AU2459299A - Fluorine control system with fluorine monitor - Google Patents

Fluorine control system with fluorine monitor

Info

Publication number
AU2459299A
AU2459299A AU24592/99A AU2459299A AU2459299A AU 2459299 A AU2459299 A AU 2459299A AU 24592/99 A AU24592/99 A AU 24592/99A AU 2459299 A AU2459299 A AU 2459299A AU 2459299 A AU2459299 A AU 2459299A
Authority
AU
Australia
Prior art keywords
fluorine
control system
monitor
fluorine control
fluorine monitor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU24592/99A
Inventor
Palash P Das
Thomas P. Duffey
Mengxiong Gong
Richard L Sandstrom
Tom A Watson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/016,525 external-priority patent/US5978406A/en
Priority claimed from US09/191,446 external-priority patent/US6240117B1/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of AU2459299A publication Critical patent/AU2459299A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
AU24592/99A 1998-01-30 1999-01-19 Fluorine control system with fluorine monitor Abandoned AU2459299A (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US09016525 1998-01-30
US09/016,525 US5978406A (en) 1998-01-30 1998-01-30 Fluorine control system for excimer lasers
US09/109,596 US6028880A (en) 1998-01-30 1998-07-02 Automatic fluorine control system
US09109596 1998-07-02
US09/191,446 US6240117B1 (en) 1998-01-30 1998-11-12 Fluorine control system with fluorine monitor
US09191446 1998-11-12
PCT/US1999/001075 WO1999039414A1 (en) 1998-01-30 1999-01-19 Fluorine control system with fluorine monitor

Publications (1)

Publication Number Publication Date
AU2459299A true AU2459299A (en) 1999-08-16

Family

ID=27360587

Family Applications (1)

Application Number Title Priority Date Filing Date
AU24592/99A Abandoned AU2459299A (en) 1998-01-30 1999-01-19 Fluorine control system with fluorine monitor

Country Status (3)

Country Link
JP (1) JP3880314B2 (en)
AU (1) AU2459299A (en)
WO (1) WO1999039414A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6381257B1 (en) * 1999-09-27 2002-04-30 Cymer, Inc. Very narrow band injection seeded F2 lithography laser
TW567400B (en) 2000-11-23 2003-12-21 Asml Netherlands Bv Lithographic projection apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured by the manufacturing method
EP1209526B1 (en) * 2000-11-23 2004-09-15 ASML Netherlands B.V. Lithographic apparatus and integrated circuit device manufacturing method
WO2017094099A1 (en) * 2015-12-01 2017-06-08 ギガフォトン株式会社 Excimer laser device
US10228322B2 (en) * 2017-07-13 2019-03-12 Cymer LLC Apparatus for and method of sensing fluorine concentration

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4722090A (en) * 1985-03-18 1988-01-26 Mitsubishi Denki Kabushiki Kaisha Excimer laser equipment
IT1229210B (en) * 1988-03-31 1991-07-25 Central Glass Co Ltd METHOD AND DEVICE FOR ANALYZING GASES CONTAINING FLUORINE.
US5377215A (en) * 1992-11-13 1994-12-27 Cymer Laser Technologies Excimer laser
JP2816813B2 (en) * 1994-04-12 1998-10-27 株式会社小松製作所 Excimer laser device
US5856991A (en) * 1997-06-04 1999-01-05 Cymer, Inc. Very narrow band laser

Also Published As

Publication number Publication date
JP3880314B2 (en) 2007-02-14
WO1999039414A1 (en) 1999-08-05
JP2002502134A (en) 2002-01-22

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase