AU7328800A - Lithography using quantum entangled particles - Google Patents

Lithography using quantum entangled particles

Info

Publication number
AU7328800A
AU7328800A AU73288/00A AU7328800A AU7328800A AU 7328800 A AU7328800 A AU 7328800A AU 73288/00 A AU73288/00 A AU 73288/00A AU 7328800 A AU7328800 A AU 7328800A AU 7328800 A AU7328800 A AU 7328800A
Authority
AU
Australia
Prior art keywords
lithography
quantum entangled
entangled particles
particles
quantum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU73288/00A
Inventor
Giovanni Della Rosa
Jonathan Dowling
Colin Williams
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
California Institute of Technology CalTech
Original Assignee
California Institute of Technology CalTech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/393,451 external-priority patent/US6252665B1/en
Priority claimed from US09/393,200 external-priority patent/US6480283B1/en
Application filed by California Institute of Technology CalTech filed Critical California Institute of Technology CalTech
Publication of AU7328800A publication Critical patent/AU7328800A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
AU73288/00A 1999-05-20 2000-05-19 Lithography using quantum entangled particles Abandoned AU7328800A (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US13531699P 1999-05-20 1999-05-20
US60135316 1999-05-20
US09/393,451 US6252665B1 (en) 1999-05-20 1999-09-10 Lithography using quantum entangled particles
US09393200 1999-09-10
US09/393,200 US6480283B1 (en) 1999-05-20 1999-09-10 Lithography system using quantum entangled photons
US09393451 1999-09-10
PCT/US2000/013931 WO2000075730A1 (en) 1999-05-20 2000-05-19 Lithography using quantum entangled particles

Publications (1)

Publication Number Publication Date
AU7328800A true AU7328800A (en) 2000-12-28

Family

ID=27384692

Family Applications (1)

Application Number Title Priority Date Filing Date
AU73288/00A Abandoned AU7328800A (en) 1999-05-20 2000-05-19 Lithography using quantum entangled particles

Country Status (3)

Country Link
EP (1) EP1203265A4 (en)
AU (1) AU7328800A (en)
WO (1) WO2000075730A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2449290B (en) 2007-05-17 2010-09-22 Toshiba Res Europ Ltd An optical system
GB2451803B (en) 2007-06-28 2010-06-09 Toshiba Res Europ Ltd An optical retrieval system, data storage system, data storage medium and method of optical retrieval and data storage
CN116090569B (en) * 2023-04-06 2023-06-13 中国人民解放军军事科学院国防科技创新研究院 Programmable discrete time quantum strolling simulation chip structure based on integrated optics

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5415835A (en) * 1992-09-16 1995-05-16 University Of New Mexico Method for fine-line interferometric lithography
US6042998A (en) * 1993-09-30 2000-03-28 The University Of New Mexico Method and apparatus for extending spatial frequencies in photolithography images
US5759744A (en) * 1995-02-24 1998-06-02 University Of New Mexico Methods and apparatus for lithography of sparse arrays of sub-micrometer features
US5796477A (en) * 1997-02-27 1998-08-18 Trustees Of Boston University Entangled-photon microscopy, spectroscopy, and display
US5955221A (en) * 1997-11-21 1999-09-21 The Regents Of The University Of California Method and apparatus for fabrication of high gradient insulators with parallel surface conductors spaced less than one millimeter apart
US6037082A (en) * 1998-10-30 2000-03-14 Advanced Micro Devices, Inc. Design of a new phase shift mask with alternating chrome/phase structures
US6111646A (en) * 1999-01-12 2000-08-29 Naulleau; Patrick Null test fourier domain alignment technique for phase-shifting point diffraction interferometer

Also Published As

Publication number Publication date
EP1203265A1 (en) 2002-05-08
EP1203265A4 (en) 2006-08-02
WO2000075730A1 (en) 2000-12-14

Similar Documents

Publication Publication Date Title
AU1995800A (en) Particle manipulation
AU3241500A (en) Radiopaque dental materials with nano-sized particles
AU2002211949A1 (en) Particulate trap
AU6283299A (en) Controlled release nanoparticulate compositions
AU2791599A (en) Extended release dosage form
AU7223798A (en) Particle manipulation
AUPQ912000A0 (en) Improved virus like particles
AU2002226943A1 (en) Entangled photon ellipsometry
AU2706200A (en) Uv-absorbing particles
AU2001291547A1 (en) Particle concentrator
AU5493400A (en) Absorbent airlaid structure
AU1132601A (en) Feature interactions
AU2002222145A1 (en) Particulate inhalation carrier
AU2001246861A1 (en) Sustained release preparations
AU6835900A (en) Deodorant
AU7328800A (en) Lithography using quantum entangled particles
AU4596200A (en) Wheelchair
AU4543300A (en) Sunscreen agents
HUP0204188A3 (en) Bead or particle manipulating chucks
AU5637900A (en) InGaAsN/GaAs quantum well devices
AU2001241187A1 (en) Sustained release oral preparations
AU5652199A (en) Sustained release oral preparations
AU2001252770A1 (en) Electron-beam lithography
AU1275001A (en) Solid particles
AU4553100A (en) Tumour-associated antigen

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase