AU5353790A - Hexahydroxybenzophenone compounds as sensitivity enhancers for radiation sensitive mixtures - Google Patents

Hexahydroxybenzophenone compounds as sensitivity enhancers for radiation sensitive mixtures

Info

Publication number
AU5353790A
AU5353790A AU53537/90A AU5353790A AU5353790A AU 5353790 A AU5353790 A AU 5353790A AU 53537/90 A AU53537/90 A AU 53537/90A AU 5353790 A AU5353790 A AU 5353790A AU 5353790 A AU5353790 A AU 5353790A
Authority
AU
Australia
Prior art keywords
hexahydroxybenzophenone
compounds
radiation sensitive
sensitive mixtures
sensitivity enhancers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU53537/90A
Inventor
Tripunithura V. Jayaraman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olin Hunt Specialty Products Inc
Original Assignee
Olin Hunt Specialty Products Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olin Hunt Specialty Products Inc filed Critical Olin Hunt Specialty Products Inc
Publication of AU5353790A publication Critical patent/AU5353790A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
AU53537/90A 1989-04-27 1990-03-30 Hexahydroxybenzophenone compounds as sensitivity enhancers for radiation sensitive mixtures Abandoned AU5353790A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US343555 1982-01-28
US34355589A 1989-04-27 1989-04-27

Publications (1)

Publication Number Publication Date
AU5353790A true AU5353790A (en) 1990-11-16

Family

ID=23346593

Family Applications (1)

Application Number Title Priority Date Filing Date
AU53537/90A Abandoned AU5353790A (en) 1989-04-27 1990-03-30 Hexahydroxybenzophenone compounds as sensitivity enhancers for radiation sensitive mixtures

Country Status (2)

Country Link
AU (1) AU5353790A (en)
WO (1) WO1990013058A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3506295B2 (en) * 1995-12-22 2004-03-15 富士写真フイルム株式会社 Positive photosensitive lithographic printing plate

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3661582A (en) * 1970-03-23 1972-05-09 Western Electric Co Additives to positive photoresists which increase the sensitivity thereof
DE2547905C2 (en) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt Photosensitive recording material
DE2847878A1 (en) * 1978-11-04 1980-05-22 Hoechst Ag LIGHT SENSITIVE MIXTURE
US4365019A (en) * 1981-08-06 1982-12-21 Eastman Kodak Company Positive-working resist quinone diazide containing composition and imaging method having improved development rates
JPS61141441A (en) * 1984-12-14 1986-06-28 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition
JPS63178228A (en) * 1987-01-20 1988-07-22 Fuji Photo Film Co Ltd Positive type photoresist composition
JPS63305348A (en) * 1987-06-05 1988-12-13 Fuji Photo Film Co Ltd Positive type resist composition

Also Published As

Publication number Publication date
WO1990013058A1 (en) 1990-11-01

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