AU2002217253A1 - Electrostatic device for holding an electronic component wafer - Google Patents
Electrostatic device for holding an electronic component waferInfo
- Publication number
- AU2002217253A1 AU2002217253A1 AU2002217253A AU1725302A AU2002217253A1 AU 2002217253 A1 AU2002217253 A1 AU 2002217253A1 AU 2002217253 A AU2002217253 A AU 2002217253A AU 1725302 A AU1725302 A AU 1725302A AU 2002217253 A1 AU2002217253 A1 AU 2002217253A1
- Authority
- AU
- Australia
- Prior art keywords
- wafer
- support
- holding
- gripping
- electronic component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
- Elimination Of Static Electricity (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
A device for holding a wafer, an electronic component comprises a system for transporting without deformation a wafer of electronic components. The device also enables the transport by one or the other of the passive or active faces. The device comprises a planar and thin rigid support having a controllable temperature and at least an electrode consisting of (N+1) elements, confined between two sheets of insulating material. The support provides a protrusion-free surface for gripping the wafer, and electrostatic elements for positive retention of the wafer induces a gripping power of the latter distributed over the entire support. The U-shaped support is borne by the electrical bond of the electrode with a remote (adjustable, AC or DC, mono-multipolar) power source. The gripping surface of the device is planar and protrusion-free whatever the geometry of the support used.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0016154A FR2818050B1 (en) | 2000-12-12 | 2000-12-12 | DEVICE FOR THE ELECTROSTATIC PRETENSION OF AN ELECTRONIC COMPONENT WAFER |
FR0016154 | 2000-12-12 | ||
PCT/FR2001/003954 WO2002049200A1 (en) | 2000-12-12 | 2001-12-12 | Electrostatic device for holding an electronic component wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002217253A1 true AU2002217253A1 (en) | 2002-06-24 |
Family
ID=8857544
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002217253A Abandoned AU2002217253A1 (en) | 2000-12-12 | 2001-12-12 | Electrostatic device for holding an electronic component wafer |
Country Status (11)
Country | Link |
---|---|
US (1) | US7133273B2 (en) |
EP (1) | EP1342311B1 (en) |
JP (1) | JP4155823B2 (en) |
KR (1) | KR100589796B1 (en) |
AT (1) | ATE269601T1 (en) |
AU (1) | AU2002217253A1 (en) |
DE (1) | DE60103930T2 (en) |
DK (1) | DK1342311T3 (en) |
ES (1) | ES2220668T3 (en) |
FR (1) | FR2818050B1 (en) |
WO (1) | WO2002049200A1 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE526745C2 (en) * | 2003-04-17 | 2005-11-01 | Nobel Biocare Ab | Fixture for anchoring in the jawbone |
KR101784850B1 (en) * | 2010-06-11 | 2017-11-06 | 가부시키가이샤 리코 | Information storage system removably installable in image forming apparatus, removable device, and toner container |
US20120308346A1 (en) | 2011-06-03 | 2012-12-06 | Arthur Keigler | Parallel single substrate processing system loader |
FR2980994B1 (en) | 2011-10-07 | 2015-11-27 | Semco Engineering | MULTI-PLATELET PREHENSEER. |
JP6011965B2 (en) * | 2012-09-19 | 2016-10-25 | パナソニックIpマネジメント株式会社 | Plasma dicing method and plasma dicing apparatus |
CN104526698B (en) * | 2014-12-04 | 2016-06-01 | 北京七星华创电子股份有限公司 | The mechanical arm of a kind of high strength, control method and robot device |
JP7036905B2 (en) * | 2018-04-26 | 2022-03-15 | 京セラ株式会社 | Focus ring transport member and plasma processing device equipped with this |
KR102242812B1 (en) * | 2018-05-17 | 2021-04-22 | 세메스 주식회사 | Transfer unit, apparatus for treating substrate including the same |
US11121019B2 (en) | 2018-06-19 | 2021-09-14 | Kla Corporation | Slotted electrostatic chuck |
EP3614422A1 (en) | 2018-08-22 | 2020-02-26 | Meyer Burger AG | Electrostatic holding device |
US11437257B2 (en) * | 2019-05-08 | 2022-09-06 | Samsung Electronics Co., Ltd. | Robot hand, wafer transfer robot, and wafer transfer apparatus |
US11696821B2 (en) | 2021-03-31 | 2023-07-11 | Toyota Motor Engineering & Manufacturing North America, Inc. | Asymmetric electrode insulation for artificial muscles |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1443215A (en) * | 1973-11-07 | 1976-07-21 | Mullard Ltd | Electrostatically clamping a semiconductor wafer during device manufacture |
US4184188A (en) * | 1978-01-16 | 1980-01-15 | Veeco Instruments Inc. | Substrate clamping technique in IC fabrication processes |
GB2147459A (en) * | 1983-09-30 | 1985-05-09 | Philips Electronic Associated | Electrostatic chuck for semiconductor wafers |
JPS6131636U (en) * | 1984-07-31 | 1986-02-26 | 株式会社 徳田製作所 | electrostatic chuck |
JPH01303079A (en) * | 1988-05-30 | 1989-12-06 | Abisare:Kk | Electrostatic adsorbing plate having flexible plug-in terminal |
JP3064409B2 (en) * | 1990-11-30 | 2000-07-12 | 株式会社日立製作所 | Holding device and semiconductor manufacturing apparatus using the same |
US5671116A (en) * | 1995-03-10 | 1997-09-23 | Lam Research Corporation | Multilayered electrostatic chuck and method of manufacture thereof |
DE19523229A1 (en) * | 1995-06-27 | 1997-01-02 | Riad Dipl Ing Salim | Micro-gripper for micro-assembly with substrate and microstructure body |
US6108189A (en) * | 1996-04-26 | 2000-08-22 | Applied Materials, Inc. | Electrostatic chuck having improved gas conduits |
DE19715083A1 (en) * | 1997-04-11 | 1997-08-28 | Univ Ilmenau Tech | Mechanical gripper for handling small objects in micro-systems technology |
US6164894A (en) * | 1997-11-04 | 2000-12-26 | Cheng; David | Method and apparatus for integrated wafer handling and testing |
JPH11157953A (en) * | 1997-12-02 | 1999-06-15 | Nhk Spring Co Ltd | Structure composed of ceramic and metal and electrostatic chuck device produced by using the structure |
US6238160B1 (en) * | 1998-12-02 | 2001-05-29 | Taiwan Semiconductor Manufacturing Company, Ltd' | Method for transporting and electrostatically chucking a semiconductor wafer or the like |
US6174011B1 (en) * | 1999-04-14 | 2001-01-16 | Arthur Keigler | Method of and apparatus for handling thin and flat workpieces and the like |
-
2000
- 2000-12-12 FR FR0016154A patent/FR2818050B1/en not_active Expired - Fee Related
-
2001
- 2001-12-12 AU AU2002217253A patent/AU2002217253A1/en not_active Abandoned
- 2001-12-12 AT AT01270946T patent/ATE269601T1/en active
- 2001-12-12 US US10/450,135 patent/US7133273B2/en not_active Expired - Lifetime
- 2001-12-12 KR KR1020037007758A patent/KR100589796B1/en active IP Right Grant
- 2001-12-12 JP JP2002550394A patent/JP4155823B2/en not_active Expired - Fee Related
- 2001-12-12 EP EP01270946A patent/EP1342311B1/en not_active Expired - Lifetime
- 2001-12-12 DE DE60103930T patent/DE60103930T2/en not_active Expired - Lifetime
- 2001-12-12 ES ES01270946T patent/ES2220668T3/en not_active Expired - Lifetime
- 2001-12-12 DK DK01270946T patent/DK1342311T3/en active
- 2001-12-12 WO PCT/FR2001/003954 patent/WO2002049200A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP4155823B2 (en) | 2008-09-24 |
DE60103930D1 (en) | 2004-07-22 |
EP1342311A1 (en) | 2003-09-10 |
US7133273B2 (en) | 2006-11-07 |
EP1342311B1 (en) | 2004-06-16 |
FR2818050A1 (en) | 2002-06-14 |
KR100589796B1 (en) | 2006-06-14 |
WO2002049200A1 (en) | 2002-06-20 |
DE60103930T2 (en) | 2005-06-23 |
ES2220668T3 (en) | 2004-12-16 |
DK1342311T3 (en) | 2004-10-18 |
ATE269601T1 (en) | 2004-07-15 |
KR20030064812A (en) | 2003-08-02 |
US20040070914A1 (en) | 2004-04-15 |
FR2818050B1 (en) | 2006-08-11 |
JP2004516660A (en) | 2004-06-03 |
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