AU7636496A - Dual beam automatic focus system - Google Patents

Dual beam automatic focus system

Info

Publication number
AU7636496A
AU7636496A AU76364/96A AU7636496A AU7636496A AU 7636496 A AU7636496 A AU 7636496A AU 76364/96 A AU76364/96 A AU 76364/96A AU 7636496 A AU7636496 A AU 7636496A AU 7636496 A AU7636496 A AU 7636496A
Authority
AU
Australia
Prior art keywords
automatic focus
dual beam
focus system
beam automatic
dual
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU76364/96A
Inventor
Michael John Hammond
Andrew Peter Keens
Andrew Michael Christian Smout
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bio Rad Micromeasurements Ltd
Original Assignee
Bio Rad Micromeasurements Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bio Rad Micromeasurements Ltd filed Critical Bio Rad Micromeasurements Ltd
Publication of AU7636496A publication Critical patent/AU7636496A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G02B7/30—Systems for automatic generation of focusing signals using parallactic triangle with a base line
    • G02B7/32—Systems for automatic generation of focusing signals using parallactic triangle with a base line using active means, e.g. light emitter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/08—Disposition or mounting of heads or light sources relatively to record carriers
    • G11B7/09—Disposition or mounting of heads or light sources relatively to record carriers with provision for moving the light beam or focus plane for the purpose of maintaining alignment of the light beam relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
    • G11B7/0908—Disposition or mounting of heads or light sources relatively to record carriers with provision for moving the light beam or focus plane for the purpose of maintaining alignment of the light beam relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following for focusing only
    • G11B7/0912—Disposition or mounting of heads or light sources relatively to record carriers with provision for moving the light beam or focus plane for the purpose of maintaining alignment of the light beam relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following for focusing only by push-pull method

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AU76364/96A 1995-12-19 1996-11-28 Dual beam automatic focus system Abandoned AU7636496A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB9525867 1995-12-19
GBGB9525867.9A GB9525867D0 (en) 1995-12-19 1995-12-19 Dual beam automatic focus system
PCT/GB1996/002920 WO1997022900A1 (en) 1995-12-19 1996-11-28 Dual beam automatic focus system

Publications (1)

Publication Number Publication Date
AU7636496A true AU7636496A (en) 1997-07-14

Family

ID=10785625

Family Applications (1)

Application Number Title Priority Date Filing Date
AU76364/96A Abandoned AU7636496A (en) 1995-12-19 1996-11-28 Dual beam automatic focus system

Country Status (3)

Country Link
AU (1) AU7636496A (en)
GB (1) GB9525867D0 (en)
WO (1) WO1997022900A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6548795B1 (en) 1999-10-21 2003-04-15 3M Innovative Properties Company Autofocus Z stage
US20080135774A1 (en) 2006-12-08 2008-06-12 Asml Netherlands B.V. Scatterometer, a lithographic apparatus and a focus analysis method
EP3330775B1 (en) * 2016-12-01 2024-02-07 Multiphoton Optics Gmbh Autofocus system for detecting interfaces

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2719214A1 (en) * 1977-04-29 1978-11-09 Agfa Gevaert Ag Automatic camera focusing system - measures light received from object illuminated at two distances from illumination source
DE2836428A1 (en) * 1978-08-19 1980-03-06 Battelle Institut E V Automatic focussing system with light-sensitive CCD elements - compares illumination differences to form difference signal for controlling motor assigned to lens
DE3446727C2 (en) * 1983-08-10 1986-12-04 Fa. Carl Zeiss, 7920 Heidenheim Auto focus device for microscopes
EP0608448A1 (en) * 1993-01-26 1994-08-03 International Business Machines Corporation Method and apparatus for determining position

Also Published As

Publication number Publication date
GB9525867D0 (en) 1996-02-21
WO1997022900A1 (en) 1997-06-26

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