AU4326893A - Installation for processing objects under clean-room conditions - Google Patents

Installation for processing objects under clean-room conditions

Info

Publication number
AU4326893A
AU4326893A AU43268/93A AU4326893A AU4326893A AU 4326893 A AU4326893 A AU 4326893A AU 43268/93 A AU43268/93 A AU 43268/93A AU 4326893 A AU4326893 A AU 4326893A AU 4326893 A AU4326893 A AU 4326893A
Authority
AU
Australia
Prior art keywords
installation
room conditions
processing objects
objects under
under clean
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU43268/93A
Other languages
English (en)
Inventor
Lothar Bartz
Reinhard Mordau
Burkhard Muller
Wolfgang Pokorny
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pokorny GmbH
Original Assignee
Pokorny GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pokorny GmbH filed Critical Pokorny GmbH
Publication of AU4326893A publication Critical patent/AU4326893A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
AU43268/93A 1992-06-25 1993-06-17 Installation for processing objects under clean-room conditions Abandoned AU4326893A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19924220827 DE4220827A1 (de) 1992-06-25 1992-06-25 Anlage zur Behandlung von Objekten unter Reinluftraum-Bedingungen
DE4220827 1992-06-25
PCT/EP1993/001537 WO1994000622A1 (de) 1992-06-25 1993-06-17 Anlage zur behandlung von objekten unter reinluftraum-bedingungen

Publications (1)

Publication Number Publication Date
AU4326893A true AU4326893A (en) 1994-01-24

Family

ID=6461796

Family Applications (1)

Application Number Title Priority Date Filing Date
AU43268/93A Abandoned AU4326893A (en) 1992-06-25 1993-06-17 Installation for processing objects under clean-room conditions

Country Status (3)

Country Link
AU (1) AU4326893A (de)
DE (1) DE4220827A1 (de)
WO (1) WO1994000622A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6890636B2 (en) * 2000-04-11 2005-05-10 Sordal Incorporated Thermally stable, non-woven, fibrous paper, derivatives thereof, and methods for manufacturing the same
DE102010028883A1 (de) 2010-05-11 2011-11-17 Dürr Ecoclean GmbH Prozessbehälter

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4586743A (en) * 1984-09-24 1986-05-06 Intelledex Incorporated Robotic gripper for disk-shaped objects
US4788994A (en) * 1986-08-13 1988-12-06 Dainippon Screen Mfg. Co. Wafer holding mechanism
US5000113A (en) * 1986-12-19 1991-03-19 Applied Materials, Inc. Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
DE3707672A1 (de) * 1987-03-10 1988-09-22 Sitesa Sa Epitaxieanlage
US4913929A (en) * 1987-04-21 1990-04-03 The Board Of Trustees Of The Leland Stanford Junior University Thermal/microwave remote plasma multiprocessing reactor and method of use
EP0296891B1 (de) * 1987-06-26 1996-01-10 Applied Materials, Inc. Verfahren zur Selbstreinigung einer Reaktionskammer
US5062386A (en) * 1987-07-27 1991-11-05 Epitaxy Systems, Inc. Induction heated pancake epitaxial reactor
DD281613A5 (de) * 1988-08-12 1990-08-15 Elektromat Veb Verfahren zur reinigung von reaktoren zur gasphasenbearbeitung von werkstuecken
NL8900544A (nl) * 1989-03-06 1990-10-01 Asm Europ Behandelingsstelsel, behandelingsvat en werkwijze voor het behandelen van een substraat.
US5002630A (en) * 1989-06-06 1991-03-26 Rapro Technology Method for high temperature thermal processing with reduced convective heat loss
DE69128050D1 (de) * 1990-06-29 1997-12-04 Applied Materials Inc Zweistufiges Selbstreinigungsverfahren einer Reaktionskammer

Also Published As

Publication number Publication date
WO1994000622A1 (de) 1994-01-06
DE4220827A1 (de) 1994-01-13

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