AU2003208262A1 - Device and method for the electrochemical treatment of items with a pulse flow - Google Patents

Device and method for the electrochemical treatment of items with a pulse flow

Info

Publication number
AU2003208262A1
AU2003208262A1 AU2003208262A AU2003208262A AU2003208262A1 AU 2003208262 A1 AU2003208262 A1 AU 2003208262A1 AU 2003208262 A AU2003208262 A AU 2003208262A AU 2003208262 A AU2003208262 A AU 2003208262A AU 2003208262 A1 AU2003208262 A1 AU 2003208262A1
Authority
AU
Australia
Prior art keywords
items
electrochemical treatment
pulse flow
pulse
flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003208262A
Inventor
Egon Hubel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU2003208262A1 publication Critical patent/AU2003208262A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
AU2003208262A 2002-01-22 2003-01-20 Device and method for the electrochemical treatment of items with a pulse flow Abandoned AU2003208262A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10202431A DE10202431C1 (en) 2002-01-22 2002-01-22 Apparatus for electrochemical metallization, etching, oxidation or reduction of materials uses small electrochemical cells with contact electrodes fed with electrical pulses
DE10202431.6 2002-01-22
PCT/DE2003/000140 WO2003062499A2 (en) 2002-01-22 2003-01-20 Device and method for the electrochemical treatment of items with a pulse flow

Publications (1)

Publication Number Publication Date
AU2003208262A1 true AU2003208262A1 (en) 2003-09-02

Family

ID=7712831

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003208262A Abandoned AU2003208262A1 (en) 2002-01-22 2003-01-20 Device and method for the electrochemical treatment of items with a pulse flow

Country Status (4)

Country Link
AU (1) AU2003208262A1 (en)
DE (2) DE10202431C1 (en)
TW (1) TW200302298A (en)
WO (1) WO2003062499A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10259367A1 (en) * 2002-12-18 2004-07-08 Siemens Ag Method for improving the interaction between a medium and a component

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH629542A5 (en) * 1976-09-01 1982-04-30 Inoue Japax Res METHOD AND DEVICE FOR GALVANIC MATERIAL DEPOSITION.
DE19707905C1 (en) * 1997-02-27 1998-02-05 Atotech Deutschland Gmbh Bipolar pulsed current supply method for electroplating
DE19726510C2 (en) * 1997-06-23 2000-12-28 Georg Hesse Device and method for electrolytic metal deposition using pulse current
DE19931230A1 (en) * 1999-07-07 2001-01-18 Atotech Deutschland Gmbh Production of bipolar pulsed streams in electrolytic apparatus comprises using a pulse regulator between the exits of two direct current intermediate circuits and electrolytic cells
DE10043817C2 (en) * 2000-09-06 2002-07-18 Egon Huebel Arrangement and method for goods to be treated electrochemically
DE10043816C1 (en) * 2000-09-06 2002-05-16 Egon Huebel Device for electrochemically metallizing, etching, oxidizing and reducing material in electrolytic apparatus comprises rigid base body, electrical contacts arranged on base body, contact isolator, counter electrode and electrical connection

Also Published As

Publication number Publication date
WO2003062499A3 (en) 2003-09-18
DE10202431C1 (en) 2003-05-28
TW200302298A (en) 2003-08-01
DE10390169D2 (en) 2005-01-27
WO2003062499A2 (en) 2003-07-31

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase