AU4244896A - Method and apparatus for reducing arcing in plasma processing chambers - Google Patents

Method and apparatus for reducing arcing in plasma processing chambers

Info

Publication number
AU4244896A
AU4244896A AU42448/96A AU4244896A AU4244896A AU 4244896 A AU4244896 A AU 4244896A AU 42448/96 A AU42448/96 A AU 42448/96A AU 4244896 A AU4244896 A AU 4244896A AU 4244896 A AU4244896 A AU 4244896A
Authority
AU
Australia
Prior art keywords
plasma processing
processing chambers
reducing arcing
arcing
reducing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU42448/96A
Inventor
Bhola N De
Jonathan Ishii
Charles N Vannutt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Materials Research Corp
Original Assignee
Materials Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Materials Research Corp filed Critical Materials Research Corp
Publication of AU4244896A publication Critical patent/AU4244896A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3441—Dark space shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3423—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
AU42448/96A 1994-11-04 1995-11-03 Method and apparatus for reducing arcing in plasma processing chambers Abandoned AU4244896A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US33456194A 1994-11-04 1994-11-04
US334561 1994-11-04
PCT/US1995/015324 WO1996014653A2 (en) 1994-11-04 1995-11-03 Method and apparatus for reducing arcing in plasma processing chambers

Publications (1)

Publication Number Publication Date
AU4244896A true AU4244896A (en) 1996-05-31

Family

ID=23307784

Family Applications (1)

Application Number Title Priority Date Filing Date
AU42448/96A Abandoned AU4244896A (en) 1994-11-04 1995-11-03 Method and apparatus for reducing arcing in plasma processing chambers

Country Status (3)

Country Link
JP (1) JPH09511027A (en)
AU (1) AU4244896A (en)
WO (1) WO1996014653A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8790499B2 (en) * 2005-11-25 2014-07-29 Applied Materials, Inc. Process kit components for titanium sputtering chamber

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4201551C2 (en) * 1992-01-22 1996-04-25 Leybold Ag Atomizing cathode
DE4304581A1 (en) * 1993-02-16 1994-08-18 Leybold Ag Device for coating a substrate
DE69403386T2 (en) * 1993-05-19 1997-09-18 Applied Materials Inc Device and method for increasing the atomization rate in an atomizer

Also Published As

Publication number Publication date
WO1996014653A3 (en) 1996-08-29
WO1996014653A2 (en) 1996-05-17
JPH09511027A (en) 1997-11-04

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