermally poling a silica-based S2 waveguide substantially as herein described with reference 25 to any one of the figures of the accompanying drawing. Dated this 3rd day of June 2005 THE UNIVERSITY OF SYDNEY By their Patent Attorneys GRIFFITH HACK Fellows Institute of Patent and Trade Mark Attorneys of Australia COMS ID No: SBMI-01281716 Received by IP Australia: Time 15:01 Date 2005-06-03
AU74989/00A 1999-09-14 2000-09-14 Laser assisted thermal poling of silica based waveguides Ceased AU782315B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU74989/00A AU782315B2 (en) 1999-09-14 2000-09-14 Laser assisted thermal poling of silica based waveguides

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
AUPQ2811 1999-09-14
AUPQ2811A AUPQ281199A0 (en) 1999-09-14 1999-09-14 Method and apparatus for thermal poling and optical devices
PCT/AU2000/001115 WO2001020389A1 (en) 1999-09-14 2000-09-14 Laser assisted thermal poling of silica based waveguides
AU74989/00A AU782315B2 (en) 1999-09-14 2000-09-14 Laser assisted thermal poling of silica based waveguides

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AU782315B2 true AU782315B2 (en) 2005-07-21

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5100589A (en) * 1989-12-04 1992-03-31 Lockheed Missiles & Space Company, Inc. Optical method for altering molecular alignment in selected regions of a non-linear optical polymeric structure
WO1996016344A1 (en) * 1994-11-18 1996-05-30 The University Of Sydney Inducing or enhancing electro-optical properties in optically transmissive material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5100589A (en) * 1989-12-04 1992-03-31 Lockheed Missiles & Space Company, Inc. Optical method for altering molecular alignment in selected regions of a non-linear optical polymeric structure
WO1996016344A1 (en) * 1994-11-18 1996-05-30 The University Of Sydney Inducing or enhancing electro-optical properties in optically transmissive material

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Y.QUIQUEMPOIS ET AL, OPTICS MATERIALS, VOL.9,1998 PP.361-367 *

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