AU2003248251A1 - Exposure system - Google Patents

Exposure system

Info

Publication number
AU2003248251A1
AU2003248251A1 AU2003248251A AU2003248251A AU2003248251A1 AU 2003248251 A1 AU2003248251 A1 AU 2003248251A1 AU 2003248251 A AU2003248251 A AU 2003248251A AU 2003248251 A AU2003248251 A AU 2003248251A AU 2003248251 A1 AU2003248251 A1 AU 2003248251A1
Authority
AU
Australia
Prior art keywords
exposure system
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003248251A
Inventor
Yusuke Taki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003248251A1 publication Critical patent/AU2003248251A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
AU2003248251A 2002-07-09 2003-07-09 Exposure system Abandoned AU2003248251A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002199479 2002-07-09
JP2002-199479 2002-07-09
PCT/JP2003/008704 WO2004006310A1 (en) 2002-07-09 2003-07-09 Exposure system

Publications (1)

Publication Number Publication Date
AU2003248251A1 true AU2003248251A1 (en) 2004-01-23

Family

ID=30112464

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003248251A Abandoned AU2003248251A1 (en) 2002-07-09 2003-07-09 Exposure system

Country Status (3)

Country Link
JP (1) JPWO2004006310A1 (en)
AU (1) AU2003248251A1 (en)
WO (1) WO2004006310A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7308185B2 (en) * 2004-12-13 2007-12-11 Asml Holding N.V. Ultra-thin high-precision glass optic
US20120021195A1 (en) * 2009-03-31 2012-01-26 Stella Chemifa Corporation Optical member and process for producing same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000058761A1 (en) * 1999-03-29 2000-10-05 Nikon Corporation Multilayer antireflection film, optical component, and reduction projection exposure system
JP2001264512A (en) * 2000-03-21 2001-09-26 Nikon Corp Method for post-treatment of thin film, post-treatment device, post-treated optical member and aligner provided with optical member
JP2003113464A (en) * 2001-10-09 2003-04-18 Canon Inc Apparatus and method for vacuum deposition
JP2003149404A (en) * 2001-11-09 2003-05-21 Canon Inc Optical thin film, its manufacturing method, optical element using optical thin film, optical system, and image pickup device, recording device and exposure device provided with optical system

Also Published As

Publication number Publication date
JPWO2004006310A1 (en) 2005-11-10
WO2004006310A1 (en) 2004-01-15

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase