AU6455086A - High-oxygen-content silicon monocrystal substrate for semiconductor devices and production method therefor - Google Patents

High-oxygen-content silicon monocrystal substrate for semiconductor devices and production method therefor

Info

Publication number
AU6455086A
AU6455086A AU64550/86A AU6455086A AU6455086A AU 6455086 A AU6455086 A AU 6455086A AU 64550/86 A AU64550/86 A AU 64550/86A AU 6455086 A AU6455086 A AU 6455086A AU 6455086 A AU6455086 A AU 6455086A
Authority
AU
Australia
Prior art keywords
oxygen
production method
semiconductor devices
method therefor
monocrystal substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
AU64550/86A
Other versions
AU597599B2 (en
Inventor
Motonobu Futagami
Yasaburo Kato
Toshihiko Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of AU6455086A publication Critical patent/AU6455086A/en
Application granted granted Critical
Publication of AU597599B2 publication Critical patent/AU597599B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02381—Silicon, silicon germanium, germanium
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/30—Mechanisms for rotating or moving either the melt or the crystal
    • C30B15/305—Stirring of the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/20—Controlling or regulating
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
AU64550/86A 1985-10-31 1986-10-30 High-oxygen-content silicon monocrystal substrate for semiconductor devices and production method therefor Ceased AU597599B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP60-244562 1985-10-31
JP60244562A JPS62105998A (en) 1985-10-31 1985-10-31 Production of silicon substrate

Publications (2)

Publication Number Publication Date
AU6455086A true AU6455086A (en) 1987-05-07
AU597599B2 AU597599B2 (en) 1990-06-07

Family

ID=17120560

Family Applications (1)

Application Number Title Priority Date Filing Date
AU64550/86A Ceased AU597599B2 (en) 1985-10-31 1986-10-30 High-oxygen-content silicon monocrystal substrate for semiconductor devices and production method therefor

Country Status (14)

Country Link
JP (1) JPS62105998A (en)
KR (1) KR870004498A (en)
CN (1) CN1016191B (en)
AT (1) ATA289086A (en)
AU (1) AU597599B2 (en)
CA (1) CA1336061C (en)
DE (1) DE3637006A1 (en)
DK (1) DK518486A (en)
FR (1) FR2589489B1 (en)
GB (1) GB2182262B (en)
IT (1) IT1198454B (en)
MY (1) MY100449A (en)
NL (1) NL8602738A (en)
SE (1) SE8604627L (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5196085A (en) * 1990-12-28 1993-03-23 Massachusetts Institute Of Technology Active magnetic flow control in Czochralski systems
JP2613498B2 (en) * 1991-03-15 1997-05-28 信越半導体株式会社 Heat treatment method for Si single crystal wafer
JPH07247197A (en) * 1994-03-09 1995-09-26 Fujitsu Ltd Semiconductor device and its production
JP3443822B2 (en) * 1996-03-27 2003-09-08 信越半導体株式会社 Method for producing silicon single crystal
DE19711922A1 (en) * 1997-03-21 1998-09-24 Wacker Siltronic Halbleitermat Device and method for pulling a single crystal
KR100508048B1 (en) 1997-04-09 2005-08-17 엠이엠씨 일렉트로닉 머티리얼즈 인코포레이티드 A process for manufacturing low defect density silicon ingot
US6379642B1 (en) 1997-04-09 2002-04-30 Memc Electronic Materials, Inc. Vacancy dominated, defect-free silicon
CN1316072C (en) 1997-04-09 2007-05-16 Memc电子材料有限公司 Low defect density, ideal oxygen precipitating silicon
JPH11268987A (en) * 1998-03-20 1999-10-05 Shin Etsu Handotai Co Ltd Silicon single crystal and its production
KR20010041957A (en) 1998-06-26 2001-05-25 헨넬리 헬렌 에프 Process for growth of defect free silicon crystals of arbitrarily large diameters
US6236104B1 (en) 1998-09-02 2001-05-22 Memc Electronic Materials, Inc. Silicon on insulator structure from low defect density single crystal silicon
WO2000022197A1 (en) 1998-10-14 2000-04-20 Memc Electronic Materials, Inc. Epitaxial silicon wafers substantially free of grown-in defects
EP1125008B1 (en) 1998-10-14 2003-06-18 MEMC Electronic Materials, Inc. Thermally annealed, low defect density single crystal silicon
US6312516B2 (en) 1998-10-14 2001-11-06 Memc Electronic Materials, Inc. Process for preparing defect free silicon crystals which allows for variability in process conditions
US7105050B2 (en) 2000-11-03 2006-09-12 Memc Electronic Materials, Inc. Method for the production of low defect density silicon
US6858307B2 (en) 2000-11-03 2005-02-22 Memc Electronic Materials, Inc. Method for the production of low defect density silicon
DE10103691A1 (en) * 2001-01-26 2002-08-08 Crystal Growing Systems Gmbh Electrical energy supply used for an electrical heater for heating a crucible during crystal growing contains a twelve-pulse rectifier
EP1356139B1 (en) 2001-01-26 2006-08-09 MEMC Electronic Materials, Inc. Low defect density silicon substantially free of oxidation induced stacking faults having a vacancy-dominated core
KR101385810B1 (en) 2006-05-19 2014-04-16 엠이엠씨 일렉트로닉 머티리얼즈, 인크. Controlling agglomerated point defect and oxygen cluster formation induced by the lateral surface of a silicon single crystal during cz growth
JP5974978B2 (en) * 2013-05-29 2016-08-23 信越半導体株式会社 Silicon single crystal manufacturing method
CN105780113B (en) * 2016-03-10 2017-11-28 江西赛维Ldk太阳能高科技有限公司 A kind of method for characterizing crystalline silicon growth interface and the speed of growth
CN112095154B (en) * 2019-06-18 2021-05-14 上海新昇半导体科技有限公司 Semiconductor crystal growth device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5556098A (en) * 1978-10-17 1980-04-24 Chiyou Lsi Gijutsu Kenkyu Kumiai Method and apparatus for producing si single crystal rod
EP0042901B1 (en) * 1980-06-26 1984-10-31 International Business Machines Corporation Process for controlling the oxygen content of silicon ingots pulled by the czochralski method
GB2084046B (en) * 1980-08-27 1984-07-25 Secr Defence Method and apparatus for crystal growth
DE3170781D1 (en) * 1980-12-29 1985-07-04 Monsanto Co Method for regulating concentration and distribution of oxygen in czochralski grown silicon
NL8102102A (en) * 1981-04-29 1982-11-16 Philips Nv METHOD FOR DRAWING UP A SILICON BAR AND SEMICONDUCTOR DEVICE MADE FROM THE SILICON BAR.
JPH0244799B2 (en) * 1981-10-26 1990-10-05 Sony Corp KETSUSHOSEICHOHOHO
US4511428A (en) * 1982-07-09 1985-04-16 International Business Machines Corporation Method of controlling oxygen content and distribution in grown silicon crystals
JPS6027684A (en) * 1983-07-26 1985-02-12 Fujitsu Ltd Apparatus for producing single crystal
JPS6033289A (en) * 1983-07-29 1985-02-20 Toshiba Corp Preparation of single crystal of silicon
JPS6094722A (en) * 1983-08-16 1985-05-27 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Silicon wafer
JPS6153187A (en) * 1984-08-24 1986-03-17 Sony Corp Device for growing single crystal
IT1207497B (en) * 1985-05-29 1989-05-25 Montedison Spa MONO CRYSTALS OF GALLIO ARSENIURO WITH LOW DENSITY OF DISLOCATIONS AND HIGH PURITY.

Also Published As

Publication number Publication date
FR2589489B1 (en) 1994-06-10
NL8602738A (en) 1987-05-18
JPS62105998A (en) 1987-05-16
CN86106346A (en) 1987-06-17
GB2182262A (en) 1987-05-13
FR2589489A1 (en) 1987-05-07
CN1016191B (en) 1992-04-08
AU597599B2 (en) 1990-06-07
DK518486A (en) 1987-05-01
IT1198454B (en) 1988-12-21
MY100449A (en) 1990-10-15
KR870004498A (en) 1987-05-09
SE8604627D0 (en) 1986-10-30
GB2182262B (en) 1989-09-27
DK518486D0 (en) 1986-10-30
GB8626074D0 (en) 1986-12-03
SE8604627L (en) 1987-05-01
DE3637006A1 (en) 1987-05-07
CA1336061C (en) 1995-06-27
ATA289086A (en) 1996-01-15
IT8648592A0 (en) 1986-10-28

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