AU2003244019A1 - Method of cleaning substrate treatment apparatus - Google Patents

Method of cleaning substrate treatment apparatus

Info

Publication number
AU2003244019A1
AU2003244019A1 AU2003244019A AU2003244019A AU2003244019A1 AU 2003244019 A1 AU2003244019 A1 AU 2003244019A1 AU 2003244019 A AU2003244019 A AU 2003244019A AU 2003244019 A AU2003244019 A AU 2003244019A AU 2003244019 A1 AU2003244019 A1 AU 2003244019A1
Authority
AU
Australia
Prior art keywords
treatment apparatus
substrate treatment
cleaning substrate
cleaning
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003244019A
Inventor
Kazuya Dobashi
Yasuhiro Oshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2003244019A1 publication Critical patent/AU2003244019A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
AU2003244019A 2002-07-05 2003-07-01 Method of cleaning substrate treatment apparatus Abandoned AU2003244019A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002197364A JP3527231B2 (en) 2002-07-05 2002-07-05 Cleaning method for substrate processing equipment
JP2002-197364 2002-07-05
PCT/JP2003/008318 WO2004006317A1 (en) 2002-07-05 2003-07-01 Method of cleaning substrate treatment apparatus

Publications (1)

Publication Number Publication Date
AU2003244019A1 true AU2003244019A1 (en) 2004-01-23

Family

ID=30112396

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003244019A Abandoned AU2003244019A1 (en) 2002-07-05 2003-07-01 Method of cleaning substrate treatment apparatus

Country Status (3)

Country Link
JP (1) JP3527231B2 (en)
AU (1) AU2003244019A1 (en)
WO (1) WO2004006317A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070289604A1 (en) * 2004-04-30 2007-12-20 Yukio Fukunaga Substrate Processing Apparatus
JP4718795B2 (en) * 2004-06-02 2011-07-06 ルネサスエレクトロニクス株式会社 Processing method in vapor phase growth apparatus
US8128755B2 (en) 2010-03-03 2012-03-06 L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Cleaning solvent and cleaning method for metallic compound
JP5356552B2 (en) * 2012-01-30 2013-12-04 株式会社日立国際電気 Cleaning method, semiconductor device manufacturing method, and substrate processing apparatus
JP6142676B2 (en) * 2013-05-31 2017-06-07 セントラル硝子株式会社 Dry etching method, dry etching apparatus, metal film and device including the same
TW202221789A (en) * 2020-11-27 2022-06-01 南韓商Ｐｓｋ有限公司 Method and apparatus for treating substrate

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4049423B2 (en) * 1997-11-06 2008-02-20 キヤノンアネルバ株式会社 Method for cleaning attached metal film in film forming apparatus
US5993679A (en) * 1997-11-06 1999-11-30 Anelva Corporation Method of cleaning metallic films built up within thin film deposition apparatus
DE19833448C2 (en) * 1998-07-24 2003-07-17 Infineon Technologies Ag Process for cleaning CVD systems
JP2001176807A (en) * 1999-12-20 2001-06-29 Hitachi Ltd Device and method for manufacturing semiconductor device, and cleaning method

Also Published As

Publication number Publication date
JP2004039976A (en) 2004-02-05
WO2004006317A1 (en) 2004-01-15
JP3527231B2 (en) 2004-05-17

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase