AU6117690A - Radiation - sensitive positive - working mixture - Google Patents

Radiation - sensitive positive - working mixture

Info

Publication number
AU6117690A
AU6117690A AU61176/90A AU6117690A AU6117690A AU 6117690 A AU6117690 A AU 6117690A AU 61176/90 A AU61176/90 A AU 61176/90A AU 6117690 A AU6117690 A AU 6117690A AU 6117690 A AU6117690 A AU 6117690A
Authority
AU
Australia
Prior art keywords
radiation
working mixture
sensitive positive
sensitive
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU61176/90A
Inventor
Erich Beck
Eleonore Bueschges
Joachim Roser
Guenther Schulz
Friedrich Seitz
Thomas Zwez
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of AU6117690A publication Critical patent/AU6117690A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G71/00—Macromolecular compounds obtained by reactions forming a ureide or urethane link, otherwise, than from isocyanate radicals in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
AU61176/90A 1989-08-22 1990-08-21 Radiation - sensitive positive - working mixture Abandoned AU6117690A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3927629A DE3927629A1 (en) 1989-08-22 1989-08-22 RADIATION-SENSITIVE, POSITIVELY WORKING MIXTURE
DE3927629 1989-08-22

Publications (1)

Publication Number Publication Date
AU6117690A true AU6117690A (en) 1991-02-28

Family

ID=6387578

Family Applications (1)

Application Number Title Priority Date Filing Date
AU61176/90A Abandoned AU6117690A (en) 1989-08-22 1990-08-21 Radiation - sensitive positive - working mixture

Country Status (6)

Country Link
EP (1) EP0414100A3 (en)
JP (1) JPH03106917A (en)
KR (1) KR910004709A (en)
AU (1) AU6117690A (en)
CA (1) CA2023660A1 (en)
DE (1) DE3927629A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08157744A (en) * 1994-12-12 1996-06-18 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element produced therefrom
EP1290499A1 (en) * 2000-06-06 2003-03-12 Hodogaya Chemical Co., Ltd. Photosensitive resin composition and photosensitive material using the same
JP4613552B2 (en) * 2003-09-25 2011-01-19 日本合成化学工業株式会社 Resist image forming material and resist image forming method thereof
JP2023520137A (en) * 2020-03-31 2023-05-16 ディーエスエム アイピー アセッツ ビー．ブイ． Method for producing terpenoid intermediates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1464942A (en) * 1973-02-01 1977-02-16 Polychrome Corp Polymers process for their preparation and their use in photo polymerizable compositions and elements for relief images
JPH07117749B2 (en) * 1987-07-28 1995-12-18 富士写真フイルム株式会社 Non-photopolymerizable image forming layer

Also Published As

Publication number Publication date
DE3927629A1 (en) 1991-02-28
KR910004709A (en) 1991-03-29
CA2023660A1 (en) 1991-02-23
EP0414100A3 (en) 1991-10-23
JPH03106917A (en) 1991-05-07
EP0414100A2 (en) 1991-02-27

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