AU2003235241A1 - Nonvolatile semiconductor storage device and method for manufacturing nonvolatile semiconductor storage device - Google Patents
Nonvolatile semiconductor storage device and method for manufacturing nonvolatile semiconductor storage deviceInfo
- Publication number
- AU2003235241A1 AU2003235241A1 AU2003235241A AU2003235241A AU2003235241A1 AU 2003235241 A1 AU2003235241 A1 AU 2003235241A1 AU 2003235241 A AU2003235241 A AU 2003235241A AU 2003235241 A AU2003235241 A AU 2003235241A AU 2003235241 A1 AU2003235241 A1 AU 2003235241A1
- Authority
- AU
- Australia
- Prior art keywords
- storage device
- nonvolatile semiconductor
- semiconductor storage
- manufacturing
- manufacturing nonvolatile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000004065 semiconductor Substances 0.000 title 2
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66833—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a charge trapping gate insulator, e.g. MNOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/792—Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
- H01L29/7923—Programmable transistors with more than two possible different levels of programmation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B43/00—EEPROM devices comprising charge-trapping gate insulators
- H10B43/30—EEPROM devices comprising charge-trapping gate insulators characterised by the memory core region
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2003/004941 WO2004095585A1 (en) | 2003-04-18 | 2003-04-18 | Nonvolatile semiconductor storage device and method for manufacturing nonvolatile semiconductor storage device |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003235241A1 true AU2003235241A1 (en) | 2004-11-19 |
Family
ID=33307196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003235241A Abandoned AU2003235241A1 (en) | 2003-04-18 | 2003-04-18 | Nonvolatile semiconductor storage device and method for manufacturing nonvolatile semiconductor storage device |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU2003235241A1 (en) |
WO (1) | WO2004095585A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3976774B1 (en) | 2006-03-10 | 2007-09-19 | 株式会社Genusion | Nonvolatile semiconductor memory device and control method thereof |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4870470A (en) * | 1987-10-16 | 1989-09-26 | International Business Machines Corporation | Non-volatile memory cell having Si rich silicon nitride charge trapping layer |
JP2511485B2 (en) * | 1988-01-12 | 1996-06-26 | 沖電気工業株式会社 | Semiconductor memory device |
JP2672688B2 (en) * | 1990-04-02 | 1997-11-05 | 松下電子工業株式会社 | Method for driving nonvolatile semiconductor memory device |
JPH09298299A (en) * | 1996-05-02 | 1997-11-18 | Toshiba Corp | Semiconductor integrated circuit |
JP4923318B2 (en) * | 1999-12-17 | 2012-04-25 | ソニー株式会社 | Nonvolatile semiconductor memory device and operation method thereof |
JP4117101B2 (en) * | 2000-08-30 | 2008-07-16 | 株式会社ルネサステクノロジ | Semiconductor device and manufacturing method thereof |
JP4770061B2 (en) * | 2001-05-31 | 2011-09-07 | ソニー株式会社 | Nonvolatile semiconductor memory device and manufacturing method thereof |
-
2003
- 2003-04-18 AU AU2003235241A patent/AU2003235241A1/en not_active Abandoned
- 2003-04-18 WO PCT/JP2003/004941 patent/WO2004095585A1/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
WO2004095585A1 (en) | 2004-11-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |