AU2003217463A1 - System for vacuum metallization of objects treated in batches - Google Patents
System for vacuum metallization of objects treated in batchesInfo
- Publication number
- AU2003217463A1 AU2003217463A1 AU2003217463A AU2003217463A AU2003217463A1 AU 2003217463 A1 AU2003217463 A1 AU 2003217463A1 AU 2003217463 A AU2003217463 A AU 2003217463A AU 2003217463 A AU2003217463 A AU 2003217463A AU 2003217463 A1 AU2003217463 A1 AU 2003217463A1
- Authority
- AU
- Australia
- Prior art keywords
- batches
- vacuum metallization
- objects treated
- treated
- objects
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45578—Elongated nozzles, tubes with holes
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITFI20020042 ITFI20020042A1 (en) | 2002-03-08 | 2002-03-08 | PLANT FOR THE VACUUM METALLIZATION OF OBJECTS PROCESSED IN LOTS |
ITFI2002A000042 | 2002-03-08 | ||
PCT/IT2003/000131 WO2003076684A1 (en) | 2002-03-08 | 2003-03-04 | System for vacuum metallization of objects treated in batches |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003217463A1 true AU2003217463A1 (en) | 2003-09-22 |
Family
ID=11442315
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003217463A Abandoned AU2003217463A1 (en) | 2002-03-08 | 2003-03-04 | System for vacuum metallization of objects treated in batches |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1485517A1 (en) |
AU (1) | AU2003217463A1 (en) |
IT (1) | ITFI20020042A1 (en) |
WO (1) | WO2003076684A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1947211A1 (en) * | 2006-12-05 | 2008-07-23 | Galileo Vacuum Systems S.p.A. | Vacuum metallization device |
RU2673253C2 (en) * | 2017-04-20 | 2018-11-23 | Вера Дмитриевна Мирошникова | Crown substrate carrier |
EP3966854A1 (en) * | 2019-05-07 | 2022-03-16 | Oerlikon Surface Solutions AG, Pfäffikon | Movable work piece carrier device for holding work pieces to be treated |
CN112195450B (en) * | 2020-10-23 | 2022-10-18 | 青岛优百宇真空设备股份有限公司 | Wheel hub coating equipment |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3598083A (en) * | 1969-10-27 | 1971-08-10 | Varian Associates | Complex motion mechanism for thin film coating apparatuses |
AU507748B2 (en) * | 1976-06-10 | 1980-02-28 | University Of Sydney, The | Reactive sputtering |
US4308126A (en) * | 1980-09-18 | 1981-12-29 | United Technologies Corporation | Cathode sputtering apparatus |
US5124013A (en) * | 1988-02-08 | 1992-06-23 | Optical Coating Laboratory, Inc. | High ratio planetary drive system and method for vacuum chamber |
WO1998020521A1 (en) * | 1996-11-01 | 1998-05-14 | THEVA DüNNSCHICHTTECHNIK GMBH | Device for producing oxidic thin films |
US6485616B1 (en) * | 1999-12-29 | 2002-11-26 | Deposition Sciences, Inc. | System and method for coating substrates with improved capacity and uniformity |
CN1575350A (en) * | 2001-08-24 | 2005-02-02 | 纳米纳克斯公司 | Method and apparatus of producing uniform isotropic stresses in a sputtered film |
-
2002
- 2002-03-08 IT ITFI20020042 patent/ITFI20020042A1/en unknown
-
2003
- 2003-03-04 AU AU2003217463A patent/AU2003217463A1/en not_active Abandoned
- 2003-03-04 WO PCT/IT2003/000131 patent/WO2003076684A1/en not_active Application Discontinuation
- 2003-03-04 EP EP03712651A patent/EP1485517A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP1485517A1 (en) | 2004-12-15 |
ITFI20020042A1 (en) | 2002-06-06 |
WO2003076684A1 (en) | 2003-09-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |