AU2002233644A1 - Radiation sensitive refractive index changing composition - Google Patents
Radiation sensitive refractive index changing compositionInfo
- Publication number
- AU2002233644A1 AU2002233644A1 AU2002233644A AU2002233644A AU2002233644A1 AU 2002233644 A1 AU2002233644 A1 AU 2002233644A1 AU 2002233644 A AU2002233644 A AU 2002233644A AU 2002233644 A AU2002233644 A AU 2002233644A AU 2002233644 A1 AU2002233644 A1 AU 2002233644A1
- Authority
- AU
- Australia
- Prior art keywords
- refractive index
- radiation sensitive
- index changing
- changing composition
- sensitive refractive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001-041437 | 2001-02-19 | ||
JP2001041437 | 2001-02-19 | ||
PCT/JP2002/001362 WO2002066561A1 (en) | 2001-02-19 | 2002-02-18 | Radiation-sensitive composition capable of having refractive index distribution |
Publications (2)
Publication Number | Publication Date |
---|---|
AU2002233644A1 true AU2002233644A1 (en) | 2003-02-27 |
AU2002233644B2 AU2002233644B2 (en) | 2006-09-28 |
Family
ID=18903882
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002233644A Ceased AU2002233644B2 (en) | 2001-02-19 | 2002-02-18 | Radiation sensitive refractive index changing composition |
Country Status (9)
Country | Link |
---|---|
US (1) | US7071255B2 (en) |
EP (1) | EP1369459A4 (en) |
KR (1) | KR100789582B1 (en) |
CN (1) | CN1225509C (en) |
AU (1) | AU2002233644B2 (en) |
CA (1) | CA2406219A1 (en) |
RU (1) | RU2281310C2 (en) |
TW (1) | TWI269804B (en) |
WO (1) | WO2002066561A1 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2408217A1 (en) | 2001-03-13 | 2002-11-12 | Jsr Corporation | Radiation sensitive refractive index changing composition and use thereof |
RU2005116302A (en) * | 2002-10-28 | 2006-01-20 | Циба Спешиалти Кемикэлз Холдинг Инк. (Ch) | IMPROVEMENT OF STABILITY OF PHOTO INITIATORS DURING STORAGE |
JP4217886B2 (en) * | 2003-06-25 | 2009-02-04 | Jsr株式会社 | Radiation sensitive refractive index changing composition, pattern forming method and optical material |
WO2007029522A1 (en) * | 2005-09-01 | 2007-03-15 | Sumitomo Electric Industries, Ltd. | Optical device and method for manufacturing same |
JP4949692B2 (en) * | 2006-02-07 | 2012-06-13 | 東京応化工業株式会社 | Low refractive index silica-based film forming composition |
TW201120103A (en) * | 2009-06-24 | 2011-06-16 | Asahi Kasei E Materials Corp | Polysiloxane condensation reaction product |
US8743466B2 (en) | 2010-06-15 | 2014-06-03 | Sharp Kabushiki Kaisha | Display device and method for forming the same |
JP5612960B2 (en) * | 2010-08-11 | 2014-10-22 | 株式会社ダイセル | Fluorine-containing compound |
KR101890633B1 (en) * | 2011-04-27 | 2018-08-22 | 후지필름 가부시키가이샤 | Resin composition, method for producing cured product, method for producing resin pattern, cured product and optical member |
US10105918B2 (en) | 2011-11-10 | 2018-10-23 | Conavi Medical Inc. | Internal optical elements produced by irradiation-induced refractive index changes |
US10698231B2 (en) * | 2018-02-20 | 2020-06-30 | Indizen Optical Technologies of America, LLC | Creating rewritable lenses |
RU2729264C9 (en) * | 2020-01-09 | 2020-09-16 | Общество с ограниченной ответственностью "Зенит Фотоникс" (ООО "ЗФ") | Organic-inorganic composition |
Family Cites Families (38)
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---|---|---|---|---|
US3940507A (en) | 1974-05-03 | 1976-02-24 | Rca Corporation | Electron beam recording media and method of recording |
DE2718254C3 (en) | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Radiation-sensitive copying paste |
JPS559433A (en) | 1978-07-07 | 1980-01-23 | Toshiba Corp | Electron beam exposure device |
DE2928636A1 (en) | 1979-07-16 | 1981-02-12 | Hoechst Ag | RADIATION-SENSITIVE MIXTURE AND METHOD FOR PRODUCING RELIEF IMAGES |
DE3021590A1 (en) | 1980-06-09 | 1981-12-17 | Hoechst Ag, 6000 Frankfurt | 4-HALOGEN-5- (HALOGENMETHYL-PHENYL) -OXAZOLE DERIVATIVES, A METHOD FOR THE PRODUCTION THEREOF AND THEIR RADIO-SENSITIVE MEASURES |
JPS6037549A (en) | 1983-08-10 | 1985-02-26 | Fuji Photo Film Co Ltd | Photosolubilizable composition |
JPH0638125B2 (en) | 1985-07-26 | 1994-05-18 | 三菱電機株式会社 | Method for producing light-focusing plastic |
US4665006A (en) | 1985-12-09 | 1987-05-12 | International Business Machines Corporation | Positive resist system having high resistance to oxygen reactive ion etching |
US4734481A (en) | 1986-01-16 | 1988-03-29 | Ciba-Geigy Corporation | Novel organometallic polymers |
US4924807A (en) | 1986-07-26 | 1990-05-15 | Nihon Shinku Gijutsu Kabushiki Kaisha | Apparatus for chemical vapor deposition |
JPS6397945A (en) | 1986-10-14 | 1988-04-28 | Konica Corp | Photosensitive composition and photosensitive lithographic printing plate containing novel acid decomposable compound |
JPS643647A (en) | 1987-06-26 | 1989-01-09 | Konishiroku Photo Ind | Photosensitive composition and photosensitive planographic plate |
JP2685075B2 (en) | 1988-11-29 | 1997-12-03 | 富士通株式会社 | Upper layer resist of two layer structure positive resist |
CA2008020A1 (en) * | 1989-02-17 | 1990-08-17 | William C. Perkins | Radiation-curable coating compositions that form transparent, abrasion-resistant, tintable coatings |
JPH03192310A (en) | 1989-12-22 | 1991-08-22 | Mitsubishi Rayon Co Ltd | Manufacture of plastic optical transmission body |
JP2583364B2 (en) | 1990-06-19 | 1997-02-19 | 三菱電機株式会社 | Photosensitive resin composition |
JPH04303843A (en) | 1991-03-30 | 1992-10-27 | Toppan Printing Co Ltd | Visible light-sensitive resin composition |
JPH0560931A (en) | 1991-09-02 | 1993-03-12 | Fujitsu Ltd | Graded index plastic rein forming body |
EP0555749B1 (en) | 1992-02-14 | 1999-05-19 | Shipley Company Inc. | Radiation sensitive compositions and processes |
JPH05275789A (en) | 1992-03-26 | 1993-10-22 | Res Dev Corp Of Japan | Polymer optical fiber amplifier |
DE69331093T2 (en) | 1992-08-17 | 2002-03-14 | Yasuhiro Koike | Process for the production of plastic light guides |
JP3291854B2 (en) | 1993-08-16 | 2002-06-17 | 住友電気工業株式会社 | Method of manufacturing plastic member for optical transmission |
JP2606652B2 (en) | 1993-08-17 | 1997-05-07 | 日本電気株式会社 | Silicon-containing polymer compound and resist material using the same |
JPH0792313A (en) | 1993-09-20 | 1995-04-07 | Toshiba Corp | Optical fiber type diffraction grating |
JPH0844052A (en) | 1994-08-01 | 1996-02-16 | Hitachi Ltd | Formation of pattern and radiation sensitive composition using same |
JP3530630B2 (en) | 1995-06-09 | 2004-05-24 | 康博 小池 | Method of manufacturing refractive index distribution type optical fiber and base material thereof |
JP3679155B2 (en) | 1995-06-09 | 2005-08-03 | 康博 小池 | Manufacturing method of gradient index optical resin material |
JPH09133813A (en) | 1995-11-07 | 1997-05-20 | Fujikura Ltd | Unit and structure for storing optical fiber connection part |
JP2914486B2 (en) | 1995-12-26 | 1999-06-28 | 清藏 宮田 | Optical fiber and manufacturing method thereof |
JP3650985B2 (en) * | 1997-05-22 | 2005-05-25 | Jsr株式会社 | Negative-type radiation-sensitive resin composition and pattern production method |
TW482817B (en) * | 1998-06-18 | 2002-04-11 | Jsr Corp | Photosetting compositions and photoset articles |
JP4092781B2 (en) | 1998-06-22 | 2008-05-28 | Jsr株式会社 | Inorganic particle-containing composition, transfer film, and method for producing plasma display panel using the same |
JP2000066017A (en) * | 1998-08-19 | 2000-03-03 | Toray Ind Inc | Thermosetting resin solution composition for color filter, color filter and liquid crystal display device |
JP3897080B2 (en) * | 1999-03-11 | 2007-03-22 | コニカミノルタホールディングス株式会社 | Antireflection material, method for producing antireflection material, polarizing plate protective film, and polarizing plate |
JP2000347397A (en) | 1999-06-04 | 2000-12-15 | Jsr Corp | Radiation sensitive resin composition and its use for interlayer dielectric |
JP4253973B2 (en) | 1999-12-20 | 2009-04-15 | Jsr株式会社 | Radiation sensitive resin composition for producing inorganic shaped article and method for producing inorganic shaped article |
JP2001281429A (en) | 2000-03-30 | 2001-10-10 | Kansai Research Institute | Diffraction optical element and its manufacturing method |
CA2408217A1 (en) * | 2001-03-13 | 2002-11-12 | Jsr Corporation | Radiation sensitive refractive index changing composition and use thereof |
-
2002
- 2002-02-18 CN CNB028003578A patent/CN1225509C/en not_active Expired - Fee Related
- 2002-02-18 EP EP02700597A patent/EP1369459A4/en not_active Withdrawn
- 2002-02-18 CA CA002406219A patent/CA2406219A1/en not_active Abandoned
- 2002-02-18 AU AU2002233644A patent/AU2002233644B2/en not_active Ceased
- 2002-02-18 KR KR1020027013968A patent/KR100789582B1/en not_active IP Right Cessation
- 2002-02-18 RU RU2002128012/04A patent/RU2281310C2/en active
- 2002-02-18 US US10/257,397 patent/US7071255B2/en not_active Expired - Fee Related
- 2002-02-18 WO PCT/JP2002/001362 patent/WO2002066561A1/en active Application Filing
- 2002-02-19 TW TW091102812A patent/TWI269804B/en not_active IP Right Cessation
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