AU2003290093A1 - Coated optical element for corrective action obtained by producing layer thickness variations or by refraction factor variations in said coating - Google Patents
Coated optical element for corrective action obtained by producing layer thickness variations or by refraction factor variations in said coatingInfo
- Publication number
- AU2003290093A1 AU2003290093A1 AU2003290093A AU2003290093A AU2003290093A1 AU 2003290093 A1 AU2003290093 A1 AU 2003290093A1 AU 2003290093 A AU2003290093 A AU 2003290093A AU 2003290093 A AU2003290093 A AU 2003290093A AU 2003290093 A1 AU2003290093 A1 AU 2003290093A1
- Authority
- AU
- Australia
- Prior art keywords
- variations
- coating
- optical element
- layer thickness
- corrective action
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5873—Removal of material
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10259536 | 2002-12-19 | ||
DE10259536.4 | 2002-12-19 | ||
PCT/EP2003/014543 WO2004057378A1 (en) | 2002-12-19 | 2003-12-18 | Coated optical element for corrective action obtained by producing layer thickness variations or by refraction factor variations in said coating |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003290093A1 true AU2003290093A1 (en) | 2004-07-14 |
Family
ID=32667512
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003290093A Abandoned AU2003290093A1 (en) | 2002-12-19 | 2003-12-18 | Coated optical element for corrective action obtained by producing layer thickness variations or by refraction factor variations in said coating |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU2003290093A1 (en) |
WO (1) | WO2004057378A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7128984B2 (en) * | 2004-08-31 | 2006-10-31 | Corning Incorporated | Surfacing of metal fluoride excimer optics |
WO2006069785A1 (en) | 2004-12-28 | 2006-07-06 | Carl Zeiss Smt Ag | Apparatus for mounting two or more optical elements and method for processing the surface of an optical element |
EP1906253A1 (en) * | 2006-09-28 | 2008-04-02 | Carl Zeiss SMT AG | Projection objective of a microlithographic projection exposure apparatus |
DE102008041144A1 (en) | 2007-08-21 | 2009-03-05 | Carl Zeiss Smt Ag | Optical arrangement for e.g. projection lens, has structure for optimizing arrangement with respect to angle of incident angle-dependent polarization division in phase and amplitude, and another structure compensating change of wave front |
DE102015207153A1 (en) * | 2015-04-20 | 2016-10-20 | Carl Zeiss Smt Gmbh | Wavefront correction element for use in an optical system |
DE102017203246A1 (en) | 2017-02-28 | 2018-08-30 | Carl Zeiss Smt Gmbh | Method for correcting a mirror for the wavelength range from 5 nm to 20 nm |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69702641T2 (en) * | 1996-03-07 | 2001-04-05 | Koninkl Philips Electronics Nv | EXPOSURE SYSTEM AND EXPOSURE DEVICE FOR UV LITHOGRAPHY |
FR2749087B1 (en) * | 1996-05-21 | 1998-08-14 | Angenieux Sa | METHOD FOR CORRECTING OPTICAL ABERRATION OF A LENS |
DE10016008A1 (en) * | 2000-03-31 | 2001-10-11 | Zeiss Carl | Village system and its manufacture |
US6849859B2 (en) * | 2001-03-21 | 2005-02-01 | Euv Limited Liability Corporation | Fabrication of precision optics using an imbedded reference surface |
JP4929529B2 (en) * | 2001-03-27 | 2012-05-09 | 株式会社ニコン | OPTICAL SYSTEM MANUFACTURING METHOD AND EXPOSURE APPARATUS PROVIDED WITH OPTICAL SYSTEM PRODUCED BY THE MANUFACTURING METHOD |
-
2003
- 2003-12-18 AU AU2003290093A patent/AU2003290093A1/en not_active Abandoned
- 2003-12-18 WO PCT/EP2003/014543 patent/WO2004057378A1/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO2004057378A1 (en) | 2004-07-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |