AU2002358638A8 - Catadioptric reduction lens - Google Patents

Catadioptric reduction lens

Info

Publication number
AU2002358638A8
AU2002358638A8 AU2002358638A AU2002358638A AU2002358638A8 AU 2002358638 A8 AU2002358638 A8 AU 2002358638A8 AU 2002358638 A AU2002358638 A AU 2002358638A AU 2002358638 A AU2002358638 A AU 2002358638A AU 2002358638 A8 AU2002358638 A8 AU 2002358638A8
Authority
AU
Australia
Prior art keywords
reduction lens
catadioptric reduction
catadioptric
lens
reduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002358638A
Other versions
AU2002358638A1 (en
Inventor
Alexander Epple
David R Shafer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2002358638A8 publication Critical patent/AU2002358638A8/en
Publication of AU2002358638A1 publication Critical patent/AU2002358638A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
AU2002358638A 2001-12-18 2002-12-07 Catadioptric reduction lens Abandoned AU2002358638A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US34027501P 2001-12-18 2001-12-18
US60/340,275 2001-12-18
PCT/EP2002/013887 WO2003052462A2 (en) 2001-12-18 2002-12-07 Catadioptric reduction lens

Publications (2)

Publication Number Publication Date
AU2002358638A8 true AU2002358638A8 (en) 2003-06-30
AU2002358638A1 AU2002358638A1 (en) 2003-06-30

Family

ID=23332647

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002358638A Abandoned AU2002358638A1 (en) 2001-12-18 2002-12-07 Catadioptric reduction lens

Country Status (2)

Country Link
AU (1) AU2002358638A1 (en)
WO (1) WO2003052462A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10127227A1 (en) 2001-05-22 2002-12-05 Zeiss Carl Catadioptric reduction lens
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US8107162B2 (en) 2004-05-17 2012-01-31 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
DE102008040819A1 (en) 2007-09-14 2009-03-26 Carl Zeiss Smt Ag Method for manufacturing optical element, particularly lens for objective or for lighting system for projection illumination system of micro lithography, involves making available pre-product with optical surface
JP2010237356A (en) * 2009-03-31 2010-10-21 Sony Corp Projection type image display device and projection optical system

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices

Also Published As

Publication number Publication date
WO2003052462A3 (en) 2004-01-15
WO2003052462A2 (en) 2003-06-26
AU2002358638A1 (en) 2003-06-30

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase