AU2003235241A1 - Nonvolatile semiconductor storage device and method for manufacturing nonvolatile semiconductor storage device - Google Patents

Nonvolatile semiconductor storage device and method for manufacturing nonvolatile semiconductor storage device

Info

Publication number
AU2003235241A1
AU2003235241A1 AU2003235241A AU2003235241A AU2003235241A1 AU 2003235241 A1 AU2003235241 A1 AU 2003235241A1 AU 2003235241 A AU2003235241 A AU 2003235241A AU 2003235241 A AU2003235241 A AU 2003235241A AU 2003235241 A1 AU2003235241 A1 AU 2003235241A1
Authority
AU
Australia
Prior art keywords
storage device
nonvolatile semiconductor
semiconductor storage
manufacturing
manufacturing nonvolatile
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003235241A
Inventor
Natsuo Ajika
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Genusion Inc
Original Assignee
Genusion Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Genusion Inc filed Critical Genusion Inc
Publication of AU2003235241A1 publication Critical patent/AU2003235241A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409Unipolar field-effect transistors
    • H01L29/66477Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66833Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a charge trapping gate insulator, e.g. MNOS transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/792Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
    • H01L29/7923Programmable transistors with more than two possible different levels of programmation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B43/00EEPROM devices comprising charge-trapping gate insulators
    • H10B43/30EEPROM devices comprising charge-trapping gate insulators characterised by the memory core region

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Non-Volatile Memory (AREA)
  • Semiconductor Memories (AREA)
AU2003235241A 2003-04-18 2003-04-18 Nonvolatile semiconductor storage device and method for manufacturing nonvolatile semiconductor storage device Abandoned AU2003235241A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2003/004941 WO2004095585A1 (en) 2003-04-18 2003-04-18 Nonvolatile semiconductor storage device and method for manufacturing nonvolatile semiconductor storage device

Publications (1)

Publication Number Publication Date
AU2003235241A1 true AU2003235241A1 (en) 2004-11-19

Family

ID=33307196

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003235241A Abandoned AU2003235241A1 (en) 2003-04-18 2003-04-18 Nonvolatile semiconductor storage device and method for manufacturing nonvolatile semiconductor storage device

Country Status (2)

Country Link
AU (1) AU2003235241A1 (en)
WO (1) WO2004095585A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3976774B1 (en) 2006-03-10 2007-09-19 株式会社Genusion Nonvolatile semiconductor memory device and control method thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4870470A (en) * 1987-10-16 1989-09-26 International Business Machines Corporation Non-volatile memory cell having Si rich silicon nitride charge trapping layer
JP2511485B2 (en) * 1988-01-12 1996-06-26 沖電気工業株式会社 Semiconductor memory device
JP2672688B2 (en) * 1990-04-02 1997-11-05 松下電子工業株式会社 Method for driving nonvolatile semiconductor memory device
JPH09298299A (en) * 1996-05-02 1997-11-18 Toshiba Corp Semiconductor integrated circuit
JP4923318B2 (en) * 1999-12-17 2012-04-25 ソニー株式会社 Nonvolatile semiconductor memory device and operation method thereof
JP4117101B2 (en) * 2000-08-30 2008-07-16 株式会社ルネサステクノロジ Semiconductor device and manufacturing method thereof
JP4770061B2 (en) * 2001-05-31 2011-09-07 ソニー株式会社 Nonvolatile semiconductor memory device and manufacturing method thereof

Also Published As

Publication number Publication date
WO2004095585A1 (en) 2004-11-04

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase