AU2003232680A1 - 2-alkoxyalkyl-2-adamantyl (meth)acrylate and method for preparing same - Google Patents

2-alkoxyalkyl-2-adamantyl (meth)acrylate and method for preparing same

Info

Publication number
AU2003232680A1
AU2003232680A1 AU2003232680A AU2003232680A AU2003232680A1 AU 2003232680 A1 AU2003232680 A1 AU 2003232680A1 AU 2003232680 A AU2003232680 A AU 2003232680A AU 2003232680 A AU2003232680 A AU 2003232680A AU 2003232680 A1 AU2003232680 A1 AU 2003232680A1
Authority
AU
Australia
Prior art keywords
adamantyl
alkoxyalkyl
meth
acrylate
preparing same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003232680A
Inventor
Eun Hyoung Bae
Dong Ju Oh
Young Bae Song
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ENF Technology CO Ltd
Original Assignee
ENF Technology CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ENF Technology CO Ltd filed Critical ENF Technology CO Ltd
Publication of AU2003232680A1 publication Critical patent/AU2003232680A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54—Acrylic acid esters; Methacrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/14—Preparation of carboxylic acid esters from carboxylic acid halides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/56—Ring systems containing bridged rings
    • C07C2603/58—Ring systems containing bridged rings containing three rings
    • C07C2603/70—Ring systems containing bridged rings containing three rings containing only six-membered rings
    • C07C2603/74—Adamantanes
AU2003232680A 2002-06-11 2003-06-11 2-alkoxyalkyl-2-adamantyl (meth)acrylate and method for preparing same Abandoned AU2003232680A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020020032554A KR20030095046A (en) 2002-06-11 2002-06-11 2-alkoxy alkyl-2-adamantyl(metha)acrylate and producing method therefor
KR10-2002-0032554 2002-06-11
PCT/KR2003/001151 WO2003104182A1 (en) 2002-06-11 2003-06-11 2-alkoxyalkyl-2-adamantyl (meth)acrylate and method for preparing same

Publications (1)

Publication Number Publication Date
AU2003232680A1 true AU2003232680A1 (en) 2003-12-22

Family

ID=29728626

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003232680A Abandoned AU2003232680A1 (en) 2002-06-11 2003-06-11 2-alkoxyalkyl-2-adamantyl (meth)acrylate and method for preparing same

Country Status (3)

Country Link
KR (1) KR20030095046A (en)
AU (1) AU2003232680A1 (en)
WO (1) WO2003104182A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7528279B2 (en) 2004-02-05 2009-05-05 Idemitsu Kosan Co., Ltd. Adamantane derivatives and process for producing the same
JP4790290B2 (en) * 2004-03-10 2011-10-12 出光興産株式会社 Adamantane derivative and method for producing the same
CA2573115A1 (en) * 2004-07-07 2006-01-12 Lundbeck Pharmaceuticals Italy S.P.A. Process for the synthesis and purification of (4-methoxybutyl) (4-trifluoromethylphenyl)methanone
JP5276264B2 (en) 2006-07-03 2013-08-28 富士フイルム株式会社 INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATERIAL, AND METHOD FOR PRODUCING A lithographic printing plate
JP5258237B2 (en) 2006-09-14 2013-08-07 富士フイルム株式会社 Ink composition, inkjet recording method, lithographic printing plate production method, and lithographic printing plate
CN111056945A (en) * 2019-12-25 2020-04-24 上海博栋化学科技有限公司 Photoresist resin monomer synthesized from spiro [5.5] undecane-3, 9-dione and synthesis method thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6013416A (en) * 1995-06-28 2000-01-11 Fujitsu Limited Chemically amplified resist compositions and process for the formation of resist patterns
TWI263866B (en) * 1999-01-18 2006-10-11 Sumitomo Chemical Co Chemical amplification type positive resist composition
JP2000229911A (en) * 1999-02-05 2000-08-22 Mitsubishi Rayon Co Ltd Production of 2-alkyl-2-adamantyl (meth)acrylates
KR20010081853A (en) * 2000-02-19 2001-08-29 김동석 2-Alkyl-2-adamantyl 5-norbornene-2-carboxylates and producing method therefor
KR100370594B1 (en) * 2000-02-19 2003-02-05 주식회사 켐써치 Producing method for 2-alkyl-2-adamantyl (meth)acrylates
EP1127870B1 (en) * 2000-02-26 2003-11-05 Shipley Company LLC Novel monomers, polymers, methods of synthesis thereof and photoresist compositions

Also Published As

Publication number Publication date
KR20030095046A (en) 2003-12-18
WO2003104182A1 (en) 2003-12-18

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase