AU3707799A - Heavy metal-free coating formulations - Google Patents

Heavy metal-free coating formulations Download PDF

Info

Publication number
AU3707799A
AU3707799A AU37077/99A AU3707799A AU3707799A AU 3707799 A AU3707799 A AU 3707799A AU 37077/99 A AU37077/99 A AU 37077/99A AU 3707799 A AU3707799 A AU 3707799A AU 3707799 A AU3707799 A AU 3707799A
Authority
AU
Australia
Prior art keywords
composition according
compound
compounds
alkyl
bis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
AU37077/99A
Other versions
AU758652B2 (en
Inventor
Gisele Baudin
Allan Francis Cunningham
Ljubomir Misev
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of AU3707799A publication Critical patent/AU3707799A/en
Application granted granted Critical
Publication of AU758652B2 publication Critical patent/AU758652B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/687Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D171/02Polyalkylene oxides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04Polyurethanes
    • C09D175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/10Block or graft copolymers containing polysiloxane sequences
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/38Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Paints Or Removers (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Epoxy Resins (AREA)

Description

WO 99/56177 PCT/EP99/02511 Heavy metal-free coating formulations The present invention relates to heavy metal-free UV-curable, cationically polymerisable compositions and to their use. In J. of Photopolym. Sci. and Techn., Vol. 5 (1992), p. 247-254, F. Hamazu et al. published investigations regarding the reactivity of sulfonium salts containing different anions. A curing process for cationically curable pigmented formulations is known from WO 98/02493. JP-A Sho 61-175921 describes back coatings for magnetic recording materials based on glycidyl ether formulations. US 4378277 discloses unpigmented photocurable formulations com prising glycidyl ether and a mixture of initiator compounds. US 4287228 describes glycidyl ether-containing compositions pigmented with titanium dioxide. WO 96/13538 discloses cationically polymerisable formulations using aryl iodonium salts as initiators and dicarbonyl compounds as sensitisers. The technology has a demand for formulations which are radiation-curable, reactive, catio nically curable, inexpensive, white and hardly yellowing, especially for use as coatings. It has been found that the above requirements are fully met by a composition, which comprises (a) mono-, bis- or higher aliphatic or aromatic glycidyl ethers, (b) titanium dioxide, (c) at least one iodonium hexafluorophosphate salt as photoinitiator, and (d) a sensitiser compound. The photoinitiator (c) is, for example, a compound of formula I R,
R
4 / I / R 2
PF
6 (1), wherein
R
3
R
1 , R 2 , R 3 and R 4 are each independently of one another hydrogen, C-C 20 alkyl or unsub stituted or hydroxyl-substituted C-C 20 alkoxy, with the proviso that at least one of R 1 , R 2 , R 3 or R 4 is not hydrogen.
WO 99/56177 PCT/EP99/02511 -2
C
1
-C
20 Alkyl is linear or branched and is, for example, C1C12-, C1-C8-, C1-C6- or C 1
-C
4 alkyl. Examples are methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethylpentyl, 2-ethylhexyl, octyl, nonyl, decyl, undecyl, dodecyl, tetra decyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, nonadecyl or eicosyl. Branched alkyl is preferred, in particular C3-C8-, C3-C6- and C 3
-C
4 alkyl. R 2 and R 4 are, for example, 0 1
-C
2 alkyl, CrC-Oalkyl or 0 1
-C
6 alkyl, preferably C 1
-C
4 alkyl, such as isobutyl, or 0 1
-C
12 alkyl, such as dodecyl.
C
1
-C
2 0Alkoxy is a linear or branched radical and is, for example, C1-C12-, C1-C8-, C1-C6- or
C
1
-C
4 alkoxy. Examples are methoxy, ethoxy, propoxy, isopropoxy, n-butyloxy, sec-butyloxy, isobutyloxy, tert-butyloxy, pentyloxy, hexyloxy, heptyloxy, 2,4,4-trimethypentyloxy, 2-ethyl hexyloxy, octyloxy, nonyloxy, decyloxy, dodecyloxy, hexadecyloxy or octadecyloxy, prefeF ably methoxy, ethoxy, propoxy, isopropoxy, n-butyloxy, sec-butyloxy, isobutyloxy, tert-butyl oxy, more preferably methoxy. Preferred compounds are, for example, n-C 4
-C
6 -, n-C 1
-C
6 -, n C2-C6-, n-C 1 rC4- n-C 2
-C
4 alkoxy. n-C 1 2
-C
20 Alkoxy is also interesting. Compounds of formula I to be highlighted are those, wherein R 1 , R 2 , R 3 and R 4 are CrC20 alkyl, preferably 0 1
-C
2 alkyl. Other interesting compounds are those of formula I, wherein R 1 , R 2 , R 3 and R 4 are branched
C-C
20 alkyl, preferably branched C 1
-CO
12 alkyl or branched C 1
-C
4 alkyl. Preferred compounds of formula I are those, wherein R 2 and R 4 are C 1
-C
2 oalkyl, and R 1 and
R
3 are hydrogen. Other interesting compounds of formula I are those, wherein R 2 and R 4 are identical. Those compounds of formula I merit particular mention, wherein R 2 is CrCO 2 alkyl, preferably isobutyl or dodecyl, and R 1 , R 3 and R 4 are hydrogen. Other particularly preferred compounds of formula I are those, wherein R 2 and R 4 are C-C12 alkyl, such as isobutyl or dodecyl. Preferred compounds of formula I are those, wherein R 2 is C 1
-C
4 alkyI if R 1 , R 2 and R 3 are hydrogen.
WO 99/56177 PCT/EP99/02511 -3 Other preferred compounds of formula I are those wherein R 2 is C-C 4 alkoxy if R 1 , R 2 and R 3 are hydrogen. Those compounds of formula I are also preferred wherein R 2 is C1 0
-C
20 alkoxy if R 1 , R 2 and R 3 are hydrogen. Examples of compounds of formula I are bis(4-hexylphenyl)iodonium hexafluorophosphate; (4-hexylphenyl)phenyl iodonium hexa fluorophosphate; bis(4-octylphenyl)iodonium hexafluorophosphate; (4-octylphenyl)phenyl iodonium hexafluorophosphate; bis(4-decylphenyl)iodonium hexafluorophosphate; (4-isobu tylphenyl)phenyl iodonium hexafluorophosphate; bis(4-isobutylphenyl)iodonium hexafluoro phosphate; (4-dodecylphenyl)phenyl iodonium hexafluorophosphate; (2-hydroxydodecyloxy phenyl)phenyl iodonium hexafluorophosphate; (2-hydroxytetradecyloxyphenyl)phenyl iocbni um hexafluorophosphate. This invention also relates to (4-isobutylphenyl)phenyl iodonium hexafluorophosphate, in particular dissolved in propylene carbonate. In certain cases it may be advantageous to use mixtures of two or more of such iodonium salt photoinitiators in the compositions of this invention. The preparation of the photoinitiator compounds of formula I is familiar to the skilled person and is described in the literature. Thus, compounds of formula I can be prepared, for exam ple, by the process described in US patents 4399071 and 4329300 and in DE 2754853. The hexafluorophosphate salts can be prepared, for example, by exchanging the anions of the simple salts of the corresponding iodonium compounds (e.g. those of the bisulfates). These methods have been published, inter alia, by Beringer et al. in J. Am. Chem. Soc. 81, 342 (1959). This literature also describes different methods for the preparation of the above mentioned simple salts, for example the reaction of two aromatic compounds with iodyl sul fate in sulfuric acid; the reaction of two aromatic compounds with iodate in acetic acid, acetic anhydride, sulfuric acid; the reaction of two aromatic compounds with iodine acylate in the presence of an acid, or the condensation of a iodosyl compound, of a iodosyl diacetate or of a iodoyl compound with another aromatic compound in the presence of an acid. In some cases it is also possible to oxidise an aryl iodide in situ and to then condense it with another aromatic compound. This variant of the condensation proceeds, for example, in dilute sulfuric acid (EP 119 068).
WO 99/56177 PCT/EP99/02511 -4 In the compositions of this invention, the photoinitiator (c) is conveniently used in an amount from 0.05% to 15%, for example from 0.5% to 10%, preferably from 0.1% to 5%, based on the composition. The glycidyl ether components (a) used in the novel formulations are typically glycidyl ethers of polyvalent phenols obtained by reacting polyvalent phenols with an excess of chlorohyd rin, such as epichlorohydrin (e.g. glycidyl ether of 2,2-bis(2,3-epoxypropoxyphenol)propane. Other examples of glycidyl ether epoxides which can be used in connection with this inven tion are described, inter alia, in US 3018262 and in "Handbook of Epoxy Resins" by Lee and Neville, McGraw-Hill Book Co., New York (1967). There are also numerous commercially available glycidyl ether epoxides which can be used as component (a), for example glycidyl methacrylate, diglycidyl ether of bisphenol A, e.g. those obtainable under the tradenames EPON 828, EPON 825, EPON 1004 and EPON 1010, of Shell; DER-331, DER-332 and DER-334, of Dow Chemical; 1,4-butanediol diglycidyl ether of phenolformaldehyde novolak, e.g. DEN-431, DEN-438, of Dow Chemical; and resor cinol diglycidyl ether; alkyl glycidyl ether, such as CB-C 1 oglycidyl ether, e.g. HELOXY modifier 7, C 12 -Cl 4 glycidyl ether, e.g. HELOXY modifier 8, butyl glycidyl ether, e.g. HELOXY modifier 61, cresyl glycidyl ether, e.g. HELOXY modifier 62, p-tert-butylphenyl glycidyl ether, e.g. HELOXY modifier 65, polyfunctional glycidyl ethers, for example diglycidyl ether of 1,4-bu tanediol, e.g. HELOXY modifier 67, diglycidyl ether of neopentyl glycol, e.g. HELOXY modi fier 68, diglycidyl ether of cyclohexanedimethanol, e.g. HELOXY modifier 107, trimethylol ethane triglycidyl ether, e.g. HELOXY modifier 44, trimethylolpropane triglycidyl ether, e.g. HELOXY modifier 48, polyglycidyl ether of aliphatic polyols, e.g. HELOXY modifier 84 (all HELOXY glycidyl ethers are available from Shell). Other suitable glycidyl ethers are those containing copolymers of acrylates, for example styrene glycidyl methacrylate or methyl methacrylate glycidyl acrylate. Examples are 1:1 styrene/glycidyl methacrylate, 1:1 methyl methacrylate/glycidyl acrylate, 62.5:24:13.5 methyl methacrylate/ethyl acrylate/glycidyl methacrylate. The polymers of the glycidyl ether compounds can, for example, also contain other functio nalities, provided they do not impair the cationic cure. Other glycidyl ether compounds suitable as component (a) and commercially available from Ciba Spezialitatenchemie are polyfunctional liquid and solid novolak glycidyl ether resins, for example PY 307, EPN 1179, EPN 1180, EPN 1182 and ECN 9699.
WO 99/56177 PCT/EP99/02511 It is, of course, also possible to use mixtures of different glycidyl ether compounds as com ponent (a). The glycidyl ethers (a) are, for example, compounds of formula II [2C H-Cli-O Rs (II), wherein x is a number from 1 to 6; and
R
5 is a monovalent to hexavalent alkyl or aryl radical. The glycidyl ethers (a) are preferably e.g. compounds of formula II S -- CH-O R (11), wherein x is a number from 1, 2 or 3; and
R
5 , if x = 1, is unsubstituted or C-C 12 alkyl-substituted phenyl, naphthyl, anthracyl, biphenyl yl, C-C 2 0 alkyl, or C 2
-C
20 alkyl which is interrupted by one or more than one oxygen atom, or
R
5 , if x = 2, is 1,3-phenylene, 1,4-phenylene, C 6
-C
1 ocycloalkylene, unsubstituted or halogen substituted C-C4 0 alkylene; C 2
-C
40 alkylene which is interrupted by one or more than one oxygen atom, or a group -a R 6 - a , or C2H
CH
3
R
5 , if x = 3, is a radical -C-C-C- , -C-C-C- , or
H
2 | H 2 H 2 | H 2 C- C
H
2 H2
H
2 CfO-CH 2 -CH(CHj HC4O-CH 2
-CH(CH
3 CfO-CH 2
-CH(CH
3
)]
y 2 y is a number from 1 to 10; and WO 99/56177 PCT/EP99/02511 -6 0 H2C-C-CH H 0
R
6 is C-C 2 0 alkylene, oxygen or The glycidyl ethers (a) are, for example, compounds of formula Ila R -O-C-C 0 CH 2 (Ila), wherein
H
2 H
R
7 is unsubstituted or C-C 1 2 alkyl-substituted phenyl; naphthyl; anthracyl; biphenylyl; Cr-C20 alkyl; C 2
-C
20 alkyl which is interrupted by one or more than one oxygen atom; or a group of 0 formula H 2 C C-CH2-0-RO H
R
5 is phenylene, C-C 20 alkylene; C 2
-C
20 alkylene which is interrupted by one or more than one oxygen atom, or a group / R 6 - / ; and
R
6 is Cr-C 20 alkylene or oxygen. Preferred glycidyl ethers are the compounds of formula lIlb
H
2 C-C-CHi-O-R5O-C-C CH 2 (hlb), wherein H H 2 H
R
5 is phenylene, C-C 2 0 alkylene; C 2
-C
2 0 alkylene which is interrupted by one or more than one oxygen atom, or a group D/ R 6 a ; and
R
6 is C-C 20 alkylene or oxygen. Alkyl radicals are, for example, C-C 20 alkyl, Cr-C18-, C-C12-, C1-C10-, C-08, C-C6- or C
C
4 alkyl. Meanings of these radicals are given above.
C-C
20 Alkylene is linear or branched and is, for example, Cr-C18-, Cr-C16-, C1-C14-, Cr-C12r, C C1O-, CrC-, Cr1C6-, C2C1r2, 02-C-, C4-C- or C-C 4 alkylene. Examples are methylene, ethylene, propylene, isopropylene, n-butylene, sec-butylene, isobutylene, tert-butylene, WO 99/56177 PCTIEP99/02511 -7 pentylene, hexylene, heptylene, octylene, nonylene, decylene, dodecylene, tetradecylene, heptadecylene or octadecylene. Cr 1
C
20 Alkylene is preferably understood to mean e.g. CH 1 3 ethylene, decylene, -CH- , -CH-CH 2 - -C- ,-CH-(CH2)2 C11H23 CH3 CH CH3
O
2
H
5 -CH-(CH2)3- ,-C(CH 3
)
2
-CH
2 - or -CH-C-CH 2 CH 3 CH 3 Halogen is fluoro, chloro and bromo, preferably bromo and chloro, most preferably bromo.
CH
2 Br Halogen-substituted C-C4 0 alkylene is, for example, -CH 2
CH
2 CH2Br
C
2
-C
20 Alkylene which is interrupted by one or more than one oxygen atom is also linear or branched and is interrupted, for example, one to nine times, one to five times or once or twice by non-consecutive oxygen atoms. This gives structures such as -CH 2
-O-CH
2 -,
-CH
2
CH
2
-O-CH
2
CH
2 -, -[CH 2
CH
2 0]y-, where y = 1-9, -(CH 2
CH
2 0) 7
CH
2
CH
2 -, or
-CH
2
-CH(CH
3
)-O-CH
2
-CH(CH
3 )-.
C
6
-C
1 oCycloalkylene is for example 1,4-, 1,3- or 1,6- cyclohexylene, or also -H - or -C2H c2H- , wherein the alkylene radicals are preferably in 1,4-position.
R
5 is preferably a group O / Rg-- / CH
R
6 is preferably C 1
-O
12 alkylene, more preferably -C-- , or oxygen.
CH
3 WO 99/56177 PCT/EP99/02511 -8 Other examples of component (a) are polyglycidyl ether and poly(p-methylglycidyl)ether which are obtainable by reacting a compound containing at least two free alcoholic and/or phenolic hydroxyl groups per molecule with the corresponding epichlorohydrin under alkaline conditions, or also in the presence of an acid catalyst with subsequent treatment with alkali. It is also possible to use mixtures of different polyols. These ethers can be prepared with poly(epichlorohydrin) from acyclic alcohols, such as ethylene glycol, diethylene glycol and higher poly(oxyethylene)glycol, propane-1,2-diol and poly(oxypropylene)glycols, propane-1,3-diol, butane-1,4-diol, poly(oxytetramethylene)glycols, pentane-1,5-diol, hexane-1,6-diol, hexane-2,4,6-triol, glycerol, 1,1,1-trimethylolpropane, pen taerythritol and sorbitol, from cycloaliphatic alcohols, such as resorcitol, quinitol, bis(4-hydro xycyclohexyl)methane, 2,2-bis(4-hydroxycyclohexyl)propane and 1,1 -bis(hydroxymethyl)cyc lohex-3-ene, and from alcohols containing aromatic nuclei, such as N,N-bis(2-hydroxyethyl) aniline and p,p'-bis(2-hydroxyethylamino)diphenylmethane. It is also possible to prepare these ethers from mononuclear phenols, such as resorcinol and hydroquinone, and from polynuclear phenols, such as bis(4-hydroxyphenyl)methane, 4,4-dihydroxydiphenyl, bis(4 hydroxyphenyl)sulfone, 1,1,2,2-tetrakis(4-hydroxyphenyl)ethane, 2,2-bis(4-hydroxyphenyl) propane (bisphenol A) and 2,2-bis(3,5-dibromo-4-hydroxyphenyl)propane. Other suitable hydroxy compounds for the preparation of polyglycidyl ethers and poly(p-me thylglycidyl)ethers are the novolaks obtainable by condensing aldehydes, such as formalde hyde, acetaldehyde, chloral and furfural, and phenols, such as phenol, o-cresol, m-cresol, p cresol, 3,5-dimethylphenol, 4-chlorophenol and 4-tert-butylphenol. Poly(N-glycidyl) compounds can be obtained, for example, by dehydrochlorinating the reac tion products of epichlorohydrin with at least two amines containing active hydrogen bound to amino nitrogen atoms, for example aniline, n-butylamine, bis(4-aminophenyl)methane and bis(4-methylaminophenyl)methane. Other suitable poly(N-glycidyl) compounds are triglycidyl isocyanurate and N,N'-diglycidyl derivatives of cyclic alkylene ureas, such as ethylene urea and 1,3-propylene urea, and hydantoins, for example 5,5-dimethylhydantoin. Poly(S-glycidyl) compounds are also suitable. Examples are the di-S-glycidyl derivatives of dithiols, such as ethane-1,2-dithiol and bis(4-mercaptomethylphenyl)ether. Other suitable components (a) are also epoxy resins in which the glycidyl groups or D-me thylglycidyl groups are bound to different kinds of heteroatoms, e.g. the N,N,O-triglycidyl de- WO 99/56177 PCTIEP99/02511 -9 rivative of 4-aminophenol, the glycidyl ether/glycidyl ester of salicylic acid or p-hydroxyben zoic acid, N-glycidyl-N'-(2-glycidyloxypropyl)-5,5-dimethylhydantoin and 2-glycidyloxy-1,3-bis (5,5-dimethyl-1 -glycidylhydantoinyl-3)propane. The diglycidyl ethers of bisphenols are preferred. Examples thereof are diglycidyl ethers of bisphenol A, such as ARALDIT GY 250, of Ciba Spezialitstenchemie, diglycidyl ether of bis phenol F and diglycidyl ether of bisphenol S. Diglycidyl ether of bisphenol A is particularly preferred. If desired, the composition can also contain a free-radically polymerisable material, in cluding ethylenically unsaturated monomers, oligomers or polymers. Suitable materials contain at least one ethylenically unsaturated double bond, and are capable of undergo ing addition polymerisation. Such free-radically polymerisable materials include mono-, di or polyacrylates and mono-, di- or polymethacrylates such as methylacrylate, methyl methacrylate, ethylacrylate, isopropyl methacrylate, n-hexylacrylate, stearylacrylate, allyl acrylate, glycerol diacrylate, glycerol triacrylate, ethylene glycol diacrylate, diethylene gly col diacrylate, triethylene glycol dimethacrylate, 1,3-propanedioldiacrylate, 1,3-propane diol dimethacrylate, trimethylolpropanetriacrylate, 1,2,4-butanetrioltrimethacrylate, 1,4 cyclohexanedioldiacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, penta erythritol tetramethacrylate, sorbitol hexacrylate, bis[1-(2-acryloxy)]-p-ethoxyphenyldime thylmethane, bis[1 -(3-acryloxy-2-hydroxy)]-p-propoxyphenyldimethylmethane, and tris hydroxyethylisocyanurate trimethacrylate; the bisacrylates and bismethacrylates of poly ethylene glycols having a molecular weight of 200-500, copolymerisable mixtures of acry lated monomers; and vinyl compounds such as styrene, diallyl phthalate, divinyl succi nate, divinyl adipate and divinyl phthalate. Mixtures of two or more of these free-radically polymerisable materials can be used, if desired. If free-radically polymerisable components are added to the novel formulation, then it is useful to also add one, or a mixture of, corresponding radical photoinitiator(s), for example benzophenone and benzophenone derivatives, acetophenone and acetophenone deriva tives, such as a-hydroxycyclohexylphenylketone or 2-hydroxy-2-methyl-1 -phenylprcpanone, a-hydroxy- or a-aminoacetophenone, such as (4-methylthiobenzoyl)-1 -methyl-1 -morpholino ethane, (4-morpholinobenzoyl)-1-benzyl-1-dimethylaminopropane, 4-aroyl-1,3-dioxolanes, benzoinalkyl ether and benzilketal, such as benzildimethylketal, phenylglyoxalate and phe- WO 99/56177 PCT/EP99/02511 - 10 nylglyoxalate derivatives, mono- or bisacylphosphine oxide, such as (2,4,6-trimethylbenzoyl) phenylphosphine oxide, bis(2,6-dimethoxybenzoyl)-(2,4,4-trimethylpent-1-yl)phosphine oxide, bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide or bis(2,4,6-trimethylbenzoyl)-(2,4 dipentoxyphenyl)phosphine oxide. The novel compositions can also contain vinyl ether monomers such as cyclohexanedime thanol divinyl ether or hydroxybutyl vinyl ether. Other additional components may be, for example, hydroxy-functional components such as alcohols, polyester polyols, polyether polyols, castor oil and the like. Examples are aliphatic and cycloaliphatic polyols such as alkylenediols containing preferably 2 to 12 carbon atoms, e.g. ethylene glycol, 1,2- or 1,3-propanediol, 1,2-, 1,3- or 1,4-butanediol, pentanediol, hex anediol, octanediol, dodecanediol, diethylene glycol, triethylene glycol, polyethylene glycols having molecular weights from preferably 200 to 1500, 1,3-cyclopentanediol, 1,2-, 1,3- or 1,4-cyclohexanediol, 1,4-dihydroxymethylcyclohexane, glycerol, tris(p-hydroxyethyl)amine, trimethylolethane, trimethylolpropane, pentaerythritol, dipentaerythritol and sorbitol. The polyols can be partially or completely esterified with one or different unsaturated carboxylic acids, it being possible for the free hydroxyl groups in partial esters to be modified, for exam ple etherified or esterified, with other carboxylic acids. Examples of esters are: trimethylol propanetriacrylate, trimethylolethanetriacrylate, trimethylolpropanetrimethacrylate, trimethyl olethanetrimethacrylate, tetramethylene glycol dimethacrylate, triethylene glycol dimethacry late, tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pen taerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaery thritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, tripenta erythritol octaacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, dipen taerythritol dimethacrylate, dipentaerythritol tetramethacrylate, tripentaerythritol octameth acrylate, pentaerythritol diitaconate, dipentaerythritol trisitaconate, dipentaerythritol penta itaconate, dipentaerythritol hexaitaconate, ethylene glycol diacrylate, 1,3-butanedioldiacry late, 1,3-butanedioldimethacrylate, 1,4-butanedioldiitaconate, sorbitol triacrylate, sorbitol tetraacrylate, pentaerythritol-modified triacrylate, sorbitol tetramethacrylate, sorbitol penta acrylate, sorbitol hexaacrylate, oligoester acrylate and oligoester methacrylate, glycerol di and -triacrylate, 1,4-cyclohexanediacrylate, bisacrylates and bismethacrylates of polyethy lene glycol having a molecular weight of 200 to 1500, or mixtures thereof.
WO 99/56177 PCT/EP99/02511 - 11 Components (a) of particular interest are pure glycidyl ether formulations, i.e. mixtures consisting only of one or several different glycidyl ether compounds. The titanium dioxide pigment (b) can be added to the novel compositions in a very wide range of forms. Thus, it can be incorporated, for example, in the form of fine particles or powders. The particle size is usefully from 100 to 400 nm, but is not restricted to these sizes. The titanium dioxide pigments used are preferably surface-treated, for example with stabili sers, to increase their dispersibility. Such stabiliser components are usually oxides or hydra ted oxides of silicium, magnesium or aluminium, or amines or other organic compounds. Examples thereof are cited in US 4054498. Although the titanium dioxide can be present in different crystalline forms, it is preferred to use the rutile form which is also commercially available. The amount of titanium dioxide component (b) in the polymerisable composition can vary within a wide range, depending on the desired opacity, for example from 5% to 60%, typi cally from 20 % to 55%, preferably from 40 % to 50%, based on the composition. In order to improve the dispersion of the pigment in the formulation to be polymerised, it is possible, for example, to first predisperse the pigment in part of the formulation and then to incorporate this dispersion into the remainder of the formulation. Suitable sensitiser compounds (d) are, for example, compounds from the class of the aro matic hydrocarbons, such as anthracene and its derivatives, from the group of the xanthones and their derivatives, benzophenones and their derivatives, for example Michler's ketone, Mannich bases or bis(p-N,N-dimethylaminobenzylidene)acetone. Other suitable compounds are thioxanthone and its derivatives, such as isopropylthioxanthone, or dyes, such as acri dines, triarylmethanes, e.g. malachite green, indolines, thiazines, e.g. methylene blue, oxazines, phenazines, e.g. safranin, or rhodamines. Particularly suitable compounds are aromatic carbonyl compounds, such as the benzophenone, thioxanthone, anthraquinone and 3-acylcoumarine derivatives, and also 3-(aroylmethylene)thiazolines, as well as eosine, rhodamine and erythrosine dyes. The sensitiser compound should be soluble in the photopolymerisable composition and should be free of functional groups which crucially influence the cationic crosslinking pro cess. The light absorption of the compounds should furthermore be in the range of about 300 to 1000 nm.
WO 99/56177 PCT/EP99/02511 - 12 Suitable sensitisers are (as mentioned above to some extent) compounds of the following classes: ketones, coumarines (e.g. ketocoumarine), xanthones, acridines, thiazole dyes, thiazine dyes, oxazine dyes, azine dyes, aminoketone dyes, porphyrines, aromatic polycyclic hydrogens, p-substituted aminostyryl ketone compounds, aminotriarylmethanes, merocya nines, squarylium dyes and pyridinium dyes. Preferred compounds are ketones (e.g. mono ketone or a-diketone), ketocoumarines, aminoarylketones and p-substituted aminostyryl ketone compounds. For applications requiring a deep cure (e.g. curing of highly filled com posite materials), it is preferred to use sensitisers having an extinction coefficient of less than about 1000 Imolrcm 1 , preferably of less than about 100 Imolocm", at the desired radiation wavelength for the photopolymerisation. The a-diketones are one example of a class of sensitisers possessing these properties. Suitable ketone sensitisers are, for example, those of formula IV O || A-C-(X)TZ (IV), wherein X is CO or CRaRb, Ra and Rb are each independently of the other hydrogen, alkyl, alkaryl, or aralkyl; b is 1 or 2; and A and Z are each independently of the other aryl, alkyl, alkaryl or aralkyl, which groups are unsubstituted or substituted, or A and Z together form a ring which is substituted or unsub stituted, cycloaliphatic, aromatic or heteroaromatic. Suitable ketones of this formula are, for example, monoketones (b=0) such as 2,2-, 4,4- or 2,4-dihydroxybenzophenone, dipyridylketone, difuranylketone, dithiophenylketone, benzoin, fluorenone, chalcone, Michler's ketone, thioxanthone, isopropylthioxanthone, 2-fluoro-9 fluorenone, 2-chlorothioxanthone, acetophenone, benzophenone, 1- or 2-acetonaphthone, 9-acetylanthracene, 2-, 3- or 9-acetylphenanthrene, 4-acetylbiphenyl, propiophenone, n-butyrophenone, valerophenone, 2-, 3- or 4-acetylpyridine, 3-acetylcoumarine and the like. Suitable diketones include aralkyldiketones such as anthraquinone, phenanthrenequinone, o-, m- and p-diacetylbenzene, 1,3-, 1,4-, 1,5-, 1,6-, 1,7- and 1,8-diacetylnaphthalene, 1,5-, 1,8- and 9,10-diacetylanthracene and the like. Suitable diketones (b=1 and X=CO) include 2,3-butanedione, 2,3-pentanedione, 2,3-hexanedione, 3,4-hexanedione, 2,3-heptanedione, 3,4-heptanedione, 2,3-octanedione, 4,5-octanedione, benzile, 2,2'-, 3,3'- and 4,4'-dihydroxy benzile, furile, di-3,3'-indolylethanedione, 2,3-bornanedione (camphorquinone), biacetyl, 1,2-cyclohexanedione, 1,2-naphthaquinone, acenaphthaquinone and the like.
WO 99/56177 PCT/EP99/02511 -13 Preferred sensitisers are those of the group of the anthracenes, xanthones, benzophenones and thioxanthones, also including the derivatives of these compounds. Thioxanthones are particularly preferred, in particular isopropylthioxanthone. The sensitiser compound (d) is usefully added to the novel compositions in an amount from 0.1%-3%, e.g. from 0.2%-1.5%, preferably from 0.4%-1.0%. The novel composition conveniently comprises 40-70% of the glycidyl ether component (a), 20-60% of the titanium dioxide (b), 0.5-10% of the photoinitiator (c) and 0.1-3% of the sensi tiser compound (d). Other additives may be added to the novel compositions besides components (a), (b), (c) and (d). Examples thereof are light stabilisers, for example UV absorbers such as those of the hydroxyphenylbenztriazole, hydroxyphenylbenzophenone, oxalic acid amide or hydroxy phenyl-s-triazine type. These compounds can be used separately or as mixtures, with or without addition of sterically hindered amines (HALS). The novel compositions can contain as additional additive, inter alia, an electron-donor com pound. Examples of such compounds are described in US 5545676. Examples are alkyl aromatic polyethers or alkyl-aryl-amino compounds, wherein the aryl group is substituted by one or several electron-attracting group(s). Examples thereof are 4-dimethylaminobenzoic acid, ethyl 4-dimethylaminobenzoate, 3-dimethylaminobenzoic acid, 4-dimethylaminoben zoin, 4-dimethylaminobenzaldehyde, 4-dimethylaminobenzonitrile and 1,2,4-trimethoxyben zene. Other customary additives are - depending on the end use requirements - fluorescent whitening agents, fillers, dyes, wetting agents or flow control agents. The novel compositions may contain as further additives dispersants, emulsifiers, antioxidants, light stabilisers, dyes, pigments, fillers, e.g. talcum, gypsum, silicic acid, rutile, carbon black, zinc oxide, iron oxides, reaction accelerators, flow control agents, wetting agents, thickeners, flatting agents, antifoams, antioxidants and other auxiliaries customarily used in the paint system technolo gy. Suitable dispersants are, for example, high molecular weight organic compounds con taining polar groups, such as polyvinyl alcohols, polyvinyl pyrrolidone or cellulose ether. Suitable emulsifiers are non-ionic or ionic emulsifiers.
WO 99/56177 PCT/EP99/02511 - 14 The choice of the additives depends on the respective field of applications and on the pro perties desired in this field. The additives are standard in the technology and are thus used in amounts known to the skilled person. The novel compositions can be used in different fields, for example in coating materials, laminating adhesives, in printing inks, white enamel formulations, for example for wood or metal, or in paints used, inter alia, for paper, wood, metal or plastic materials. The compositions of this invention can be used to coat or bond substrates of all kinds, for example wood, textiles, paper, ceramics, glass, plastic materials, such as polyester, poly ethylene terephthalate, polyolefins or cellulose acetate, in particular in the form of films, and metals such as Al, Cu, Ni, Fe, Zn, Mg or Co and GaAs, Si or Si0 2 to which a protective coating is to be applied. The substrates can be coated by applying a liquid composition, a solution or suspension to the substrate. The choice of solvent used and its concentration depends mainly on the type of composition and on the coating process used. The solvent should be inert, i.e. it should not chemically react with the components and should be removable during drying after coating. Suitable solvents are, for example, ketones, ethers and esters, such as methyl ethyl ketone, isobutyl methyl ketone, cyclopentanone, cyclohexanone, N-methylpyrrolidone, di oxane, tetrahydrofuran, 2-methoxyethanol, 2-ethoxyethanol, 1-methoxy-2-propanol, 1,2-di methoxyethane, ethyl acetate, n-butyl acetate and ethyl 3-ethoxypropionate. The formulation is uniformly applied to a substrate by known coating processes, for example centrifuging, dipping, knife application, curtain coating, brush application, screen printing, spraying, especially by electrostatic spraying and reverse roll coating. The coating thickness and type of substrate depend on the desired field of application, The coating thickness is generally within the range from about 0.1 gm to higher than 100 lm, e.g. from 1 gm to 30 gm, preferably from 4 pm to 20 gm. An other field in which the novel composition may be used is metal coating, for example coating metal sheets and tubes, tins or bottle caps. The metals to be coated can be uncoat ed or precoated. Suitable substrates are especially metals, such as aluminium or tinplate.
WO 99/56177 PCT/EP99/02511 - 15 The novel white compositions are distinguished by having very good resistance to yellowing. Another advantage is that the heavy metal anions normally used in the technology, for exam ple SbF 6 anions, are not present in these compounds. The novel formulations are cured by irradiation with light in the wavelength of 200-600 nm. Where necessary, the formulation can be subjected to a heat treatment after irradiation. The thermal aftertreatment is conveniently carried out in the temperature range from 50-250*C, e.g. from 100-220*C, preferably from 150-21 0*C. Accordingly, this invention also relates to a process for the polymerisation of compositions described above, which comprises irradiating the composition with light in the wavelength of 200-600 nm, and to a corresponding process in which the irradiation is followed by a heat treatment. The UV irradiation for curing the novel formulation is usually carried out using light in the wavelength from 200-600 nm. Suitable radiation comprises, for example, sunlight or light from artificial light sources. A large number of widely different types of light sources can be used, including point sources and arrays of reflector lamps. Examples are: carbon arc lamps, xenon arc lamps, mercury medium, high and low pressure lamps which are doped, where required, with metal halides (metal halogen lamps), microwave-excited metal vapour lamps, excimer lamps, superactinic fluorescent tubes, fluorescent lamps, argon glow lamps, flash lamps, photographic floodlights, electron beams and X-rays. Examples of suitable lamps are fusion lamps, such as fusion H (main emissions: mercury medium pressure spec trum), fusion D (main emissions: 350-450 nm), fusion V (main emissions: 400-450 nm) or fusion M (main emissions: 360-370 nm and 400-410 nm). The distance between lamp and substrate to be irradiated can vary depending on the purpose of application and type or strength of lamp, for example from 2 cm to 150 cm. Other suitable lamps are laser light sources, for example excimer laser. It is also possible to use lasers in the visible range. Irradiation using fusion lamps, e.g. fusion H, fusion D, fusion V or fusion M, is particularly interesting. This invention also relates to the use of the above compositions and to a process for the preparation of coatings, paints, printing inks, powder coatings, laminating adhesives, dental compositions, in particular white enamel formulations.
WO 99/56177 PCT/EP99/02511 - 16 In another of its aspects, this invention relates to a coated substrate which is coated on at least one surface with one of the above compositions, and to a coated substrate to which the novel composition is applied at a coating thickness of at least 0.1-100 Rm, e.g. 1-30 tm, preferably 4-15 Rm. The following Examples illustrate the invention in more detail. As in the remainder of the description and in the patent claims, parts and percentages are by weight, unless otherwise stated. If alkyl radicals or alkoxy radicals containing more than three carbon atoms are given without their isomeric form, then they refer to the respective n-isomers. Example 1: Preparation of p-isobutylphenylphenyl iodonium hexafluorophosphate A 1.5 I flask, equipped with reflux condenser, thermometer, stirrer and nitrogen inlet, is charged with 400 g (1.24 mol) of (diacetoxyiodo)benzene in 800 ml of acetic acid and, after heating to 400C, 365.6 g (1.92 mol) of p-toluenesulfonic acid are added in portions over 3 h. The reaction mixture is stirred overnight at 40"C, cooled to room temperature and filtered. The filter cake is washed with water and dried at 600C under high vacuum, giving 372.4 g of hydroxy(tosyloxy)iodobenzene. In a 750 ml flask, equipped with reflux condenser, thermometer, stirrer and nitrogen inlet, 157 g (0.4 mol) of hydroxy(tosyloxy)iodobenzene and 67.15 g (0.5 mol) of isobutylbenzene are heated in a mixture of 12 ml of acetic acid and 40 ml of acetonitrile for 48 hours to 850C. After cooling the reaction mixture to room temperature, 500 ml of water are added and the mixture is extracted with dichloromethane. After drying the organic phases with magnesium sulfate and filtration, the solvent is removed under vacuum. A solid is precipitated by treat ment with hexane. Filtration gives 131.2 g of 4-isobutylphenylphenyl iodonium tosylate as a beige solid. In a 750 ml flask, equipped with reflux condenser, thermometer, stirrer and nitrogen inlet, 40.7 g (80 mmol) of 4-isobutylphenylphenyl iodonium tosylate and 29.5 g (160 mmol) of potassium hexafluorophosphate in 500 ml of acetone are refluxed overnight. The cooled suspension is filtered and the filtrate is concentrated under vacuum. 200 ml of dichloro methane are added and the solution is washed with water. After drying over magnesium sulfate and filtration, the solvent is stripped off under vacuum, giving 36.5 g of p-isobutyl phenylphenyl iodonium hexafluorophosphate in the form of a colourless oil. The 1 H-NMR spectrum (measured in dimethylsulfoxide-d 6 ) exhibits displacement signals at the following WO 99/56177 PCT/EP99/02511 - 17 values [ppm]: 8.22 (4H, m, ArH), 7.64 (1H, m, ArH), 7.53 (2H, m, ArH), 7.34 (2H, m, ArH), 2.47 (2H, m, 2 CH 2 ), 1.82 (1H, m, CH(CH 3
)
2 ), 0.82 (6H, d, J=6.2 Hz, 2 CH 3 ). Elemental analysis C1 6
H
18
F
6 1P: calculated C 39.86% H 3.76% F 23.64% I 26.32% P 6.42% found C 40.14% H 3.89% F 23.63% 1 26.20% P 6.28% The compounds of the following Examples 2-6 are prepared in analogy to the method of Example 1 from the corresponding substituted aromatic compounds. Example 2: (4-Hexylphenyl)phenyl iodonium hexafluorophosphate Prepared from hexylbenzene. The title product is obtained as a brown oil. 'H-NMR measured in CD 3 CN [ppm]: 8.02 (4H, m, ArH), 7.71 (1H, m, ArH), 7.53 (2H, m, ArH), 7.36 (m, 2H, ArH), 2.65 (2H,t, J=7.7 Hz, ArCH 2 ), 1.55 (2H, m, CH 2 ), 1.28 (6H, m, (CH 2
)
3 ), 0.85 (3H,t, J= 6.5Hz,
CH
3 ). According to 'H-NMR, the product contains about 8% of the 2-hexyl isomeric product. Example 3: (4-Octylphenyl)phenyl iodonium hexafluorophosphate Prepared from octylbenzene. The title product is obtained as a reddish oil. 'H-NMR measured in CD 3 CN [ppm]: 8.0 (4H, m, ArH), 7.70 (1H, m, ArH), 7.52 (2H, m, ArH), 7.36 (m, 2H, ArH), 2.65 (2H, t, J=7.7 Hz, ArCH 2 ), 1.57 (2H, m, CH 2 ), 1.25 (10H, m, (CH 2
)
5 ), 0.85 (3H, t, J= 6.5Hz, CH 3 ). According to 'H-NMR, the product contains about 8% of the 2-octyl isomeric product. Example 4: (2,4-Dimethoxyphenyl)phenyl iodonium hexafluorophosphate Prepared from 1,3-dimethoxybenzene. The title product is a solid having a melting point from 129-130*C. 'H-NMR measured in DMSO-d 6 [ppm]: 8.19 (1H, d, J=8.8Hz H 6 ), 8.07 (2H, m,
H
2
.
6 .), 7.63 (1 H, m, H 4 ), 7.49 (2H, m, H 3
'
5 ), 6.80 (1 H, m, H 3 ), 6.69 (1 H, dd, J=8.8 and 2.1Hz,
H
5 ), 3.94 (3H, s, OCH 3 ), 3.83 (3H, s, OCH 3 ). Example 5: (2,4-Diethoxyphenyl)phenyl iodonium hexafluorophosphate Prepared from 1,3-diethoxybenzene. The title product is a solid having a melting point of 1580C. 'H-NMR measured in DMSO-d 6 [ppm]: 8.17 (1H, d, J=8.8Hz H 6 ), 8.05 (2H, m, H 2
-
6 .), 7.64 (1H, m, H 4 ), 7.50 (2H, m, H 3
.
5 ), 6.75 (1H, m, H 3 ), 6.66 (1H,dd, J=8.8 and 2.5Hz, H 5 ), 4.14 (4H, m, 20CH 2 ), 1.33 (6H, m, 2CH 3
).
WO 99/56177 PCT/EP99/02511 - 18 Example 6: (2,4-Diisopropoxyphenyl)phenyl iodonium hexafluorophosphate Prepared from 1,3-diisopropoxybenzene. The title product is a solid having a melting point of 1250C. 'H-NMR measured in DMSO-d 6 [ppm]: 8.15 (1H, d, J=8.8Hz H 6 ), 8.03 (2H, m, H 2
'
6 '), 7.63 (1H, m, H 4 ), 7.50 (2H, m, H 3 -), 6.73 (1H, m, H 3 ), 6.66 (1H, dd, J=8.8 and 2.2Hz, H 5 ), 4.78 (2H, m, 20CH), 1.23 (12H, m, 4CH 3 ). Example 7: Preparation of bis(p-isobutylphenyl)iodonium hexafluorophosphate In a 6 I flask, equipped with reflux condenser, thermometer, stirrer and nitrogen inlet, 211.2 g (1.57 mol) of isobutylbenzene and 140.3 g (0.65 mol) of potassium iodate are cooled to 00C in a mixture of 1850 ml of acetic acid and 525 ml of acetic anhydride. A mixture consisting of 385 ml of acetic acid and 310 ml of sulfuric acid is added dropwise. The mixture is stirred overnight at room temperature and 39.15 g of sodium bisulfate in 2000 ml of water are add ed. The solution is extracted with hexane and dichloromethane. The organic phases are dried over magnesium sulfate and filtered and the solvent is stripped off under vacuum, giving 304.9 g of bis(4-isobutylphenyl)iodonium bisulfate in the form of a brown oil. In a 1.5 I flask, equipped with reflux condenser, thermometer, stirrer and nitrogen inlet, a mixture consisting of 152.4 g (0.31 mol) of bis(4-isobutylphenyl)iodonium bisulfate and 68.7 g (0.37 mol) of potassium hexafluorophosphate and 750 ml of water is stirred for 5 h. The solution is extracted with dichloromethane and the organic phases are then washed with water. Drying over magnesium sulfate, filtration and removal of the solvent by evaporation gives 107.4 g of bis(4-isobutylphenyl)iodonium hexafluorophosphate in the form of a brown resin. The 'H-NMR spectrum (measured in CDC1 3 ) exhibits displacement signals at the following values [ppm]: 7.85 (4H, m, ArH), 7.20 (4H, m, ArH), 2.42 (4H, d, J=7.2 Hz, 2 CH 2 ), 1.79 (2H, m, 2 CH(CH 3
)
2 ), 0.82 (12H, d, J=6.6 Hz, 4 CH 3 ). The compounds of the following Examples 8-13 are prepared in analogy to the methods of Example 7 from the corresponding substituted aromatic compounds. Example 8: Bis(4-butylphenyl)iodonium hexafluorophosphate Prepared from n-butylbenzene. The title product is an orange resin. 'H-NMR measured in
CD
3 CN [ppm]: 7.95 (4H, m, ArH), 7.35 (4H, m, ArH), 2.65 (4H,t, J=7.7 Hz, 2CH 2 ), 1.54 (4H, m, 2CH 2 ), 1.30 (4H, m, 2 CH 2 ), 0.89 (6H, t, J=7.2 Hz, 2CH 3
).
WO 99/56177 PCT/EP99/02511 -19 Example 9: Bis(4-hexyl-phenyl)iodonium hexafluorophosphate This is a resin prepared from hexylbenzene. 1 H-NMR measured in CD 3 CN [ppm]: 7.94 (4H, m, ArH), 7.34 (4H, m, ArH), 2.64 (4H, t, J=7.7 Hz, 2CH 2 ), 1.56 (4H, m, 2CH 2 ), 1.27 (12H, m, 6CH 2 ), 0.85 (6H, t, J=6.5 Hz, 2CH 3 ). Example 10: Bis(4-octylphenyl)iodonium hexafluorophosphate This is a resin prepared from octylbenzene. 1 H-NMR measured in CD 3 CN [ppm]: 7.95 (4H, m, ArH), 7.34 (4H, m, ArH), 2.64 (4H, t, J=7.7 Hz, 2CH 2 ), 1.56 (4H, m, 2CH 2 ), 1.26 (20H, m, 10CH 2 ), 0.85 (6H, t, J=6.6 Hz, 2CH 3 ). Example 11: Bis(4-isopropylphenyl)iodonium hexafluorophosphate Prepared from 4-isopropylphenol. 'H-NMR signals measured in DMSO-d 6 [ppm]: 8.14 (4H, m, ArH), 7.40 (4H, m, ArH), 2.92 (2H, sept, J=6.9Hz, 2CH), 1.16 (12H, d, J=6.9Hz, 4CH 3 ). Example 12: Bis[4(1,1 -dimethylprop-1 -yl)phenyl]iodonium hexafluorophosphate Prepared from 4(1,1-dimethylprop-1-yl)phenol. 'H-NMR signals measured in DMSO-d 6 [ppm]: 8.14 (4H, m, ArH), 7.48 (4H, m, ArH), 1.61 (4H, m, 2CH 2 ), 1.21 (12H, s, 4CH 3 ), 0.56 (6H, m, 2CH 3 ). Example 13: Bis(4-C 3
-C
14 alkylphenyl)iodonium hexafluorophosphate Prepared from a mixture of phenols substituted in 4-position by C 8
-C
14 alkyl. 1 H-NMR signals measured in CDC1 3 [ppm]: 7.88 (4H, m, ArH), 7.30 (4H, m, ArH), 2.80-2.35 (=2H, m), 1.75 1.35 (=12H, m), 1.35-0.65 (=30H, m). Example 14: Preparation of p-butoxyphenylphenyl iodonium hexafluorophosphate A 350 ml flask, equipped with reflux condenser, thermometer, stirrer and argon inlet, is charged with 100 g (0.31 mol) of diacetoxyiodobenzene in 200 ml of acetic acid, to which, after heating to 400C, 45.8 g (0.48 mol) of p-toluenesulfonic acid are added in portions over 3h. The reaction solution is stirred overnight at 40*C, cooled to room temperature and fil tered. The filter cake is washed with water and dried at 600C under vacuum, giving 71.2 g of hydroxy(tosyloxy)iodobenzene. In a 200 ml flask, equipped with reflux condenser, thermometer, stirrer and argon inlet, 14.1 g (0.036 mol) of hydroxy(tosyloxy)iodobenzene and 5.1 g (0.034 mol) of 4-butoxyben zene are heated for 2h to 400C in a mixture consisting of 5 ml of acetonitrile and 2 ml of WO 99/56177 PCT/EP99/02511 - 20 acetic acid. After cooling the reaction mixture to room temperature, 100 ml of water are added and the mixture is extracted with methylene chloride. The organic phases are dried over magnesium sulfate, filtered and concentrated in a rotary evaporator. A solid is preci pitated by treatment with hexane. Filtration gives 17.0 g of p-butoxyphenylphenyl iodonium tosylate in the form of a beige solid having a melting point of 169-171 C. In a 200 ml flask, equipped with reflux condenser, thermometer, stirrer and argon inlet, 17.0 g (0.032 mol) of butoxyphenylphenyl iodonium tosylate and 6.6 g (0.036 mol) of po tassium hexafluorophosphate are stirred overnight in 50 ml of acetone at room temperature. The resulting suspension is filtered and the filtrate is concentrated in a rotary evaporator. 50 ml of methylene chloride are added and the solution is washed with water. After drying over magnesium sulfate and filtration, the solvent is stripped off under vacuum. A solid is precipitated by treatment with hexane. Filtration gives 15.0 g of p-butoxyphenylphenyl iodo nium hexafluorophosphate in the form of a beige solid having a melting point of 101-1030C. Elemental analysis: calculated C 38.56% H 3.64% F 22.88% P 6.22% J 25.47% found C 39.84% H 3.72% F 21.61% P 6.18% J 25.32% Examples 15-16: The compounds of Examples 15-16 are prepared in analogy to the method of Example 14, using the corresponding educts. The compounds and their physical data are listed in the following Table 1. Table 1: O-R PF ~ Example R Melting point Elemental analysis [%] calculated found C: 38.56 39.84 H: 03.64 03.72 15 2-methylpropyl resin F: 22.88 21.61 P: 06.22 06.18 1: 25.47 25.32 C: 47.23 48.60 H: 05.70 05.61 16 dodecyl 87 - 89 0C F: 17.04 18.67 P: 04.82 05.07 1: 20.71 20.79 WO 99/56177 PCT/EP99/02511 - 21 Example 17: A white enamel formulation is prepared by mixing the following components: 35.3 % of diglycidyl ether of bisphenol A (ARALDIT GY 250, Ciba Spezialititenchemie, Switzerland), 14.1 % of trimethylolpropane triglycidyl ether, 9.4 % of C 1 2 14 alkyl glycidyl ether, 39.2 % of rutile titanium dioxide (R-TC2, Tioxide, UK), 1.5 % of p-isobutylphenylphenyl iodonium hexafluorophosphate (see Example 1), 0.5 % of isopropylthioxanthone. The mixture is heated to 600C and shaken for 6 minutes. After heating it once more to 600C and shaking it for another 6 minutes, it is stirred for 30 minutes at 600C. The formulation is applied to a 300 I±m aluminium sheet using a 12 Itm spiral applicator. Irradiation is carried out using a UV processor under two 80 W/cm mercury medium pressure lamps. The highest belt speed is determined at which the sample is cured with the surface still remaining tack free. The higher the belt speed, the more reactive the formulation. Moreover, immediately after irradiation and also after subjecting the sample to a final heat treatment for 5 minutes at 1800C in a circulating air oven, the yellowing of the coating is determined via the Yellowness Index (YI) in accordance with ASTMD-1 925-70. The lower the YI value, the less yellowing of the coating. This formulation is cured tack-free at a belt speed of 12.5 m/min. Immediately after irradia tion, the measured YI value is -2.5, and after the subsequent heat treatment it is -3.4. Example 18 A white enamel formulation is prepared by mixing the following components: 17.0 parts of diglycidyl ether of bisphenol A (ARALDIT GY 250, of Ciba Spezialitatenchemie, Switzerland), 17.0 parts of trimethylolpropane triglycidyl ether, 13.0 parts of C 1 2 14 alkyl glycidyl ether, 50.0 parts of rutile titanium dioxide (R-TC2, Tioxide, UK), 2.0 parts of p-isobutylphenylphenyl iodonium hexafluorophosphate (see Example 1), 1.0 parts of isopropylthioxanthone 2.0 parts of dispersant (Disperbyk 110; Byk Chemie, Germany) 0.5 parts of wax (polyfluo 540).
WO 99/56177 PCT/EP99/02511 - 22 The mixture is heated to 600C and shaken for 6 minutes. After heating it once more to 600C and shaking it for another 6 minutes, it is stirred for 30 minutes at 600C. The formulation is applied to 300 pam aluminium sheets using a 12 [tm spiral applicator. Irradiation is carried out using a UV processor under a 120W/cm microwave-excited M-Fusion lamp (of Fusion UV Systems) by passing the sample to be cured on a belt under the lamps. The highest belt speed is determined at which the sample is cured with the surface still remaining tack-free. At a belt speed of 10 m/min, the sample is cured with a tack-free surface.

Claims (14)

1. A UV-curable, cationically polymerisable composition, which comprises (a) mono-, bis- or higher aliphatic or aromatic glycidyl ethers, (b) titanium dioxide, (c) at least one iodonium hexafluorophosphate salt as photoinitiator, and (d) a sensitiser compound.
2. A composition according to claim 1, wherein the photoinitiator (c) is a compound of formula I R, R 4 1 R 2 PF 6 (1), wherein R 3 R 1 , R 2 , R 3 and R 4 are each independently of one another hydrogen, C-C 2 oalkyl or unsub stituted or hydroxyl-substituted C-C 20 alkoxy, with the proviso that at least one of R 1 , R 2 , R 3 or R 4 is not hydrogen.
3. A composition according to claim 2, wherein in the compound of formula R 2 is C-C 12 alkyl, in particular isobutyl or dodecyl, and R 1 , R 3 and R 4 are hydrogen.
4. A composition according to claim 1, wherein the sensitiser compound (d) is a compound selected from the group consisting of anthracenes, xanthones, benzophenones and thiox anthones.
5. A composition according to claim 4, wherein the sensitiser compound (d) is a thioxan thone derivative.
6. A composition according to claim 1, wherein the glycidyl ether (a) is a compound of formula II 0 H 2 C--C--CH-O R 5 (II), wherein H WO 99/56177 PCT/EP99/02511 - 24 x is a number from 1 to 6; and Rs is a mono- to hexavalent alkyl or aryl radical.
7. A composition according to claim 1, wherein the proportion of the component (a) is 40 70%, that of the titanium dioxide (b) is 20-60%, that of the photoinitiator (c) is 0.5-10% and that of the sensitiser compound (d) is 0.1-3%.
8. The (4-isobutylphenyl)phenyl iodonium hexafluorophosphate compound, optionally in combination with propylenecarbonate.
9. A coated substrate which is coated on at least one surface with a composition according to claim 1.
10. A coated substrate according to claim 9, to which the composition according to claim 1 is applied at a coating thickness of 0.1-100 gm.
11. A process for the photopolymerisation of a composition according to claim 1, which comprises irradiating the composition with light in the wavelength of 200-600 nm.
12. A process according to claim 11, wherein a heat treatment is carried out after the irradiation.
13. A process according to claim 11 for the preparation of coatings, paints, printing inks, powder coatings, laminating adhesives or dental compositions, in particular of white enamel formulations.
14. Use of a composition according to claim 1 for the preparation of coatings, paints, print ing inks, powder coatings, laminating adhesives or dental compositions, in particular of white enamel formulations.
AU37077/99A 1998-04-24 1999-04-14 Heavy metal-free coating formulations Ceased AU758652B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98810361 1998-04-24
EP98810361 1998-04-24
PCT/EP1999/002511 WO1999056177A1 (en) 1998-04-24 1999-04-14 Heavy metal-free coating formulations

Publications (2)

Publication Number Publication Date
AU3707799A true AU3707799A (en) 1999-11-16
AU758652B2 AU758652B2 (en) 2003-03-27

Family

ID=8236052

Family Applications (1)

Application Number Title Priority Date Filing Date
AU37077/99A Ceased AU758652B2 (en) 1998-04-24 1999-04-14 Heavy metal-free coating formulations

Country Status (8)

Country Link
EP (1) EP1084456A1 (en)
JP (1) JP2002513078A (en)
KR (1) KR20010042957A (en)
AU (1) AU758652B2 (en)
BR (1) BR9909890A (en)
CA (1) CA2329012A1 (en)
RU (1) RU2219571C2 (en)
WO (1) WO1999056177A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19961347A1 (en) * 1999-12-17 2001-06-21 S & C Polymer Silicon & Compos Photoinitiator system with acylphosphine oxide initiators
DE19961355A1 (en) 1999-12-17 2001-06-21 S & C Polymer Silicon & Compos Photoinitiator system with titanocene initiators
GB0516515D0 (en) * 2005-08-11 2005-09-21 Sun Chemical Bv A jet ink and ink jet printing process
WO2010128649A1 (en) * 2009-05-08 2010-11-11 株式会社日本触媒 Diaryl iodonium salt mixture and process for production thereof, and process for production of diaryl iodonium compound
JP5485583B2 (en) * 2009-05-08 2014-05-07 株式会社日本触媒 Method for producing diaryliodonium compound
CN104497277A (en) * 2014-11-26 2015-04-08 南京凯泰化工科技有限公司 Free-radical photoinitiator and preparation method thereof
RU2646003C2 (en) * 2017-06-06 2018-03-01 Федеральное государственное бюджетное образовательное учреждение высшего образования "Волгоградский государственный технический университет" (ВолгГТУ) Photopolymerisable composition for accelerated formation of protective coatings

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4399071A (en) * 1982-03-12 1983-08-16 General Electric Company Method for making diaryliodonium salts
DE4002682A1 (en) * 1990-01-31 1991-08-01 Herberts Gmbh METHOD FOR COATING SUBSTRATES WITH UV-RADIATING COATING AGENTS
TW460509B (en) * 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations

Also Published As

Publication number Publication date
EP1084456A1 (en) 2001-03-21
JP2002513078A (en) 2002-05-08
KR20010042957A (en) 2001-05-25
BR9909890A (en) 2000-12-26
AU758652B2 (en) 2003-03-27
WO1999056177A1 (en) 1999-11-04
RU2219571C2 (en) 2003-12-20
CA2329012A1 (en) 1999-11-04

Similar Documents

Publication Publication Date Title
US6906113B2 (en) Surface-active photoinitiators
US7279200B2 (en) Process for producing coatings using surface-active photoinitiators
KR100363978B1 (en) Alkoxyphenyl-substituted bisacylphosphine oxides
JPH06322012A (en) Photocurable colored composition
JP4021767B2 (en) Surfactant photoinitiator
US20040033317A1 (en) Surface-active photoinitators
EP1072326A2 (en) Surface active photoinitiator
US5723512A (en) Dimeric bisacylphosphines, oxides and sulfides
CA2430705A1 (en) Surface-active photoinitiators
AU758652B2 (en) Heavy metal-free coating formulations
US7105582B2 (en) Surface-active siloxane photoinitiators
US5391749A (en) Substituted naphthacene-5,12-diones and their use
MXPA00010390A (en) Heavy metal-free coating formulations
CZ20003907A3 (en) Coating formulations free of heavy metals
AU775747B2 (en) Surface-active photoinitiators
KR20000047902A (en) Photoinitiator combinations

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase
TH Corrigenda

Free format text: IN VOL 14, NO 13, PAGE(S) 2269-2273 UNDER THE HEADING APPLICATIONS LAPSED, REFUSED OR WITHDRAWN PLEASE DELETE ALL REFERENCE TO APPLICATION NO. 37077/99

FGA Letters patent sealed or granted (standard patent)