AU2001280354A1 - An arrangement in a power mos transistor - Google Patents

An arrangement in a power mos transistor

Info

Publication number
AU2001280354A1
AU2001280354A1 AU2001280354A AU8035401A AU2001280354A1 AU 2001280354 A1 AU2001280354 A1 AU 2001280354A1 AU 2001280354 A AU2001280354 A AU 2001280354A AU 8035401 A AU8035401 A AU 8035401A AU 2001280354 A1 AU2001280354 A1 AU 2001280354A1
Authority
AU
Australia
Prior art keywords
arrangement
mos transistor
power mos
power
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001280354A
Inventor
Nils Af Ekenstam
Jan Johansson
Mikael Zackrisson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Telefonaktiebolaget LM Ericsson AB
Original Assignee
Telefonaktiebolaget LM Ericsson AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Telefonaktiebolaget LM Ericsson AB filed Critical Telefonaktiebolaget LM Ericsson AB
Publication of AU2001280354A1 publication Critical patent/AU2001280354A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/417Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
    • H01L29/41725Source or drain electrodes for field effect devices
    • H01L29/41766Source or drain electrodes for field effect devices with at least part of the source or drain electrode having contact below the semiconductor surface, e.g. the source or drain electrode formed at least partially in a groove or with inclusions of conductor inside the semiconductor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7833Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's
    • H01L29/7835Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's with asymmetrical source and drain regions, e.g. lateral high-voltage MISFETs with drain offset region, extended drain MISFETs

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
AU2001280354A 2000-08-04 2001-07-31 An arrangement in a power mos transistor Abandoned AU2001280354A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE0002828A SE519528C2 (en) 2000-08-04 2000-08-04 Device in a power MOS transistor
SE0002828 2000-08-04
PCT/SE2001/001689 WO2002013274A1 (en) 2000-08-04 2001-07-31 An arrangement in a power mos transistor

Publications (1)

Publication Number Publication Date
AU2001280354A1 true AU2001280354A1 (en) 2002-02-18

Family

ID=20280631

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001280354A Abandoned AU2001280354A1 (en) 2000-08-04 2001-07-31 An arrangement in a power mos transistor

Country Status (7)

Country Link
US (1) US20020027242A1 (en)
EP (1) EP1314205A1 (en)
CN (1) CN1209820C (en)
AU (1) AU2001280354A1 (en)
SE (1) SE519528C2 (en)
TW (1) TW490816B (en)
WO (1) WO2002013274A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0405325D0 (en) * 2004-03-10 2004-04-21 Koninkl Philips Electronics Nv Trench-gate transistors and their manufacture

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR920010963A (en) * 1990-11-23 1992-06-27 오가 노리오 SOI type vertical channel FET and manufacturing method thereof
JPH08316453A (en) * 1995-05-18 1996-11-29 Sanyo Electric Co Ltd Semiconductor device and manufacture thereof

Also Published As

Publication number Publication date
SE0002828D0 (en) 2000-08-04
SE0002828L (en) 2002-02-05
SE519528C2 (en) 2003-03-11
US20020027242A1 (en) 2002-03-07
TW490816B (en) 2002-06-11
CN1209820C (en) 2005-07-06
WO2002013274A1 (en) 2002-02-14
CN1441966A (en) 2003-09-10
EP1314205A1 (en) 2003-05-28

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