AU2003296546A1 - Method for the treatment of a resist system and corresponding device - Google Patents

Method for the treatment of a resist system and corresponding device

Info

Publication number
AU2003296546A1
AU2003296546A1 AU2003296546A AU2003296546A AU2003296546A1 AU 2003296546 A1 AU2003296546 A1 AU 2003296546A1 AU 2003296546 A AU2003296546 A AU 2003296546A AU 2003296546 A AU2003296546 A AU 2003296546A AU 2003296546 A1 AU2003296546 A1 AU 2003296546A1
Authority
AU
Australia
Prior art keywords
treatment
corresponding device
resist system
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003296546A
Inventor
Wolf-Dieter Domke
Karl Kragler
Klaus Lowack
Siegfried Schwarzl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Publication of AU2003296546A1 publication Critical patent/AU2003296546A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
AU2003296546A 2002-12-20 2003-12-16 Method for the treatment of a resist system and corresponding device Abandoned AU2003296546A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10261845A DE10261845A1 (en) 2002-12-20 2002-12-20 Process for treating a resist system and device therefor
DE10261845.3 2002-12-20
PCT/DE2003/004236 WO2004057425A1 (en) 2002-12-20 2003-12-16 Method for the treatment of a resist system and corresponding device

Publications (1)

Publication Number Publication Date
AU2003296546A1 true AU2003296546A1 (en) 2004-07-14

Family

ID=32519561

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003296546A Abandoned AU2003296546A1 (en) 2002-12-20 2003-12-16 Method for the treatment of a resist system and corresponding device

Country Status (3)

Country Link
AU (1) AU2003296546A1 (en)
DE (1) DE10261845A1 (en)
WO (1) WO2004057425A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7541137B2 (en) * 2005-12-19 2009-06-02 Beach James V Resist resolution using anisotropic acid diffusion
DE102010046730A1 (en) * 2010-09-24 2012-03-29 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Photolithographic method for forming a three-dimensional structure

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03159114A (en) * 1989-11-16 1991-07-09 Mitsubishi Electric Corp Formation of fine pattern
KR100239440B1 (en) * 1997-08-20 2000-01-15 김영환 Method for patterning chemical amplified photoresist

Also Published As

Publication number Publication date
WO2004057425A1 (en) 2004-07-08
DE10261845A1 (en) 2004-07-22

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase