AU6148199A - A method and apparatus for launching microwave energy into plasma processing chamber - Google Patents

A method and apparatus for launching microwave energy into plasma processing chamber

Info

Publication number
AU6148199A
AU6148199A AU61481/99A AU6148199A AU6148199A AU 6148199 A AU6148199 A AU 6148199A AU 61481/99 A AU61481/99 A AU 61481/99A AU 6148199 A AU6148199 A AU 6148199A AU 6148199 A AU6148199 A AU 6148199A
Authority
AU
Australia
Prior art keywords
processing chamber
plasma processing
microwave energy
launching microwave
launching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU61481/99A
Inventor
Frank C. Doughty
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PlasmaQuest Inc
Original Assignee
PlasmaQuest Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PlasmaQuest Inc filed Critical PlasmaQuest Inc
Publication of AU6148199A publication Critical patent/AU6148199A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
AU61481/99A 1998-09-15 1999-09-14 A method and apparatus for launching microwave energy into plasma processing chamber Abandoned AU6148199A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09153193 1998-09-15
US09/153,193 US6225592B1 (en) 1998-09-15 1998-09-15 Method and apparatus for launching microwave energy into a plasma processing chamber
PCT/US1999/021352 WO2000015867A1 (en) 1998-09-15 1999-09-14 A method and apparatus for launching microwave energy into a plasma processing chamber

Publications (1)

Publication Number Publication Date
AU6148199A true AU6148199A (en) 2000-04-03

Family

ID=22546173

Family Applications (1)

Application Number Title Priority Date Filing Date
AU61481/99A Abandoned AU6148199A (en) 1998-09-15 1999-09-14 A method and apparatus for launching microwave energy into plasma processing chamber

Country Status (3)

Country Link
US (1) US6225592B1 (en)
AU (1) AU6148199A (en)
WO (1) WO2000015867A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6579805B1 (en) * 1999-01-05 2003-06-17 Ronal Systems Corp. In situ chemical generator and method
TW551782U (en) * 2002-10-09 2003-09-01 Ind Tech Res Inst Microwave plasma processing device
US7375035B2 (en) * 2003-04-29 2008-05-20 Ronal Systems Corporation Host and ancillary tool interface methodology for distributed processing
US7429714B2 (en) * 2003-06-20 2008-09-30 Ronal Systems Corporation Modular ICP torch assembly
GB0517334D0 (en) * 2005-08-24 2005-10-05 Dow Corning Method and apparatus for creating a plasma
US7353771B2 (en) * 2005-11-07 2008-04-08 Mks Instruments, Inc. Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
US20100101728A1 (en) * 2007-03-29 2010-04-29 Tokyo Electron Limited Plasma process apparatus
US8692466B2 (en) * 2009-02-27 2014-04-08 Mks Instruments Inc. Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
FR2993429B1 (en) * 2012-07-11 2016-08-05 Centre Nat De La Rech Scient (Cnrs) COAXIAL MICROWAVE APPLICATOR FOR PLASMA PRODUCTION
PT2920533T (en) * 2012-11-16 2018-10-22 Nuwave Res Inc Apparatus and method for dehydration using microwave radiation
US11037765B2 (en) * 2018-07-03 2021-06-15 Tokyo Electron Limited Resonant structure for electron cyclotron resonant (ECR) plasma ionization
CN109302791B (en) * 2018-10-26 2023-08-22 中国科学院合肥物质科学研究院 Microwave antenna regulation and control magnetic enhancement linear plasma source generation system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3946340A (en) * 1974-03-18 1976-03-23 Electromagnetic Sciences, Inc. Phase shifter
DE2805753A1 (en) * 1978-02-10 1979-08-23 Siemens Ag Rectangular section waveguide aerial horn radiator - has ferrite plate on waveguide narrow side at right angles to EM waves propagation direction
DE68926923T2 (en) * 1988-03-16 1996-12-19 Hitachi Ltd Microwave ion source
JPH04129133A (en) * 1990-09-20 1992-04-30 Hitachi Ltd Ion source and plasma device
KR0156011B1 (en) * 1991-08-12 1998-12-01 이노우에 아키라 Plasma treating apparatus and method thereof
US5466295A (en) * 1993-10-25 1995-11-14 Board Of Regents Acting For The Univ. Of Michigan ECR plasma generation apparatus and methods
US5611864A (en) * 1994-03-24 1997-03-18 Matsushita Electric Industrial Co., Ltd. Microwave plasma processing apparatus and processing method using the same
TW312815B (en) * 1995-12-15 1997-08-11 Hitachi Ltd

Also Published As

Publication number Publication date
WO2000015867A1 (en) 2000-03-23
US6225592B1 (en) 2001-05-01

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase