WO2003052462A3 - Catadioptric reduction lens - Google Patents

Catadioptric reduction lens Download PDF

Info

Publication number
WO2003052462A3
WO2003052462A3 PCT/EP2002/013887 EP0213887W WO03052462A3 WO 2003052462 A3 WO2003052462 A3 WO 2003052462A3 EP 0213887 W EP0213887 W EP 0213887W WO 03052462 A3 WO03052462 A3 WO 03052462A3
Authority
WO
WIPO (PCT)
Prior art keywords
reflective surface
object plane
plane
catadioptric
concave mirror
Prior art date
Application number
PCT/EP2002/013887
Other languages
French (fr)
Other versions
WO2003052462A2 (en
Inventor
Alexander Epple
David R Shafer
Original Assignee
Alexander Epple
David R Shafer
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US34027501P priority Critical
Priority to US60/340,275 priority
Application filed by Alexander Epple, David R Shafer, Zeiss Carl Smt Ag filed Critical Alexander Epple
Publication of WO2003052462A2 publication Critical patent/WO2003052462A2/en
Publication of WO2003052462A3 publication Critical patent/WO2003052462A3/en
Priority claimed from US10/869,943 external-priority patent/US7046459B1/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0892Catadioptric systems specially adapted for the UV
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70225Catadioptric systems, i.e. documents describing optical design aspect details
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70275Multiple projection paths, array of projection systems, microlens projection systems, tandem projection systems

Abstract

A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane while creating a real intermediate image, having a catadioptric first lens section having a concave mirror and a beam-deflection device, as well as a dioptric second lens section that follows the catadioptric lens section, between its object plane and image plane. The beam-deflection device has a first reflective surface for deflecting radiation coming from the object plane to the concave mirror. Positive refractive power is arranged following the first reflective surface, between the latter and the concave mirror, within an optical near-field of the object plane, within which the height of the principal ray of the outermost field point of radiation coming from the object exceeds the marginal-ray height. The intermediate image lies well ahead of a second reflective surface that is provided for the purpose of allowing arranging the object plane and image plane such that they will be parallel to one another. A lens is provided between the intermediate image and second reflective surface.
PCT/EP2002/013887 2001-12-18 2002-12-07 Catadioptric reduction lens WO2003052462A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US34027501P true 2001-12-18 2001-12-18
US60/340,275 2001-12-18

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AU2002358638A AU2002358638A1 (en) 2001-12-18 2002-12-07 Catadioptric reduction lens
US10/869,943 US7046459B1 (en) 2001-12-18 2004-06-18 Catadioptric reductions lens

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/869,943 Continuation US7046459B1 (en) 2001-12-18 2004-06-18 Catadioptric reductions lens

Publications (2)

Publication Number Publication Date
WO2003052462A2 WO2003052462A2 (en) 2003-06-26
WO2003052462A3 true WO2003052462A3 (en) 2004-01-15

Family

ID=23332647

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/013887 WO2003052462A2 (en) 2001-12-18 2002-12-07 Catadioptric reduction lens

Country Status (2)

Country Link
AU (1) AU2002358638A1 (en)
WO (1) WO2003052462A2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10127227A1 (en) 2001-05-22 2002-12-05 Zeiss Carl Catadioptric reduction objective
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
DE102008040819A1 (en) 2007-09-14 2009-03-26 Carl Zeiss Smt Ag Method for manufacturing optical element, particularly lens for objective or for lighting system for projection illumination system of micro lithography, involves making available pre-product with optical surface
JP2010237356A (en) * 2009-03-31 2010-10-21 Sony Corp Projection type image display device and projection optical system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0989434A2 (en) * 1998-07-29 2000-03-29 Carl Zeiss Catadioptric optical system and exposure apparatus having the same
WO2001065296A1 (en) * 2000-03-03 2001-09-07 Nikon Corporation Reflection/refraction optical system and projection exposure apparatus comprising the optical system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0989434A2 (en) * 1998-07-29 2000-03-29 Carl Zeiss Catadioptric optical system and exposure apparatus having the same
WO2001065296A1 (en) * 2000-03-03 2001-09-07 Nikon Corporation Reflection/refraction optical system and projection exposure apparatus comprising the optical system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9134618B2 (en) 2004-05-17 2015-09-15 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images

Also Published As

Publication number Publication date
WO2003052462A2 (en) 2003-06-26
AU2002358638A8 (en) 2003-06-30
AU2002358638A1 (en) 2003-06-30

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