AU2788700A - Magnetron sputtering method and apparatus - Google Patents

Magnetron sputtering method and apparatus

Info

Publication number
AU2788700A
AU2788700A AU27887/00A AU2788700A AU2788700A AU 2788700 A AU2788700 A AU 2788700A AU 27887/00 A AU27887/00 A AU 27887/00A AU 2788700 A AU2788700 A AU 2788700A AU 2788700 A AU2788700 A AU 2788700A
Authority
AU
Australia
Prior art keywords
sputtering method
magnetron sputtering
magnetron
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU27887/00A
Inventor
Michael Ioumchtyk
Gennady Yumshtyk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cametoid Ltd
Original Assignee
NAT SURFACE TECHNOLOGIES Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NAT SURFACE TECHNOLOGIES Inc filed Critical NAT SURFACE TECHNOLOGIES Inc
Publication of AU2788700A publication Critical patent/AU2788700A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
AU27887/00A 1999-02-25 2000-02-25 Magnetron sputtering method and apparatus Abandoned AU2788700A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09257012 1999-02-25
US09/257,012 US6193853B1 (en) 1999-02-25 1999-02-25 Magnetron sputtering method and apparatus
PCT/CA2000/000185 WO2000050662A1 (en) 1999-02-25 2000-02-25 Magnetron sputtering method and apparatus

Publications (1)

Publication Number Publication Date
AU2788700A true AU2788700A (en) 2000-09-14

Family

ID=22974531

Family Applications (1)

Application Number Title Priority Date Filing Date
AU27887/00A Abandoned AU2788700A (en) 1999-02-25 2000-02-25 Magnetron sputtering method and apparatus

Country Status (5)

Country Link
US (2) US6193853B1 (en)
EP (1) EP1165853A1 (en)
AU (1) AU2788700A (en)
CA (2) CA2299482A1 (en)
WO (1) WO2000050662A1 (en)

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US7052736B2 (en) * 2002-06-11 2006-05-30 Southwest Research Institute Method for depositing coatings on the interior surfaces of tubular structures
US6767436B2 (en) * 2002-09-25 2004-07-27 Hrl Laboratories, Llc Method and apparatus of plasma-enhanced coaxial magnetron for sputter-coating interior surfaces
US7737382B2 (en) * 2004-04-01 2010-06-15 Lincoln Global, Inc. Device for processing welding wire
US7867366B1 (en) * 2004-04-28 2011-01-11 Alameda Applied Sciences Corp. Coaxial plasma arc vapor deposition apparatus and method
US20060207871A1 (en) * 2005-03-16 2006-09-21 Gennady Yumshtyk Sputtering devices and methods
US7696696B2 (en) * 2005-08-04 2010-04-13 Stc.Unm Magnetron having a transparent cathode and related methods of generating high power microwaves
MX345403B (en) 2009-05-13 2017-01-30 Sio2 Medical Products Inc Pecvd coating using an organosilicon precursor.
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
CN101645472B (en) * 2009-08-18 2011-06-15 普乐新能源（蚌埠）有限公司 Power supply method and special power supply device for mobile return vehicle in magnetron sputtering production line
AT508962A1 (en) * 2009-11-05 2011-05-15 Miba Gleitlager Gmbh METHOD FOR PRODUCING A SLIDING BEARING ELEMENT
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US20120312233A1 (en) * 2011-06-10 2012-12-13 Ge Yi Magnetically Enhanced Thin Film Coating Method and Apparatus
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
EP2776603B1 (en) 2011-11-11 2019-03-06 SiO2 Medical Products, Inc. PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS
US20130126333A1 (en) * 2011-11-22 2013-05-23 Vapor Technologies, Inc. Magnetic Field Configuration For Energetic Plasma Surface Treatment and Energetic Deposition Conditions
CN102517555A (en) * 2012-01-06 2012-06-27 李德杰 Equipment and technology for coating pipe
CA2887352A1 (en) 2012-05-09 2013-11-14 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
EP2914762B1 (en) 2012-11-01 2020-05-13 SiO2 Medical Products, Inc. Coating inspection method
US9903782B2 (en) 2012-11-16 2018-02-27 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
WO2014085348A2 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
KR102472240B1 (en) 2013-03-11 2022-11-30 에스아이오2 메디컬 프로덕츠, 인크. Coated Packaging
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
WO2014144926A1 (en) 2013-03-15 2014-09-18 Sio2 Medical Products, Inc. Coating method
GB2517436A (en) * 2013-08-19 2015-02-25 Pct Protective Coating Technologies Ltd Coating or sealing an internal surface of a workpiece
US9840765B2 (en) * 2013-10-16 2017-12-12 General Electric Company Systems and method of coating an interior surface of an object
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
US9368330B2 (en) 2014-05-02 2016-06-14 Bh5773 Ltd Sputtering targets and methods
WO2016132175A1 (en) * 2015-02-19 2016-08-25 Pct Protective Coating Technologies Ltd. Coating or sealing internal surface of a workpiece
US9765424B2 (en) 2015-02-25 2017-09-19 Engineering And Software System Solutions, Inc. Method of refurbishing high value articles
JP6507875B2 (en) * 2015-06-17 2019-05-08 富士電機株式会社 Method of manufacturing silicon carbide semiconductor device
US11077233B2 (en) 2015-08-18 2021-08-03 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
GB201516171D0 (en) * 2015-09-14 2015-10-28 Gencoa Ltd Ion source sputtering
US9905345B2 (en) * 2015-09-21 2018-02-27 Apple Inc. Magnet electroplating
US9546837B1 (en) 2015-10-09 2017-01-17 Bh5773 Ltd Advanced gun barrel

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US4031424A (en) 1971-09-07 1977-06-21 Telic Corporation Electrode type glow discharge apparatus
US4041353A (en) 1971-09-07 1977-08-09 Telic Corporation Glow discharge method and apparatus
US3995187A (en) 1971-09-07 1976-11-30 Telic Corporation Electrode type glow discharge apparatus
US3884793A (en) 1971-09-07 1975-05-20 Telic Corp Electrode type glow discharge apparatus
DE2253769C3 (en) 1972-11-02 1979-07-12 Siemens Ag, 1000 Berlin Und 8000 Muenchen Cathode sputtering system with continuous substrate flow
US3855110A (en) 1973-11-15 1974-12-17 United Aircraft Corp Cylindrical rf sputtering apparatus
US4116793A (en) 1974-12-23 1978-09-26 Telic Corporation Glow discharge method and apparatus
US4536640A (en) * 1981-07-14 1985-08-20 The Standard Oil Company (Ohio) High pressure, non-logical thermal equilibrium arc plasma generating apparatus for deposition of coatings upon substrates
GB2109822A (en) * 1981-11-19 1983-06-08 Diffusion Alloys Ltd Metal diffusion process
US4376025A (en) 1982-06-14 1983-03-08 Battelle Development Corporation Cylindrical cathode for magnetically-enhanced sputtering
US4478703A (en) 1983-03-31 1984-10-23 Kawasaki Jukogyo Kabushiki Kaisha Sputtering system
JPH07116598B2 (en) 1986-10-06 1995-12-13 石川島播磨重工業株式会社 Sputtering device
EP0298157B1 (en) * 1987-06-29 1992-09-02 Hauzer Holding B.V. Method and device for coating cavities of objects
US4960753A (en) 1987-07-29 1990-10-02 Collins George J Magnetron deposition of ceramic oxide-superconductor thin films
US4842704A (en) * 1987-07-29 1989-06-27 Collins George J Magnetron deposition of ceramic oxide-superconductor thin films
US4885070A (en) 1988-02-12 1989-12-05 Leybold Aktiengesellschaft Method and apparatus for the application of materials
DE3832693A1 (en) 1988-09-27 1990-03-29 Leybold Ag DEVICE FOR APPLYING DIELECTRIC OR METAL MATERIALS
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US5591313A (en) 1995-06-30 1997-01-07 Tabco Technologies, Inc. Apparatus and method for localized ion sputtering
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Also Published As

Publication number Publication date
CA2362146C (en) 2008-02-12
CA2362146A1 (en) 2000-08-31
WO2000050662A1 (en) 2000-08-31
US6193853B1 (en) 2001-02-27
CA2299482A1 (en) 2000-08-25
US6365011B1 (en) 2002-04-02
EP1165853A1 (en) 2002-01-02

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase