AU2003256897A1 - Determining topography and composition of a sample by using an interferometer - Google Patents

Determining topography and composition of a sample by using an interferometer

Info

Publication number
AU2003256897A1
AU2003256897A1 AU2003256897A AU2003256897A AU2003256897A1 AU 2003256897 A1 AU2003256897 A1 AU 2003256897A1 AU 2003256897 A AU2003256897 A AU 2003256897A AU 2003256897 A AU2003256897 A AU 2003256897A AU 2003256897 A1 AU2003256897 A1 AU 2003256897A1
Authority
AU
Australia
Prior art keywords
interferometer
sample
composition
determining topography
topography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003256897A
Inventor
Lev Dulman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ANGSTRO VISION Inc
Original Assignee
ANGSTRO VISION Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/215,897 external-priority patent/US20040027583A1/en
Priority claimed from US10/215,801 external-priority patent/US7136168B2/en
Priority claimed from US10/215,905 external-priority patent/US6999181B2/en
Priority claimed from US10/215,894 external-priority patent/US20040027582A1/en
Application filed by ANGSTRO VISION Inc filed Critical ANGSTRO VISION Inc
Publication of AU2003256897A1 publication Critical patent/AU2003256897A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02055Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G01B9/02072Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608Height gauges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02015Interferometers characterised by the beam path configuration
    • G01B9/02027Two or more interferometric channels or interferometers
    • G01B9/02028Two or more reference or object arms in one interferometer
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02083Interferometers characterised by particular signal processing and presentation
AU2003256897A 2002-08-09 2003-08-08 Determining topography and composition of a sample by using an interferometer Abandoned AU2003256897A1 (en)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US10/215,897 US20040027583A1 (en) 2002-08-09 2002-08-09 Pre-established reference scale for interferometric topological metrology
US10/215,801 US7136168B2 (en) 2002-08-09 2002-08-09 Interferometric topological metrology with pre-established reference scale
US10/215,905 US6999181B2 (en) 2002-08-09 2002-08-09 Advanced signal processing technique for translating fringe line disturbances into sample height at a particular position above an interferometer's sample stage
US10/215,894 US20040027582A1 (en) 2002-08-09 2002-08-09 Method and apparatus for determining sample composition with an interferometer
US10/215,801 2002-08-09
US10/215,894 2002-08-09
US10/215,897 2002-08-09
US10/215,905 2002-08-09
PCT/US2003/024859 WO2004015367A1 (en) 2002-08-09 2003-08-08 Determining topography and composition of a sample by using an interferometer

Publications (1)

Publication Number Publication Date
AU2003256897A1 true AU2003256897A1 (en) 2004-02-25

Family

ID=31721726

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003256897A Abandoned AU2003256897A1 (en) 2002-08-09 2003-08-08 Determining topography and composition of a sample by using an interferometer

Country Status (5)

Country Link
EP (1) EP1527318A1 (en)
JP (1) JP2005535882A (en)
KR (1) KR20050037465A (en)
AU (1) AU2003256897A1 (en)
WO (1) WO2004015367A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100451538C (en) * 2005-07-25 2009-01-14 武汉大学 Appearance measuring method and device for light interference surface based on wide band
CN102460129B (en) * 2009-06-22 2015-08-12 Asml荷兰有限公司 Object inspection systems and method
JP2011038829A (en) * 2009-08-07 2011-02-24 Topcon Corp Interference microscope and measuring apparatus
FR3077631B1 (en) 2018-02-05 2021-01-01 Unity Semiconductor METHOD AND DEVICE FOR INSPECTING A SURFACE OF AN OBJECT CONTAINING DISSIMILAR MATERIALS

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4832489A (en) * 1986-03-19 1989-05-23 Wyko Corporation Two-wavelength phase-shifting interferometer and method
US5243542A (en) * 1987-12-29 1993-09-07 Asahi Kogaku Kogyo Kabushiki Kaisha Interferometer employing reference images
DE4204857C2 (en) * 1991-02-18 1998-01-22 Asahi Optical Co Ltd Method for examining a surface shape with an interferometer
GB9903638D0 (en) * 1999-02-17 1999-04-07 European Community A measurement method and measurement apparatus

Also Published As

Publication number Publication date
WO2004015367A1 (en) 2004-02-19
EP1527318A1 (en) 2005-05-04
KR20050037465A (en) 2005-04-21
JP2005535882A (en) 2005-11-24

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase