AU2003296546A1 - Method for the treatment of a resist system and corresponding device - Google Patents
Method for the treatment of a resist system and corresponding deviceInfo
- Publication number
- AU2003296546A1 AU2003296546A1 AU2003296546A AU2003296546A AU2003296546A1 AU 2003296546 A1 AU2003296546 A1 AU 2003296546A1 AU 2003296546 A AU2003296546 A AU 2003296546A AU 2003296546 A AU2003296546 A AU 2003296546A AU 2003296546 A1 AU2003296546 A1 AU 2003296546A1
- Authority
- AU
- Australia
- Prior art keywords
- treatment
- corresponding device
- resist system
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10261845A DE10261845A1 (en) | 2002-12-20 | 2002-12-20 | Process for treating a resist system and device therefor |
DE10261845.3 | 2002-12-20 | ||
PCT/DE2003/004236 WO2004057425A1 (en) | 2002-12-20 | 2003-12-16 | Method for the treatment of a resist system and corresponding device |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003296546A1 true AU2003296546A1 (en) | 2004-07-14 |
Family
ID=32519561
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003296546A Abandoned AU2003296546A1 (en) | 2002-12-20 | 2003-12-16 | Method for the treatment of a resist system and corresponding device |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU2003296546A1 (en) |
DE (1) | DE10261845A1 (en) |
WO (1) | WO2004057425A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7541137B2 (en) * | 2005-12-19 | 2009-06-02 | Beach James V | Resist resolution using anisotropic acid diffusion |
DE102010046730A1 (en) * | 2010-09-24 | 2012-03-29 | Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh | Photolithographic method for forming a three-dimensional structure |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03159114A (en) * | 1989-11-16 | 1991-07-09 | Mitsubishi Electric Corp | Formation of fine pattern |
KR100239440B1 (en) * | 1997-08-20 | 2000-01-15 | 김영환 | Method for patterning chemical amplified photoresist |
-
2002
- 2002-12-20 DE DE10261845A patent/DE10261845A1/en not_active Withdrawn
-
2003
- 2003-12-16 AU AU2003296546A patent/AU2003296546A1/en not_active Abandoned
- 2003-12-16 WO PCT/DE2003/004236 patent/WO2004057425A1/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO2004057425A1 (en) | 2004-07-08 |
DE10261845A1 (en) | 2004-07-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |