AU696281B2 - Spectrometer with discharge limiting means - Google Patents
Spectrometer with discharge limiting means Download PDFInfo
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- AU696281B2 AU696281B2 AU43217/96A AU4321796A AU696281B2 AU 696281 B2 AU696281 B2 AU 696281B2 AU 43217/96 A AU43217/96 A AU 43217/96A AU 4321796 A AU4321796 A AU 4321796A AU 696281 B2 AU696281 B2 AU 696281B2
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- inductively coupled
- coupled plasma
- shielding
- spectrometer according
- enclosure
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Description
WO 96/19716 PCTIAU95/00856 -1- SPECTROMETER WITH DISCHARGE LIMITING MEANS This invention relates to an inductively coupled plasma spectrometer The invention is advantageously applied to an optical emission spectrometer (ICP- OES) wherein the plasma torch and the optical system of the spectrometer may be axially aligned and will be described herein in that context. Nevertheless it is to be appreciated that it is not ereby limited to such applications.
In emission spectrometers of the above type, radio frequency (RF) energy is inductively coupled into a gas, such as for example argon, which is caused to flow through the torch to generate a plasma discharge. The plasma is used to atomise and .excite a sample that is injected into the plasma to cause the emission of light at wave lengths which are characteristic of the atomic composition of the sample. The emitted light is detected and measured to obtain an analysis of the sample.
Analytical detection limits are improved in optical emission spectrometers in which the cloud of excited atoms generated in the plasma is viewed by an optical detection system of the spectrometer axially along the central axis of the pla ma torch rather than perpendicular to that axis as in some known instruments. However an axially aligned optical system needs to be protected from the heat and contaminants in the plasma exhaust. This may be done by interposing a shield that includes a sampling or viewing port or orifice between the plasma "tail" and the entrance end of the optical system. Such a shield is best if made of a conductive metal, as this allows it to be adapted, for example by the incorporation of a cooling system, to minimise damage which may be caused to the shield or its insulating support structure by heat from the plasma or hot gases leaving the plasma.
In inductively coupled plasma spectrometers the plasma acquires a radio frequency potential because of capacitive coupling between the induction coil and the plasma. This potential can cause an electrical discharge to occur from the plasma to the sampling shield, the possibility of which is increased if the shield is made of a conductive metal.
~C WO 9/119716 I)lCTlAU95/00856 -2- An object of the present invention is to provide an inductively coupled plasma spectrometer in which the problem of an electrical discharge occurring between the plasma and the sampling shield is eliminated or at least substantially ameliorated.
A similar discharge problem can occur between the plasma and a cone containing a sampling orifice in inductively coupled plasma mass spectrometers (ICP-MS). The problem may be addressed in ICP mass spectrometers by reducing the potential difference between the plasma and the sampling cone, for example by special induction coil arrangements as in United States Patents 5194731 and'4501965 (RE 33386) or by biasing the cone as in United States Patent 4682026. However, these are relatively costly solutions which may be commercially viable for ICP mass spectrometers in circumstances where the arcing problem is especially critical in these spectrometers. In other circumstances the present invention may offer a solution to the problem of arcing which is realisable in a simple and cost effective manner in ICP-OES as well as in ICP-MS instruments.
Accordingly, the invention provides an inductively coupled plas a spectrometer including shielding/sampling means located between a plaspa torch and an optical system of the spectrometer, wherein said shiel g/sampling means is associated with an enclosure for the plasma torch s ehthat a relatively high impedance path is established for limiting flow of el trical current between said shielding/sampling means and said enclosure.
Flow of electrical current between the sI ding/sampling means should be limited below a level which would sustain discharge.
It has been shown that isol ing the shielding/sampling means from the enclosure by an insulating me I m does not provide the requisite high impedance as reactance of the cap aitance between the shielding/sampling means and the enclosure at the fre /ency of the plasma RF source is typically too low.
Prefer bthe high impedance path includes a circuit that is resonant at the frequ cy cf the RF supplied to the induction coil of the plasma torch. More pref ably the circuit includes an inductance chosen such that it and the a acitance between the shielding/sampling means and the plasma system 2a Accordingly, the invention provides an inductively coupled plasma spectrometer including shielding/sampling means disposed between a plasma torch having an enclosure and an optical system of the spectrometer, and a resonant circuit disposed between said shielding/sampling means and said enclosure for limiting flow of electrical current between said shielding/sampling means and said enclosure.
Flow of electrical current between the shielding/sampling means should be limited below a level which would sustain a discharge.
It has been shown that isolating the shielding/sampling means from the enclosure by an insulating medium does not provide the requisite high impedance as reactance of the capacitance between the shielding/sampling means and the enclosure at the frequency of the plasma RF source is typically too low.
Preferably the high impedance path includes a circuit that is resonant at the frequency of the RF supplied to the induction coil of the plasma torch. More 15 preferably the circuit includes an inductance chosen such that it and the capacitance between the shielding/sampling means and the plasma system 0 0 0 o 0 MJP C:\WNWORDVMARIEIGABNODEAU-CIP.DOC WO 96/19716 PC'IA U9500856 -3enclosure wilr form a parallel resonant circuit at the frequency of the RF supply.
The circuit may also include a variable inductor or capacitor, for example a trimming capacitor, for tuning the circuit. Preferably the inductance includes an air-cored inductor.
In a preferred embodiment of the present invention, the circuit for estaWlhshing a high impedance path between the shielding/sampling means and plasma system enclosure is provided by an air-cored inductor which is also used to supply a coolant to the shielding/sampling means. In this embodiment, the inductor is formed from hollow conductive tubing, for example of silver plated copper, through which a coolant such as for example water is supplied for circulation through ducting in or associated with the shielding/sampling means before it passes out of the system via a suitable outlet.
A parallel resonant circuit as provided by the invention has a high impedance at the resonant frequency which is given by the product of the inductive reactance of the inductor and the quality factor of the tuned circuit.
For example, at a frequency of between 27 to 100 MHz, which is a typical for the RF supply to the induction coil of the plasma torch, a Q in excess of 400 may be readily realised. This may establish a high impedance at the resonant frequency sru. h as may substantially reduce a discharge current from the plasma in co;,nparison to a spectrometer not having the parallel resonant circuit.
A preferred embodiment of the present invention will now be described, by way of example only, with reference to the accompanying drawing. The drawing is a schematic diagram showing the physical location and electrical connection of a shielding/sampling cone 1 within an inductively coupled plasma optical emission spectrometer according to an embodiment of the present invention.
The invention, as exemplified in the drawing, includes a conductive metal cone 1 having a viewing aperture 2, interposed between a plasma torch 3 and an optical system 4. The torch 3, cone aperture 2 and optical system 4 are aligned such that a cloud of excited atoms from a sample, as generated in the plasma torch, is viewed axially along the central axis 5 of the torch rather than perpendicularly to that axis as in conventional systems. This axial viewing arrangement improves analytical detection limits of ICP-OES instruments WO 96119716 PCT/AU95/00856 -4because emissions from the excited atoms are viewed more efficiently than is the case if a side view is taken. The optical viewing system and associated detection and analytical componentry and circuits as such are generally the same in the axial system as in the conventional perpendicular viewing system. Such systems, componentry and circuits are known in the art and are thus not described in detail herein.
Plasma torch 3 includes inlets 6 for supplying a plasma forming gas, which is preferably argon; and an induction coil 7 for inductively coupling RF energy, preferably at a free running frequency of 40 Mhz (nominal), into the gas flowing through the torch to generate a plasma. A suitable RF supply (not shown) is connected to induction coil 7. A sample may be injected axially through an inlet 8 into the torch for atomisation in the plasma.
In operation of the torch the plasma acquires a potential from the induction coil 7 and capacitive coupling wi I occur between the cone 1 and an enclosure for the plasma system, which enclosure is represented by the ground connection shown at 9. This capacitive coupling is represented by the capacitor referenced as 10. In accordance with the invention, an air-cored inductor 11 is also connected between the cone 1 and enclosure 9, its inductance being such that it forms a parallel resonant circuit with capacitor 10 at the frequency of the RF supply to induction coil 7. The parallel resonant circuit 10-11 provides a relatively high impedance path between cone 1 and enclosure 9 which acts tr, suppress or limit flow of electrical current from the plasma such that a discharge to cone 1 is avoided.
A variable capacitor (not shown) may be connected across the inductor 11 (in which case it may be in parallel with capacitor 10 or may replace capacitor for adjusting the total capacitance to allow the circuit to be tuned to resonance.
Alternatively or additionally inductor 11 may be constructed such that its inductance is adjustable for tuning purposes. In one embodiment this may be achieved by deforming the hollow tubing from which the inductor is formed. A preferred construction may be to manufacture inductor 11 to provide the correct inductance to resonate with capacitor 10 at the plasma torch operating frequency.
I- wO 96/19716 PC'/AU%9/00856 Cone 1 is preferably made of metal, for example nickel, and is in heat conducting relationship with a heat sink (not shown) for extracting heat from the cone. The heat sink may include a duct for passage of a coolant, preferably water, therethrough. Conveniently, the tubing for supply of the coolant to the heat sink associated with cone 1 may be coiled so as to form inductor 11. Thus the invention offers a simple and cost effective means for suppressing arcing to the cone in that two functions may be served by one component.
A supply of argon gas may be directed to pass olit of aperture 2 in cone 1, as indicated by arrows 12, to give added protection for the optical system 4 from the plasma exhaust.
It has been found that for a Varian Liberty Model 150 AX ICP-.OES instrument, an inductor 11 needs to have an inductance of about 440 nH for realisation of the invention. This may be formed by suitably coiling a coolant inlet tube of for example silver plated copper and of about 4 mm OD. In other instruments the inductance may range in value from about 60 to 700 nH.
To facilitate ignition of the plasma, it may be necessary to provide means by which the resonant circuit can be detuned from the frequency of the plasma RF source or alternatively the quality factor of the tuned circuit may be decreased. For example the frequency of the resonant circuit may be detuned so that it lies above or below the frequency of the RF source. Depending on the quality factor of the tuned circuit, this may have the effect of reducing substantially the value of the high impedance path between cone 1 and enclosure 9. The resonant frequency can be decreased by switching additional tuning capacitance across inductor 11 to lower the resonant frequency. The value of the high impedance path between shielding/sampling cone 1 and enclosure 9 may alternatively be reduced by reducing the quality factor of the tuned circuit. The quality factor may be reduced by reducing the value of inductor 11 or by increasing the resistance of the resonant circuit. The latter may be achieved by switching a suitable resistance across inductor 11, by temporarily connecting cone 1 to enclosure 9 or by providing another inductor mutually coupled to an inductor forming part of the cone resonant circuit which can be short circuited by an appropriate switch.
I~--I
WO 96/197J6 PCT/A U95/00856 -6- The invention described herein is susceptible to variations, modifications and/or additions other than those specifically described and it is to be understood that the invention includes all such variations, modifications and/or addif;ns which fall within the spirit and scope of ihe above description.
Claims (9)
1. An inductively coupled plasma spectrometer including shielding/sampling means disposed between a plasma torch having an enclosure and an optical system of the spectrometer, and a resonant circuit disposed between said shielding/sampling means and said enclosure for limiting flow of electrical current between said shielding/sampling means and said enclosure.
2. An inductively coupled plasma spectrometer according to Claim 1 wherein said plasma torch is supplied with an RF frequency at or near the frequency of said resonant circuit.
3. An inductively coupled plasma spectrometer according to claim 2 wherein said frequency is in the range of 27 to 100 Mhz.
4. An inductively coupled plasma spectrometer according to Claim 1, 2 or 3 wherein said resonant circuit includes an inductance. 15 5. An inductively ,oupled plasma spectrometer according to Claim 4 wherein al said inductance includes an air cored inductor.
6. An inductively coupled plasma spectrometer according to Claim 4 or wherein said inductance and capacitance between said shielding/sampling means and said enclosure form a parallel resonant circuit at said frequency.
7. An inductively coupled plasma spectrometer according to any one of the preceding claims wherein said resonant circuit includes a variable capacitor for o ese tuning said resonant cFcuit.
8. An inductively coupled plasma spectrometer according to any one of the 0 of preceding claims wherein said resonant circuit includes a variable inductor for tuning said resonant circuit.
9. An inductively coupled plasma spectrometer according to any one of 0 claims 4 to 8 wherein said inductance is hollow for passing a coolant to said shielding/sampling means. An inductively coupled plasma spectrometer according to any one of the preceding claims wherein the quality factor of said resonant circuit is at least
400. MJP C:\WNWORDVMARIEZGABNODEL\AU-MIPDOC aI -8- 11. An inductively coupled plasma spectrometer according to Claim including means for reducing said quality factor to facilitate ignition of said plasma torch. 12. An inductively coupled plasma spectrometer according to claim including means for detuning said circuit during ignition of said plasma torch. 13. An inductively coupled plasma spectrometer according to any one of claims 4 to 12 wherein said inductance has a value of substantially between 60 to 700 nH. 14. An inductively coupled plasma spectrometer according to any one of the preceding claims wherein said shielding/sampling means includes a sampling orifice/port. An inductively coupled plasma spectrometer according to any one of the preceding claims wherein said spectrometer is an optical emission type. 16. An inductively coupled plasma spectrometer substantially as herein 15 described with reference to the accompanying drawing. o DATED: 1 July, 1997 PHILLIPS ORMONDE FITZPATRICK Attorneys for: Q) i VARIAN AUSTRALIA PTY. LTD. o* MJP C:\WNWORDMARIE\GABNODELWU-CIP DOC Is -9- ABSTRACT An inductively coupled plasma spectrometer including shielding/sampling means dh'posed between a plasma torch ,aving an enclosure and an optical system of the spectrometer, and a resonant cruit (10, 11) disposed between said shielding/sampling means and said enclosure for limiting flow of electrical current between said shielding/sampling means and said enclosure 9 0* ft 0• 0 *e 0* e 0 *0 MJP C \VnNWORDAARlE\GABNODELMUL-CIP DOC -r -pr~I
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU43217/96A AU696281B2 (en) | 1994-12-20 | 1995-12-19 | Spectrometer with discharge limiting means |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AUPN0152A AUPN015294A0 (en) | 1994-12-20 | 1994-12-20 | Emission spectrometer |
AUPN0152 | 1994-12-20 | ||
AUPN0478 | 1995-01-11 | ||
AUPN047895 | 1995-01-11 | ||
AU43217/96A AU696281B2 (en) | 1994-12-20 | 1995-12-19 | Spectrometer with discharge limiting means |
PCT/AU1995/000856 WO1996019716A1 (en) | 1994-12-20 | 1995-12-19 | Spectrometer with discharge limiting means |
Publications (2)
Publication Number | Publication Date |
---|---|
AU4321796A AU4321796A (en) | 1996-07-10 |
AU696281B2 true AU696281B2 (en) | 1998-09-03 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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AU43217/96A Ceased AU696281B2 (en) | 1994-12-20 | 1995-12-19 | Spectrometer with discharge limiting means |
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AU (1) | AU696281B2 (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0252475A2 (en) * | 1986-07-07 | 1988-01-13 | Shimadzu Corporation | Inductively-coupled radio frequency plasma mass spectrometer |
US5334834A (en) * | 1992-04-13 | 1994-08-02 | Seiko Instruments Inc. | Inductively coupled plasma mass spectrometry device |
-
1995
- 1995-12-19 AU AU43217/96A patent/AU696281B2/en not_active Ceased
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0252475A2 (en) * | 1986-07-07 | 1988-01-13 | Shimadzu Corporation | Inductively-coupled radio frequency plasma mass spectrometer |
US5334834A (en) * | 1992-04-13 | 1994-08-02 | Seiko Instruments Inc. | Inductively coupled plasma mass spectrometry device |
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AU4321796A (en) | 1996-07-10 |
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