AU2003271838A1 - Process for producing a patterned oxide film on a substrate - Google Patents

Process for producing a patterned oxide film on a substrate

Info

Publication number
AU2003271838A1
AU2003271838A1 AU2003271838A AU2003271838A AU2003271838A1 AU 2003271838 A1 AU2003271838 A1 AU 2003271838A1 AU 2003271838 A AU2003271838 A AU 2003271838A AU 2003271838 A AU2003271838 A AU 2003271838A AU 2003271838 A1 AU2003271838 A1 AU 2003271838A1
Authority
AU
Australia
Prior art keywords
producing
substrate
oxide film
patterned oxide
patterned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003271838A
Inventor
Robert Andrew Dorey
Silvia Marson
Roger William Whatmore
Qi Zhang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cranfield University
Original Assignee
Cranfield University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cranfield University filed Critical Cranfield University
Publication of AU2003271838A1 publication Critical patent/AU2003271838A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
AU2003271838A 2002-08-24 2003-08-22 Process for producing a patterned oxide film on a substrate Abandoned AU2003271838A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0219829.9 2002-08-24
GB0219829A GB0219829D0 (en) 2002-08-24 2002-08-24 Process
PCT/GB2003/003760 WO2004019130A1 (en) 2002-08-24 2003-08-22 Process for producing a patterned oxide film on a substrate

Publications (1)

Publication Number Publication Date
AU2003271838A1 true AU2003271838A1 (en) 2004-03-11

Family

ID=9942973

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003271838A Abandoned AU2003271838A1 (en) 2002-08-24 2003-08-22 Process for producing a patterned oxide film on a substrate

Country Status (3)

Country Link
AU (1) AU2003271838A1 (en)
GB (1) GB0219829D0 (en)
WO (1) WO2004019130A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005109097A1 (en) * 2004-04-08 2005-11-17 Universite Louis Pasteur (Etablissement Public A Caractere Scientifique, Culturel Et Professionnel) Lithographic method products obtained and use of said method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5637440A (en) * 1993-12-27 1997-06-10 Mitsubishi Materials Corporation Composition for forming metal oxide thin film pattern and method for forming metal oxide thin film pattern
JPH07268637A (en) * 1994-03-30 1995-10-17 Mitsubishi Materials Corp Composition for formation of metal oxide thin film pattern and its formation
JP2000247640A (en) * 1999-02-24 2000-09-12 Kansai Research Institute Photosensitive composition and production of ferroelectric thin film using the same

Also Published As

Publication number Publication date
WO2004019130A1 (en) 2004-03-04
GB0219829D0 (en) 2002-10-02

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase