AU2986999A - Ion assisted electron beam deposition of ring laser gyro mirrors - Google Patents

Ion assisted electron beam deposition of ring laser gyro mirrors

Info

Publication number
AU2986999A
AU2986999A AU29869/99A AU2986999A AU2986999A AU 2986999 A AU2986999 A AU 2986999A AU 29869/99 A AU29869/99 A AU 29869/99A AU 2986999 A AU2986999 A AU 2986999A AU 2986999 A AU2986999 A AU 2986999A
Authority
AU
Australia
Prior art keywords
electron beam
beam deposition
ring laser
laser gyro
ion assisted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU29869/99A
Inventor
Randy J. Ramberg
David W. Sisson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell Inc
Original Assignee
Honeywell Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell Inc filed Critical Honeywell Inc
Publication of AU2986999A publication Critical patent/AU2986999A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/58—Turn-sensitive devices without moving masses
    • G01C19/64—Gyrometers using the Sagnac effect, i.e. rotation-induced shifts between counter-rotating electromagnetic beams
    • G01C19/66—Ring laser gyrometers
    • G01C19/661—Ring laser gyrometers details
AU29869/99A 1998-03-13 1999-03-05 Ion assisted electron beam deposition of ring laser gyro mirrors Abandoned AU2986999A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3912298A 1998-03-13 1998-03-13
US09039122 1998-03-13
PCT/US1999/004939 WO1999046421A1 (en) 1998-03-13 1999-03-05 Ion assisted electron beam deposition of ring laser gyro mirrors

Publications (1)

Publication Number Publication Date
AU2986999A true AU2986999A (en) 1999-09-27

Family

ID=21903804

Family Applications (1)

Application Number Title Priority Date Filing Date
AU29869/99A Abandoned AU2986999A (en) 1998-03-13 1999-03-05 Ion assisted electron beam deposition of ring laser gyro mirrors

Country Status (2)

Country Link
AU (1) AU2986999A (en)
WO (1) WO1999046421A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003266011A (en) 2001-09-17 2003-09-24 Cark Zeiss Smt Ag Coating method for base plate for optical member and coating device
US7465681B2 (en) 2006-08-25 2008-12-16 Corning Incorporated Method for producing smooth, dense optical films
US20220364221A1 (en) * 2019-10-24 2022-11-17 Soon Young Kwon Method for forming coating layer having plasma resistance

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5753319A (en) * 1995-03-08 1998-05-19 Corion Corporation Method for ion plating deposition
JPH08254612A (en) * 1995-03-15 1996-10-01 Canon Inc Multilayer film optical component and manufacture thereof
AU5483196A (en) * 1995-04-14 1996-10-30 Spectra-Physics Lasers, Inc. Method for producing dielectric coatings
US5518548A (en) * 1995-08-03 1996-05-21 Honeywell Inc. Deposition barrier
JPH09318808A (en) * 1996-05-29 1997-12-12 Toppan Printing Co Ltd Production of color filter
JPH10115711A (en) * 1996-10-09 1998-05-06 Nikon Corp Production of optical thin film

Also Published As

Publication number Publication date
WO1999046421A1 (en) 1999-09-16

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase