AU2001296902A1 - Using deuterated source gases to fabricate low loss germanium-doped silicon oxy nitride (gestion-sion) - Google Patents

Using deuterated source gases to fabricate low loss germanium-doped silicon oxy nitride (gestion-sion)

Info

Publication number
AU2001296902A1
AU2001296902A1 AU2001296902A AU9690201A AU2001296902A1 AU 2001296902 A1 AU2001296902 A1 AU 2001296902A1 AU 2001296902 A AU2001296902 A AU 2001296902A AU 9690201 A AU9690201 A AU 9690201A AU 2001296902 A1 AU2001296902 A1 AU 2001296902A1
Authority
AU
Australia
Prior art keywords
gestion
sion
germanium
doped silicon
low loss
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001296902A
Other languages
English (en)
Inventor
Ikerionwu A. Akwani
Robert A. Bellman
Thomas P. Grandi
Paul A. Sachenik
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of AU2001296902A1 publication Critical patent/AU2001296902A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0042—Compositions for glass with special properties for glass comprising or including particular isotopes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/225—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/308—Oxynitrides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/228—Other specific oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/28—Other inorganic materials
    • C03C2217/281—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Optical Integrated Circuits (AREA)
  • Chemical Vapour Deposition (AREA)
AU2001296902A 2000-10-20 2001-09-25 Using deuterated source gases to fabricate low loss germanium-doped silicon oxy nitride (gestion-sion) Abandoned AU2001296902A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US69344500A 2000-10-20 2000-10-20
US09/693,445 2000-10-20
PCT/US2001/042290 WO2002035265A2 (en) 2000-10-20 2001-09-25 Using deuterated source gases to fabricate low loss germanium-doped silicon oxy nitride (gestion-sion)

Publications (1)

Publication Number Publication Date
AU2001296902A1 true AU2001296902A1 (en) 2002-05-06

Family

ID=24784673

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001296902A Abandoned AU2001296902A1 (en) 2000-10-20 2001-09-25 Using deuterated source gases to fabricate low loss germanium-doped silicon oxy nitride (gestion-sion)

Country Status (4)

Country Link
US (2) US6996320B2 (de)
EP (1) EP1327170A2 (de)
AU (1) AU2001296902A1 (de)
WO (1) WO2002035265A2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7043133B2 (en) 2001-07-12 2006-05-09 Little Optics, Inc. Silicon-oxycarbide high index contrast, low-loss optical waveguides and integrated thermo-optic devices
US6614977B2 (en) 2001-07-12 2003-09-02 Little Optics, Inc. Use of deuterated gases for the vapor deposition of thin films for low-loss optical devices and waveguides
US6952519B2 (en) * 2003-05-02 2005-10-04 Corning Incorporated Large effective area high SBS threshold optical fiber
US7082243B2 (en) * 2004-04-05 2006-07-25 Corning Incorporated Large effective area high SBS threshold optical fiber
JP2019203915A (ja) 2018-05-21 2019-11-28 日本電信電話株式会社 光集積デバイスおよびその製造方法
WO2023163994A1 (en) * 2022-02-23 2023-08-31 PsiQuantum Corp. Ultra low loss silicon nitride based waveguide

Family Cites Families (27)

* Cited by examiner, † Cited by third party
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US3791714A (en) * 1972-03-30 1974-02-12 Corning Glass Works Method of producing glass for optical waveguides
IT1145157B (it) * 1981-06-22 1986-11-05 Cselt Centro Studi Lab Telecom Procedimento e dispositivo per la deidrogenazione in linea di preforme per fibre ottiche
DE3338714A1 (de) * 1983-10-25 1985-05-02 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur verringerung des hydroxylanteils in lichtwellenleitern
US5264724A (en) * 1989-02-13 1993-11-23 The University Of Arkansas Silicon nitride for application as the gate dielectric in MOS devices
US4962065A (en) * 1989-02-13 1990-10-09 The University Of Arkansas Annealing process to stabilize PECVD silicon nitride for application as the gate dielectric in MOS devices
US5062680A (en) * 1989-09-27 1991-11-05 Nippon Telegraph And Telephone Corporation Plate plastics optical waveguide
JPH05273426A (ja) * 1991-12-06 1993-10-22 Sumitomo Electric Ind Ltd 光導波膜の作製方法およびこれを用いた光導波路の作製方法
US5287427A (en) * 1992-05-05 1994-02-15 At&T Bell Laboratories Method of making an article comprising an optical component, and article comprising the component
US5343544A (en) * 1993-07-02 1994-08-30 Minnesota Mining And Manufacturing Company Integrated optical fiber coupler and method of making same
JP3117107B2 (ja) * 1993-08-03 2000-12-11 シャープ株式会社 光集積回路素子の組立構造
GB9320326D0 (en) * 1993-10-01 1993-11-17 Ici Plc Organic optical components and preparation thereof
EP0673895A3 (de) * 1994-03-24 1996-01-03 At & T Corp Optische Wellenleiter aus Glas die gegen durch Wasserstoff induzierten Dämpfungszunahmen passiviert sind.
US6499318B1 (en) * 1994-03-24 2002-12-31 Fitel Usa Corp. Glass optical waveguides passivated against hydrogen-induced loss increases
JPH08184718A (ja) * 1994-12-28 1996-07-16 Hoechst Japan Ltd 光導波路素子およびその製造方法
JPH0978244A (ja) * 1995-09-07 1997-03-25 Canon Inc プラズマｃｖｄ方法
US5872387A (en) * 1996-01-16 1999-02-16 The Board Of Trustees Of The University Of Illinois Deuterium-treated semiconductor devices
GB2314346A (en) * 1996-06-22 1997-12-24 Northern Telecom Ltd Rapid thermal annealing
US6077791A (en) * 1996-12-16 2000-06-20 Motorola Inc. Method of forming passivation layers using deuterium containing reaction gases
WO1998037445A1 (fr) * 1997-02-19 1998-08-27 Hitachi, Ltd. Guide d'ondes optique en polymere, circuit integre optique, module optique et appareil de communication optique
US5972765A (en) * 1997-07-16 1999-10-26 International Business Machines Corporation Use of deuterated materials in semiconductor processing
KR19990061716A (ko) * 1997-12-31 1999-07-26 윤종용 비스(디알킬말레이미드) 유도체 및 이로부터 형성된 광통신용 폴리에테르이미드
WO2000022465A1 (en) * 1998-10-15 2000-04-20 International Business Machines Corporation Optical waveguide device
US6114258A (en) * 1998-10-19 2000-09-05 Applied Materials, Inc. Method of oxidizing a substrate in the presence of nitride and oxynitride films
US6306563B1 (en) * 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions
US6393185B1 (en) * 1999-11-03 2002-05-21 Sparkolor Corporation Differential waveguide pair
US6408125B1 (en) * 1999-11-10 2002-06-18 Corning Incorporated Germanium silicon oxynitride high index films for planar waveguides
JP3962257B2 (ja) * 2000-02-29 2007-08-22 インターナショナル・ビジネス・マシーンズ・コーポレーション ＳｉＯＮ光学的導波管のための材料及びそのような導波管を製造する方法

Also Published As

Publication number Publication date
US20040062504A1 (en) 2004-04-01
US6996320B2 (en) 2006-02-07
US20060003484A1 (en) 2006-01-05
EP1327170A2 (de) 2003-07-16
WO2002035265A3 (en) 2003-01-23
WO2002035265A2 (en) 2002-05-02

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