AU2003265112A1 - Nanoporous dielectrics for plasma generator - Google Patents

Nanoporous dielectrics for plasma generator

Info

Publication number
AU2003265112A1
AU2003265112A1 AU2003265112A AU2003265112A AU2003265112A1 AU 2003265112 A1 AU2003265112 A1 AU 2003265112A1 AU 2003265112 A AU2003265112 A AU 2003265112A AU 2003265112 A AU2003265112 A AU 2003265112A AU 2003265112 A1 AU2003265112 A1 AU 2003265112A1
Authority
AU
Australia
Prior art keywords
plasma generator
nanoporous dielectrics
nanoporous
dielectrics
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003265112A
Inventor
Jin-Hoon Cho
Kyu-Wang Lee
Sung-Jin Park
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU2003265112A1 publication Critical patent/AU2003265112A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2441—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes characterised by the physical-chemical properties of the dielectric, e.g. porous dielectric
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32559—Protection means, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
AU2003265112A 2002-10-04 2003-10-01 Nanoporous dielectrics for plasma generator Abandoned AU2003265112A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2002-0060513 2002-10-04
KR10-2002-0060513A KR100530765B1 (en) 2002-10-04 2002-10-04 Nanoporous dielectrics for plasma generator
PCT/KR2003/002023 WO2004032176A1 (en) 2002-10-04 2003-10-01 Nanoporous dielectrics for plasma generator

Publications (1)

Publication Number Publication Date
AU2003265112A1 true AU2003265112A1 (en) 2004-04-23

Family

ID=32064905

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003265112A Abandoned AU2003265112A1 (en) 2002-10-04 2003-10-01 Nanoporous dielectrics for plasma generator

Country Status (3)

Country Link
KR (1) KR100530765B1 (en)
AU (1) AU2003265112A1 (en)
WO (1) WO2004032176A1 (en)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6695664B2 (en) 2001-10-26 2004-02-24 Board Of Trustees Of The University Of Illinois Microdischarge devices and arrays
KR100720668B1 (en) * 2004-06-14 2007-05-21 주식회사 룩스온 High output coupling efficiency of light emitting device with transparent porous anodic alumina on ITO glass substrate
KR100644882B1 (en) * 2004-07-12 2006-11-15 한국에너지기술연구원 Optical Device Comprising Semiconductor Nanoparticles and Preparation Method thereof
US7297041B2 (en) * 2004-10-04 2007-11-20 The Board Of Trustees Of The University Of Illinois Method of manufacturing microdischarge devices with encapsulated electrodes
DE102005002142A1 (en) 2005-01-12 2006-07-20 Forschungsverbund Berlin E.V. Microplasma array
EP1905057B1 (en) * 2005-07-15 2016-03-09 The Board Of Trustees Of The University Of Illinois Arrays of microcavity plasma devices with dielectric encapsulated electrodes
JP5539650B2 (en) 2006-01-23 2014-07-02 ザ ボード オブ トラスティーズ オブ ザ ユニバーシティ オブ イリノイ Microplasma device
DE102008024486B4 (en) 2008-05-21 2011-12-15 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Plasma stamp, plasma treatment apparatus, plasma treatment method, and plasma stamp fabrication method
US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
US9288886B2 (en) 2008-05-30 2016-03-15 Colorado State University Research Foundation Plasma-based chemical source device and method of use thereof
CA2763866A1 (en) * 2009-05-29 2010-12-02 Colorado State University Research Foundation Plasma electrode configuration for forming an electron sheath layer
CA2794902A1 (en) 2010-03-31 2011-10-06 Colorado State University Research Foundation Liquid-gas interface plasma device
CA2794895A1 (en) 2010-03-31 2011-10-06 Colorado State University Research Foundation Liquid-gas interface plasma device
US8547004B2 (en) 2010-07-27 2013-10-01 The Board Of Trustees Of The University Of Illinois Encapsulated metal microtip microplasma devices, arrays and fabrication methods
KR101320166B1 (en) * 2011-04-21 2013-10-23 삼성전기주식회사 A Ceramic sheet product for ceramic electronic parts, multi-layer ceramic electronic parts using the same and a manufacturing method thereof
CN102933015B (en) * 2012-11-16 2017-02-08 上海交通大学 Polarization-enhanced discharge electrode formed by one-dimensional nanostructures
US9117636B2 (en) * 2013-02-11 2015-08-25 Colorado State University Research Foundation Plasma catalyst chemical reaction apparatus
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation
CZ304814B6 (en) * 2013-07-11 2014-11-12 Fyzikální ústav AV ČR, v.v.i. Atmospheric plasma source, particularly for use in medicinal bioapplications
JP6029551B2 (en) * 2013-07-31 2016-11-24 富士フイルム株式会社 Gas electron multiplier and gas electron multiplier
CN103569954A (en) * 2013-11-12 2014-02-12 无锡英普林纳米科技有限公司 Method for preparing micron submicron reaction vessel array
KR101896266B1 (en) * 2015-06-12 2018-09-07 주식회사 넥스트이앤엠 Ionic diode membrane comprising tapered nanopore and method for preparing thereof
CZ306217B6 (en) * 2015-10-06 2016-10-05 Fyzikální ústav AV ČR, v.v.i. Low-temperature plasma source with possibility of both contact and contactless application and process for preparing sandwich structure for such a source
WO2018004507A1 (en) * 2016-06-27 2018-01-04 Eden Park Illumination High-power ultraviolet (uv) and vacuum ultraviolet (vuv) lamps with micro-cavity plasma arrays
KR102140722B1 (en) * 2018-08-22 2020-08-04 무진전자 주식회사 Dry clean apparatus and method using atmospheric plasma and steam
US11564292B2 (en) * 2019-09-27 2023-01-24 Applied Materials, Inc. Monolithic modular microwave source with integrated temperature control
US11881384B2 (en) * 2019-09-27 2024-01-23 Applied Materials, Inc. Monolithic modular microwave source with integrated process gas distribution
US20210098230A1 (en) * 2019-09-27 2021-04-01 Applied Materials, Inc. Monolithic modular high-frequency plasma source

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19515596A1 (en) * 1995-05-02 1996-11-07 Philips Patentverwaltung Electric discharge tube or discharge lamp, flat screen, low-temperature cathode and process for their production
US6147452A (en) * 1997-03-18 2000-11-14 The Trustees Of The Stevens Institute Of Technology AC glow plasma discharge device having an electrode covered with apertured dielectric
US5872426A (en) * 1997-03-18 1999-02-16 Stevens Institute Of Technology Glow plasma discharge device having electrode covered with perforated dielectric
JP3902883B2 (en) * 1998-03-27 2007-04-11 キヤノン株式会社 Nanostructure and manufacturing method thereof
US6410149B1 (en) * 1998-08-27 2002-06-25 Alliedsignal Inc. Silane-based nanoporous silica thin films and precursors for making same

Also Published As

Publication number Publication date
WO2004032176A1 (en) 2004-04-15
KR100530765B1 (en) 2005-11-23
KR20040031146A (en) 2004-04-13

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase